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THE SECONDARY ELECTRONS SPECTRUM OF POLYANILINE IN XPS
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作者 万梅香 郭可珍 《Chinese Journal of Polymer Science》 SCIE CAS CSCD 1992年第2期152-157,共6页
The secondary electrons spectrum in XPS can be used to determine the work function of polyaniline (PANI). It is shown that the work function of PANI depends on the protonation state and the polymerization method used.
关键词 POLYANILINE secondary electrons spectrum in XPS
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An improved secondary electrons energy spectrum model and its application in multipactor discharge 被引量:4
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作者 Wan-Zhao Cui Heng Zhang +5 位作者 Yun Li Yun He Qi Wang Hong-Tai Zhang Hong-Guang Wang Jing Yang 《Chinese Physics B》 SCIE EI CAS CSCD 2018年第3期502-507,共6页
Secondary electron emission(SEE)of metal and dielectric materials plays a key role in multipactor discharge,which is a bottle neck problem for high-power satelliate components.Measurements of both the secondary electr... Secondary electron emission(SEE)of metal and dielectric materials plays a key role in multipactor discharge,which is a bottle neck problem for high-power satelliate components.Measurements of both the secondary electron yield(SEY)and the secondary electron energy spectrum(SES)are performed on metal samples for an accurate description of the real SEE phenomenon.In order to simplify the fitting process and improve the simulation efficiency,an improved model is proposed for the description of secondary electrons(SE)emitted from the material surface,including true,elastic,and inelastic SE.Embedding the novel SES model into the electromagnetic particle-in-cell method,the electronic resonant multipactor in microwave components is simulated successfully and hence the discharge threshold is predicted.Simulation results of the SES variation in the improved model demonstrate that the multipactor threshold is strongly dependent on SES.In addition,the mutipactor simulation results agree quite well with the experiment for the practical microwave component,while the numerical model of SEY and SES fits well with the sample data taken from the microwave component. 展开更多
关键词 secondary electron energy spectrum multipactor simulation vaccum breakdown satellite application
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MONTE CARLO SIMULATION OF SPIN-POLARIZED SECONDARY ELECTRONS FROM IRON
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作者 K. Salma 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2005年第3期325-330,共6页
A Monte Carlo model considering the electron spin direction and spin asymmetry h as been developed. The energy distribution of the secondary electron polarizatio n and the primary energy dependence of the polarization... A Monte Carlo model considering the electron spin direction and spin asymmetry h as been developed. The energy distribution of the secondary electron polarizatio n and the primary energy dependence of the polarization from Fe are studied. The simulation results show that: (1) the intensity of the spin-up secondary electr ons is larger thanvthat of thevspin-down secondary electrons, suggesting the s econdary electrons are spin polarized; (2) the spin polarization of secondary el ectrons with nearly zero kinetic energy is higher than the average valance spin polarization, Pb=27% for Fe. With increasing kinetic energy, the spin polarizat ion of the secondary electrons decreases to the value of Pb, remaining constant at higher kinetic energies; (3) the spin polarization increases with an increase in the primary energy and reaches a saturation value at higher primary energy i n both the Monte Carlo simulation and experimental results. 展开更多
关键词 spin polarization secondary electron spin asymmetry Monte Carlo
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Sheath structure in plasma with two species of positive ions and secondary electrons
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作者 赵晓云 项农 +2 位作者 欧靖 李德徽 林滨滨 《Chinese Physics B》 SCIE EI CAS CSCD 2016年第2期295-301,共7页
The properties of a collisionless plasma sheath are investigated by using a fluid model in which two species of positive ions and secondary electrons are taken into account. It is shown that the positive ion speeds at... The properties of a collisionless plasma sheath are investigated by using a fluid model in which two species of positive ions and secondary electrons are taken into account. It is shown that the positive ion speeds at the sheath edge increase with secondary electron emission(SEE) coefficient, and the sheath structure is affected by the interplay between the two species of positive ions and secondary electrons. The critical SEE coefficients and the sheath widths depend strongly on the positive ion charge number, mass and concentration in the cases with and without SEE. In addition, ion kinetic energy flux to the wall and the impact of positive ion species on secondary electron density at the sheath edge are also discussed. 展开更多
