Influence of adatom migration on wrinkling morphologies of AlGaN/GaN micro-pyramids grown by selective MOVPE

Ga N micro-pyramids with AlGaN capping layer are grown by selective metal–organic–vapor phase epitaxy(MOVPE). Compared with bare Ga N micro-pyramids, AlGaN/Ga N micro-pyramids show wrinkling morphologies at the bottom of the structure. The formation of those special morphologies is associated with the spontaneously formed AlGaN polycrystalline particles on the dielectric mask, owing to the much higher bond energy of Al–N than that of Ga–N. When the sizes of the polycrystalline particles are larger than 50 nm, the uniform source supply behavior is disturbed, thereby leading to unsymmetrical surface morphology. Analysis reveals that the scale of surface wrinkling is related to the migration length of Ga adatoms along the AlGaN {1ī01} facet. The migration properties of Al and Ga further affect the distribution of Al composition along the sidewalls, characterized by the μ-PL measurement.

AlGaN/GaN high electron mobility transistors with selective area grown p-GaN gates

We report a selective area growth(SAG) method to define the p-GaN gate of AlGaN/GaN high electron mobility transistors(HEMTs) by metal-organic chemical vapor deposition.Compared with Schottky gate HEMTs,the SAG p-GaN gate HEMTs show more positive threshold voltage(V_(th)) and better gate control ability.The influence of Cp_2Mg flux of SAG p-GaN gate on the AlGaN/GaN HEMTs has also been studied.With the increasing Cp_2Mg from 0.16 μmol/min to 0.20 μmol/min,the V_(th) raises from-0.67 V to-0.37 V.The maximum transconductance of the SAG HEMT at a drain voltage of 10 V is 113.9 mS/mm while that value of the Schottky HEMT is 51.6 mS/mm.The SAG method paves a promising way for achieving p-GaN gate normally-off AlGaN/GaN HEMTs without dry etching damage.

Nonpolar Al_(x)Ga_(1−x)N/Al_(y)Ga_(1−y)N multiple quantum wells on GaN nanowire for UV emission

Nonpolar m-plane AlGaN offers the advantage of polarization-free multiple quantum wells(MQWs)for ultraviolet(UV)emission and can be achieved on the sidewalls of selective area grown GaN nanowires.We reveal that the growth of AlGaN on GaN nanowires by metal organic chemical vapor deposition(MOCVD)is driven by vapor-phase diffusion,and consequently puts a limit on the pitch of nanowire array due to shadowing effect.An insight into the difficulty of achieving metal-polar AlGaN nanowire by selective area growth(SAG)in MOCVD is also provided and can be attributed to the strong tendency to form pyramidal structure due to a very small growth rate of{1011}semipolar planes compared to(0001)c-plane.The nonpolar m-plane sidewalls of GaN nanowires obtained via SAG provides an excellent platform for growth of nonpolar AlGaN MQWs.UV emission from mplane Al_(x)Ga_(1−x)N/Al_(y)Ga_(1−y)N MQWs grown on sidewalls of dislocation-free GaN nanowire is demonstrated in the wavelength range of 318–343 nm.

Gate length dependent transport properties of in-plane core-shell nanowires with raised contacts

Three-dimensional(3D)nanoscale crystal shaping has become essential for the precise design of advanced electronic and quantum devices based on electrically gated transport.In this context,Ⅲ-Ⅴ semiconductor-based nanowires with low electron effective mass and strong spin-orbit coupling are particularly investigated because of their exceptional quantum transport properties and the good electrostatic control they provide.Among the main challenges involved in the processing of these nanodevices are(i)the management of the gate stack which requires ex-situ passivation treatment to reduce the density of traps at the oxide/semiconductor interface,(ii)the ability to get good ohmic contacts for source and drain electrodes and(iii)the scalability and reliability of the process for the fabrication of complex architectures based on nanowire networks.In this paper,we show that selective area molecular beam epitaxy of in-plane InGaAs/InP core-shell nanowires with raised heavily doped source and drain contacts can address these different issues.Electrical characterization of the devices down to 4 K reveals the positive impact of the InP shell on the gate electrostatic control and effective electron mobility.Although comparable to the best reported values for In(Ga)As nanostructures grown on InP,this latter is severely reduced for sub-100 nm channel highlighting remaining issue to reach the ballistic regime.