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Self tempering effect of near eutectic Al-Si casting with different wall thickness solidified and cooled in permanent die 被引量:1
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作者 胡心平 谢玲 张娟 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2011年第12期2576-2583,共8页
In order to study the self tempering effect on the solidification of Al-Si alloy, a setup was designed to conduct experiments. The characters of β phases in different thicknesses of Al-Si samples were investigated. T... In order to study the self tempering effect on the solidification of Al-Si alloy, a setup was designed to conduct experiments. The characters of β phases in different thicknesses of Al-Si samples were investigated. The results show that the size distributions of β phases obey the logarithmic normal distribution. The Brinell hardness tests were also carried out. The tested hardness results show that the hardness distribution of the casting cooled in water is evener than that cooled in air, and its averaged value is higher than that cooled in air. 展开更多
关键词 β phase Al-Si alloy self tempering effect Brinell hardness
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Investigation of Thermal Property of Novel DSOI MOSFETs Fabricated with Local SIMOX Technique 被引量:1
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作者 林羲 何平 +4 位作者 田立林 李志坚 董业民 陈猛 王曦 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2003年第2期117-121,共5页
DSOI,bulk Si and SOI MOSFETs are fabricated on the same die successfully using local oxygen implantation process.The thermal properties of the three kinds of devices are described and compared from simulation and mea... DSOI,bulk Si and SOI MOSFETs are fabricated on the same die successfully using local oxygen implantation process.The thermal properties of the three kinds of devices are described and compared from simulation and measurement.Both simulation and measurement prove that DSOI MOSFETs have the advantage of much lower thermal resistance of substrate and suffer less severe self heating effect than their SOI counterparts. At the same time,the electrical advantages of SOI devices can stay.The thermal resistance of DSOI devices is very close to that of bulk devices and DSOI devices can keep this advantage into deep sub micron realm. 展开更多
关键词 DSOI SOI local SIMOX self heating effect thermal resistance
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Deep submicron PDSOI thermal resistance extraction
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作者 卜建辉 毕津顺 +1 位作者 习林茂 韩郑生 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2010年第9期14-16,共3页
Deep submicron partially depleted silicon on insulator(PDSOI) MOSFETs with H-gate were fabricated based on the 0.35μm SOI process developed by the Institute of Microelectronics of the Chinese Academy of Sciences. B... Deep submicron partially depleted silicon on insulator(PDSOI) MOSFETs with H-gate were fabricated based on the 0.35μm SOI process developed by the Institute of Microelectronics of the Chinese Academy of Sciences. Because the self-heating effect(SHE) has a great influence on SOI,extractions of thermal resistance were done for accurate circuit simulation by using the body-source diode as a thermometer.The results show that the thermal resistance in an SOI NMOSFET is lower than that in an SOI PMOSFET;and the thermal resistance in an SOI NMOSFET with a long channel is lower than that with a short channel.This offers a great help to SHE modeling and parameter extraction. 展开更多
关键词 thermal resistance self heating effect PDSOI
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