关键词 SHEATH two-ion-species plasma secondary electron emission
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Secondary electron emission and photoemission from a negative electron affinity semiconductor with large mean escape depth of excited electrons
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作者 谢爱根 董红杰 刘亦凡 《Chinese Physics B》 SCIE EI CAS CSCD 2023年第4期677-690,共14页
The formulae for parameters of a negative electron affinity semiconductor(NEAS)with large mean escape depth of secondary electrons A(NEASLD)are deduced.The methods for obtaining parameters such asλ,B,E_(pom)and the m... The formulae for parameters of a negative electron affinity semiconductor(NEAS)with large mean escape depth of secondary electrons A(NEASLD)are deduced.The methods for obtaining parameters such asλ,B,E_(pom)and the maximumδandδat 100.0 keV≥E_(po)≥1.0 keV of a NEASLD with the deduced formulae are presented(B is the probability that an internal secondary electron escapes into the vacuum upon reaching the emission surface of the emitter,δis the secondary electron yield,E_(po)is the incident energy of primary electrons and E_(pom)is the E_(po)corresponding to the maximumδ).The parameters obtained here are analyzed,and it can be concluded that several parameters of NEASLDs obtained by the methods presented here agree with those obtained by other authors.The relation between the secondary electron emission and photoemission from a NEAS with large mean escape depth of excited electrons is investigated,and it is concluded that the presented method of obtaining A is more accurate than that of obtaining the corresponding parameter for a NEAS with largeλ_(ph)(λ_(ph)being the mean escape depth of photoelectrons),and that the presented method of calculating B at E_(po)>10.0 keV is more widely applicable for obtaining the corresponding parameters for a NEAS with largeλ_(ph). 展开更多
关键词 negative electron affinity semiconductor secondary electron emission PHOTOEMISSION the probability secondary electron yield large mean escape depth of excited electrons
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Nonlinear change of ion-induced secondary electron emission in theκ-Al_(2)O_(3) surface charging from first-principle modelling
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作者 Zhicheng JIAO Mingrui ZHU +2 位作者 Dong DAI Tao SHAO Buang WANG 《Plasma Science and Technology》 SCIE EI CAS CSCD 2024年第9期40-50,共11页
Secondary electron emission(SEE)induced by the positive ion is an essential physical process to influence the dynamics of gas discharge which relies on the specific surface material.Surface charging has a significant ... Secondary electron emission(SEE)induced by the positive ion is an essential physical process to influence the dynamics of gas discharge which relies on the specific surface material.Surface charging has a significant impact on the material properties,thereby affecting the SEE in the plasma-surface interactions.However,it does not attract enough attention in the previous studies.In this paper,SEE dependent on the charged surface of specific materials is described with the computational method combining a density functional theory(DFT)model from the first-principle theory and the theory of Auger neutralization.The effect ofκ-Al2O3 surface charge,as an example,on the ion-induced secondary electron emission coefficient(SEEC)is investigated by analyzing the defect energy level and band structure on the charged surface.Simulation results indicate that,with the surface charge from negative to positive,the SEEC of a part of low ionization energy ions(such as Ei=12.6 eV)increases first and then decreases,exhibiting a nonlinear changing trend.This is quite different from the monotonic decreasing tendency observed in the previous model which simplifies the electronic structure.This irregular increase of the SEEC can be attributed to the lower escaped probability of orbital energy.The results further illustrate that the excessive charge could cause the bottom of the conduction band close to the valence band,thus leading to the decrease of the orbital energy occupied by the excited electrons.The nonlinear change of SEEC demonstrates a more realistic situation of how the electronic structure of material surface influences the SEE process.This work provides an accurate method of calculating SEEC from specific materials,which is urgent in widespread physical scenarios sensitive to surface materials,such as increasingly growing practical applications concerning plasma-surface interactions. 展开更多
关键词 secondary electron emission charged surface density functional theory defect energy level
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Effects of O_(2)adsorption on secondary electron emission properties
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作者 杨兆伦 杨晶 +7 位作者 何鋆 胡天存 王新波 张娜 陈泽煜 苗光辉 张雨婷 崔万照 《Chinese Physics B》 SCIE EI CAS CSCD 2023年第4期663-669,共7页
The surface adsorption of gas molecules is a key factor limiting the secondary electron yield(SEY)of a material in many areas of applied physics.The influence of O_(2)adsorption on the SEY of metallic Ag is investigat... The surface adsorption of gas molecules is a key factor limiting the secondary electron yield(SEY)of a material in many areas of applied physics.The influence of O_(2)adsorption on the SEY of metallic Ag is investigated in this work.To account for the particle distribution,we propose a BET theory based on multilayer O_(2)physisorption model.Furthermore,based on the phenomenological model of secondary electron(SE)emission and by taking into account the different scattering processes between electrons and particles in the adsorbed layer,we develop a numerical model of SEY in the adsorbed state using Monte Carlo simulations.The relationships among O_(2)adsorption,adsorption layer thickness,and SEY variation characteristics are then examined through a series of experiments.After 12-h exposure to O_(2),the clean samples increases12%-19%of the maximum value of SEY and 2.3 nm in thickness of the adsorbed layer.Experimental results are also compared with the results from the MC model to determine whether the model is accurate. 展开更多
关键词 multilayer adsorption model secondary electron Monte Carlo simulation gas adsorption experiments
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A refined Monte Carlo code for low-energy electron emission from gold material irradiated with sub-keV electrons
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作者 Li-Heng Zhou Shui-Yan Cao +2 位作者 Tao Sun Yun-Long Wang Jun Ma 《Nuclear Science and Techniques》 SCIE EI CAS CSCD 2023年第4期79-92,共14页
Considering the significance of low-energy electrons(LEEs;0–20 eV) in radiobiology, the sensitization potential of gold nanoparticles(AuNPs) as high-flux LEE emitters when irradiated with sub-keV electrons has been s... Considering the significance of low-energy electrons(LEEs;0–20 eV) in radiobiology, the sensitization potential of gold nanoparticles(AuNPs) as high-flux LEE emitters when irradiated with sub-keV electrons has been suggested. In this study, a track-structure Monte Carlo simulation code using the dielectric theory was developed to simulate the transport of electrons below 50 keV in gold. In this code, modifications, particularly for elastic scattering, are implemented for a more precise description of the LEE emission in secondary electron emission. This code was validated using the secondary electron yield and backscattering coefficient. To ensure dosimetry accuracy, we further verified the code for energy deposition calculations using the Monte Carlo toolkit, Geant4. The development of this code provides a basis for future studies regarding the role of AuNPs in targeted radionuclide radiotherapy. 展开更多
关键词 Monte Carlo code secondary electron emission Low-energy electrons
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A MONTE CARLO SIMULATION OF SECONDARY ELECTRON AND BACKSCATTERED ELECTRON IMAGES IN SCANNING ELECTRON MICROSCOPY 被引量:1
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作者 H.M.Li Z.J.Ding 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2005年第3期351-355,共5页
A new parallel Monte Carlo simulation method of secondary electron (SE) and back scattered electron images (BSE) of scanning electron microscopy (SEM) for a com plex geometric structure has been developed. This paper ... A new parallel Monte Carlo simulation method of secondary electron (SE) and back scattered electron images (BSE) of scanning electron microscopy (SEM) for a com plex geometric structure has been developed. This paper describes briefly the si mulation method and the modification to the conventional sampling method for the step length. Example simulation results have been obtained for several artifici al structures. 展开更多
关键词 Monte Carlo SEM secondary electrons backscattered electrons
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Plasma Wall Potentials with Secondary Electron Emissions up to the Stable Space-Charge-Limited Condition
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作者 Jongho SEON Ensang LEE 《Plasma Science and Technology》 SCIE EI CAS CSCD 2013年第11期1093-1099,共7页
Numerical solutions to floating plasma potentials for walls emitting secondary elec- trons are obtained for various surface materials. The calculations are made with plasma moment equations and the secondary electron ... Numerical solutions to floating plasma potentials for walls emitting secondary elec- trons are obtained for various surface materials. The calculations are made with plasma moment equations and the secondary electron emission coefficients, which were determined from recent laboratory experiments. The results estimate the wall potentials up to the physical conditions that allow stable plasma sheaths under the space-charge-limited condition. The materials often used in the laboratory, such as aluminum, silicon, boron, molybdenum, silicon dioxide, and alumina, are considered. The minimum wall potential before the onset of space-charge-limited emission is determined by the electron temperatures at which the effective secondary electron emission coefficient integrated over the velocity distributions is about 0.62. The corresponding potential is given by -eφ0 ,- 1.87kBT. The condition for space-charge-limited emission is newly found by numerically searching for all the stable sheaths. The new condition is -eφ0 - 0.95kBT, and this predicts a wall potential that is less negative than the previously found one. Calculation of the power dissipated to the wall for hydrogen plasmas shows that there is a large difference in terms of power dissipation among the considered materials in the temperature range 20-50 eV. 展开更多
关键词 secondary electrons plasma sheath wall potential space-charge-limited emission
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Characteristics of a Sheath with Secondary Electron Emission in the Double Walls of a Hall Thruster 被引量:1
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作者 段萍 李肸 +2 位作者 沈鸿娟 陈龙 鄂鹏 《Plasma Science and Technology》 SCIE EI CAS CSCD 2012年第9期837-841,共5页
In order to investigate the effects of secondary electrons, which are emitted from the wall, on the performance of a thruster, a one-dimensional fluid model of the plasma sheath in double walls is applied to study the... In order to investigate the effects of secondary electrons, which are emitted from the wall, on the performance of a thruster, a one-dimensional fluid model of the plasma sheath in double walls is applied to study the characteristics of a magnetized sheath. The effects of secondary electron emission (SEE) coefficients and trapping coefficients, as well as magnetic field, on the structure of the plasma sheath are investigated. The results show that sheath potential and wall potential rise with the increment of SEE coefficient and trapping coefficient which results in a reduced sheath thickness. In addition, magnetic field strength will influence the sheath potential distributions. 展开更多
关键词 Hall thruster magnetized sheath secondary electron
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Measurement of Secondary Electron Energy Spectra of Polymethyl Methacrylate 被引量:1
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作者 Ming Weng Wan Liu +2 位作者 Ming Yin Fang Wang Meng Cao 《Chinese Physics Letters》 SCIE CAS CSCD 2018年第4期108-112,共5页
We report on a novel and convenient method of measuring secondary electron spectra for insulators in a secondary electron yield measurement system with a planar grid analyzer configuration and a metal mesh probe. In t... We report on a novel and convenient method of measuring secondary electron spectra for insulators in a secondary electron yield measurement system with a planar grid analyzer configuration and a metal mesh probe. In this measurement, the planar grid is negatively biased to force some emitted secondary electrons to return to the sample surface and to neutralize charges accumulated on the sample during the previous beam irradiation. The surface potential of the sample is then measured by use of a metal mesh probe. The grid bias for neutralization corresponding to the zero surface potential is determined based on the linear relationship between the surface potential and the grid bias. Once the surface potential equals zero, the secondary electron spectra of polymethyl methacrylate(PMMA) are studied experimentally by measuring the -curve and then fitting it to Everhart's formula. The measurement results show that the peak energy and the full width at half maximum of the spectra are 4.26 eV and 14.06 eV, respectively. 展开更多
关键词 SE In Measurement of secondary Electron Energy Spectra of Polymethyl Methacrylate
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Feedback model of secondary electron emission in DC gas discharge plasmas 被引量:1
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作者 Saravanan ARUMUGAM Prince ALEX Suraj Kumar SINHA 《Plasma Science and Technology》 SCIE EI CAS CSCD 2018年第2期128-133,共6页
Feedback is said to exist in any amplifier when the fraction of output power in fed back as an input.Similarly,in gaseous discharge ions that incident on the cathode act as a natural feedback element to stabilize and ... Feedback is said to exist in any amplifier when the fraction of output power in fed back as an input.Similarly,in gaseous discharge ions that incident on the cathode act as a natural feedback element to stabilize and self sustain the discharge.The present investigation is intended to emphasize the feedback nature of ions that emits secondary electrons(SEs)from the cathode surface in DC gas discharges.The average number of SEs emitted per incident ion and non ionic species(energetic neutrals,metastables and photons)which results from ion is defined as effective secondary electronemission coefficient(ESEEC,Eg).In this study,we derive an analytic expression that corroborates the relation betweenEg and power influx by ion to the cathode based on the feedback theory of an amplifier.In addition,experimentally,we confirmed the typical positive feedback nature of SEEfrom the cathode in argon DC glow discharges.The experiment is done for three different cathode material of same dimension(tungsten(W),copper(Cu)and brass)under identical discharge conditions(pressure:0.45 mbar,cathode bias:-600 V,discharge gab:15 cm and operating gas:argon).Further,we found that theEg value of these cathode material controls the amount of feedback power given by ions.The difference in feedback leads different final output i.e the power carried by ion at cathode(Pi C¢∣).The experimentally obtained value of Pi C¢∣is 4.28 W,6.87 W and9.26 W respectively for W,Cu and brass.In addition,the present investigation reveals that the amount of feedback power in a DC gas discharges not only affect the fraction of power fed back to the cathode but also the entire characteristics of the discharge. 展开更多
关键词 feedback secondary electron emission DC gas discharges power influx by ion at cathode cathode temperature
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Applications of Secondary Electron Composition Contrast Imaging Method in Microstructure Studies on Heterojunction Semiconductor Devices and Multilayer Materials
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作者 刘安生 邵贝羚 +2 位作者 安生 王敬 刘铮 《Rare Metals》 SCIE EI CAS CSCD 1999年第2期2-8,共7页
The principle, imaging condition and experimental method for obtaining high resolution composition contrast in secondary electron image were described. A new technique of specimen preparation for secondary electron co... The principle, imaging condition and experimental method for obtaining high resolution composition contrast in secondary electron image were described. A new technique of specimen preparation for secondary electron composition contrast observation was introduced and discussed. By using multilayer P+Si1-xGex/pSi heterojunction internal photoemission infrared detector as an example, the applications of secondary electron composition contrast imaging in microstructure studies on heterojunction semiconducting materials and devices were stated. The characteristics of the image were compared with the ordinary transmission electron diffraction contrast image. The prospects of applications of the imaging method in heterojunction semiconductor devices and multilayer materials are also discussed. 展开更多
关键词 secondary electron composition contrast image Heterojunction semiconducting devices Multilayer materials Electron microscopy MICROSTRUCTURE
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Secondary electron emission model for photo-emission from metals in the vacuum ultraviolet
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作者 Ai-Gen Xie Yi-Fan Liu Hong-Jie Dong 《Nuclear Science and Techniques》 SCIE EI CAS CSCD 2022年第8期89-105,共17页
This study investigates two secondary electron emission(SEE)models for photoelectric energy distribution curves f(E_(ph),hγ),B,E_(mean),absolute quantum efficiency(AQE),and the mean escape depth of photo-emitted elec... This study investigates two secondary electron emission(SEE)models for photoelectric energy distribution curves f(E_(ph),hγ),B,E_(mean),absolute quantum efficiency(AQE),and the mean escape depth of photo-emitted electronsλof metals.The proposed models are developed from the density of states and the theories of photo-emission in the vacuum ultraviolet and SEE,where B is the mean probability that an internal photo-emitted electron escapes into vacuum upon reaching the emission surface of the metal,and E_(mean)is the mean energy of photo-emitted electrons measured from vacuum.The formulas for f(E_(ph),hγ),B,λ,E_(mean),and AQE that were obtained were shown to be correct for the cases of Au at hγ=8.1–11.6 eV,Ni at hγ=9.2–11.6 eV,and Cu at hγ=7.7–11.6 eV.The photoelectric cross sections(PCS)calculated here are analyzed,and it was confirmed that the calculated PCS of the electrons in the conduction band of Au at hγ=8.1–11.6eV,Ni at hγ=9.2–11.6 eV,and Cu at hγ=7.7–11.6 eV are correct. 展开更多
关键词 Absolute quantum efficiency Photoelectric cross section Mean escape depth of photo-emitted electrons Probability Photo-emission from metals secondary electron emission Vacuum ultraviolet Mean energy of photo-emitted electrons
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Secondary electron emission yield from vertical graphene nanosheets by helicon plasma deposition
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作者 Xue-Lian Jin Pei-Yu Ji +2 位作者 Lan-Jian Zhuge Xue-Mei Wu Cheng-Gang Jin 《Chinese Physics B》 SCIE EI CAS CSCD 2022年第2期613-617,共5页
The secondary electron emission yields of materials depend on the geometries of their surface structures.In this paper,a method of depositing vertical graphene nanosheet(VGN)on the surface of the material is proposed,... The secondary electron emission yields of materials depend on the geometries of their surface structures.In this paper,a method of depositing vertical graphene nanosheet(VGN)on the surface of the material is proposed,and the secondary electron emission(SEE)characteristics for the VGN structure are studied.The COMSOL simulation and the scanning electron microscope(SEM)image analysis are carried out to study the secondary electron yield(SEY).The effect of aspect ratio and packing density of VGN on SEY under normal incident condition are studied.The results show that the VGN structure has a good effect on suppressing SEE. 展开更多
关键词 secondary electron emission secondary electron yield vertical graphene nanosheets scanning electron microscope
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Characteristics of wall sheath and secondary electron emission under different electron temperatures in a Hall thruster
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作者 段萍 覃海娟 +3 位作者 周新维 曹安宁 陈龙 高宏 《Chinese Physics B》 SCIE EI CAS CSCD 2014年第7期510-515,共6页
In this paper, a two-dimensional physical model is established in a Hall thruster sheath region to investigate the influences of the electron temperature and the propellant on the sheath potential drop and the seconda... In this paper, a two-dimensional physical model is established in a Hall thruster sheath region to investigate the influences of the electron temperature and the propellant on the sheath potential drop and the secondary electron emission in the Hall thruster, by the particle-in-cell (PIC) method. The numerical results show that when the electron temperature is relatively low, the change of sheath potential drop is relatively large, the surface potential maintains a stable value and the stability of the sheath is good. When the electron temperature is relatively high, the surface potential maintains a persistent oscillation, and the stability of the sheath reduces. As the electron temperature increases, the secondary electron emission coefficient on the wall increases. For three kinds of propellants (At, Kr, and Xe), as the ion mass increases the sheath potentials and the secondary electron emission coefficients reduce in sequence. 展开更多
关键词 Hall thruster electron temperature SHEATH secondary electron emission
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On characteristics of sheath damping near a dielectric wall with secondary electron emission
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作者 于达仁 卿绍伟 +1 位作者 闫国军 段萍 《Chinese Physics B》 SCIE EI CAS CSCD 2011年第6期317-322,共6页
A preliminary investigation is conducted to study the characteristics of sheath damping near a dielectric wall with secondary electron emission (SEE). Making use of the linear analysis of the sheath stability, we ha... A preliminary investigation is conducted to study the characteristics of sheath damping near a dielectric wall with secondary electron emission (SEE). Making use of the linear analysis of the sheath stability, we have found two major contributions to the sheath damping, one similar to the Landau damping in uniform plasmas and another determined by local electric field and electron density of the steady-state sheath. It indicates that in a classical sheath regime the damping in the sheath region monotonically increases towards the wall and decreases with the enhancement of SEE effect. In order to verify the theoretical analysis, sheath oscillation processes induced by an initial disturbance are simulated with a time-dependent one-dimensional (1D) sheath model. Numerical results obtained are consistent with the theoretical analysis qualitatively. 展开更多
关键词 plasma sheath DAMPING electron electrostatic wave secondary electron emission
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A novel double dielectric barrier discharge reactor with high field emission and secondary electron emission for toluene abatement
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作者 Shijie LI Xin YU +3 位作者 Xiaoqing DANG Pengyong WANG Xiangkang MENG Huachun ZHENG 《Plasma Science and Technology》 SCIE EI CAS CSCD 2022年第1期118-128,共11页
Dielectric barrier discharge(DBD)has been extensively investigated in the fields of environment and energy,whereas its practical implementation is still limited due to its unsatisfactory energy efficiency.In order to ... Dielectric barrier discharge(DBD)has been extensively investigated in the fields of environment and energy,whereas its practical implementation is still limited due to its unsatisfactory energy efficiency.In order to improve the energy efficiency of DBD,a novel double dielectric barrier discharge(NDDBD)reactor with high field emission and secondary electron emission was developed and compared with traditional DDBD(TDDBD)configuration.Firstly,the discharge characteristics of the two DDBD reactors were analyzed.Compared to TDDBD,the NDDBD reactor exhibited much stronger discharge intensity,higher transferred charge,dissipated power and gas temperature due to the effective utilization of cathode field emission and secondary electron emission.Subsequently,toluene abatement performance of the two reactors was evaluated.The toluene decomposition efficiency and mineralization rate of NDDBD were much higher than that of TDDBD,which were 86.44%-100%versus 28.17%-80.48%and 17.16%-43.42%versus 7.17%-16.44%at 2.17-15.12 W and 1.24-4.90 W respectively.NDDBD also exhibited higher energy yield than TDDBD,whereas the overall energy constant k_(overall)of the two reactors were similar.Finally,plausible toluene decomposition pathway in TDDBD and NDDBD was suggested based on organic intermediates that generated from toluene degradation.The finding of this study is expected to provide reference for the design and optimization of DBD reactor for volatile organic compounds control and other applications. 展开更多
关键词 toluene removal double dielectric barrier discharge field emission secondary electron emission decomposition mechanism
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Effect of Cu doping on the secondary electron yield of carbon films on Ag-plated aluminum alloy
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作者 Tiancun Hu Shukai Zhu +11 位作者 Yanan Zhao Xuan Sun Jing Yang Yun He Xinbo Wang Chunjiang Bai He Bai Huan Wei Meng Cao Zhongqiang Hu Ming Liu Wanzhao Cui 《Chinese Physics B》 SCIE EI CAS CSCD 2022年第4期681-685,共5页
Reducing the secondary electron yield(SEY)of Ag-plated aluminum alloy is important for high-power microwave components.In this work,Cu doped carbon films are prepared and the secondary electron emission characteristic... Reducing the secondary electron yield(SEY)of Ag-plated aluminum alloy is important for high-power microwave components.In this work,Cu doped carbon films are prepared and the secondary electron emission characteristics are studied systematically.The secondary electron coefficientδ_(max) of carbon films increases with the Cu contents increasing at first,and then decreases to 1.53 at a high doping ratio of 0.645.From the viewpoint of surface structure,the higher the content of Cu is,the rougher the surface is,since more cluster particles appear on the surface due to the small solid solubility of Cu in the amorphous carbon network.However,from viewpoint of the electronic structure,the reduction of the sp2 hybrid bonds will increase the SEY effect as the content of Cu increases,due to the decreasing probability of collision with free electrons.Thus,the two mechanisms would compete and coexist to affect the SEY characteristics in Cu doped carbon films. 展开更多
关键词 copper-doped carbon secondary electron yield microwave devices surface roughness
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