Growth and Application of Chalcogenides of Lead and Related Compounds

Large grain, low-dislocation, high-quality single crystals of various Pb-salt compounds have been grown reproducibly by the Horizontal Unseeded Vapor Growth (HUVG) technique. The Tunable Diode Lasers with better performance have been made with such crystals. The annealing feature, dislocations and diffusion in the crystals have also been investigated.

A contrivance of 277 nm DUV LD with B0.313Ga0.687N/B0.40Ga0.60N QWs and AlxGa1–xN heterojunction grown on AlN substrate

In this paper,an ultraviolet C-band laser diode lasing at 277 nm composed of B0.313Ga0.687N/B0.40Ga0.60N QW/QB heterostructure on Mg and Si-doped AlxGa1-xN layers was designed,as well as a lowest reported substitutional accepter and donor concentration up to NA=5.0×10^17 cm^-3 and ND=9.0×10^16 cm^-3 for deep ultraviolet lasing was achieved.The structure was assumed to be grown over bulk AIN substrate and operate under a continuous wave at room temperature.Although there is an emphasizing of the suitability for using boron nitride wide band gap in the deep ultraviolet region,there is still a shortage of investigation about the ternary BGaN in aluminum-rich AIGaN alloys.Based on the simulation,an average local gain in quantum wells of 1946 cm^-1,the maximum emitted power of 2.4 W,the threshold current of 500 mA,a slope efficiency of 1.91 W/A as well as an average DC resistance for the V-I curve of(0.336Ω)had been observed.Along with an investigation regarding different EBL,designs were included with tapered and inverse tapered structure.Therefore,it had been found a good agreement with the published results for tapered EBL design,with an overweighting for a proposed inverse tapered EBL design.

LPE Growth of InAsPSb on InAs:Melt Composition,Lattice Mismatch and Surface Morphology

The LPE growth of quaternary InAs11-x-yPxSby with x = 0.2 and y = 0.09 on InAs substrate has been studied. This composition is very suitable for the laser and detector applications at about 2.5 μm. We show that in InAsPSb/InAs system there is a determinate relation between the surface morphology and the lattice mismatch of the epi-wafers, by which we can easily control the melt composition to grow high quality hetero-structures. The reason has been discussed. The p-n junctions with fairly good carrier profile have been prepared in this system.

InAsSb thick epilayers applied to long wavelength photoconductors

InAs0.052Sb0.948 epilayers with cutoff wavelengths longer than 8 μm were successfully grown on InAs substrates using melt epitaxy （ME）. Scanning electron microscopy observations show that the interface between the epilayers and substrates is flat, indicating the good quality of the epilayers, and the thickness of the epilayers is 40 μm. Photoconductors were fabricated using InAs0.052Sb0.948 thick epilayers grown by ME. Ge optical lenses were set on the photoconductors. At room temperature, the photoresponse wavelength range was 2-10μm. The peak detectivity Dλp reached 5.4 × 10^9 cm-Hz^1/2.W^-1 for the immersed detectors. The detectivity D^＊ was 9.3 × 10^8 and 1.3 × 10^8 cm.Hz^1/2.W^-1 at the wavelength of 8 and 9 μm, respectively. The good performance of the uncooled InAsSb detectors was experimentally validated.

High Quality Zinc Sulfide Epitaxial Layers Grown by Metalorganic Chemical Vapour Deposition

ZnS films were successfully grown by metallorganic chemical vapour deposition (MOCVD) at atmospheric pressure on (100) GaAs substrates. The deposition was carried out at a substrate temperature between 280 approximately 550°C with optimisation of reactor design and growth conditions. The gas phase prereaction is effectively restrained. These epilayers exhibit high crystallographic quality and reveal a mirror surface morphology. The peak halfwidths of X-ray diffraction patterns from their (400) faces are within 0.06 approximately 0.09°. The epilayers grown on (111) GaAs, (112¯0) Al2O3 and (100) Si have proven to be single crystalline feature. The optical and electrical characteristics of ZnS epilayers are measured by photoluminescence, cathodeluminescence, and the Van der Pauw method. The results indicate that there are not a large number of deep centers that could be detected both at 77K and at room temperature. A broad CL peak around 2.897eV and 2.672eV was observed only under very strong excitation. Their origin has not been examined. All epilayers present high resistivities up to 1013Ω&middotcm.

Study on Relationship between InGaAsP/InP LPE Wafer Morphology,Interface Property and Device Characteristics

Five kinds of InGaAsP/InP heterostructure materials grown with LPE have been measured by means of Auger electron analysis, X-ray double-crystal diffraction, selective etching and surface morphology analysis. The relation between crystal mismatch and interface property of such materials has been studied and the results could be understood in terms of the growth kinetics at the heterojunction interface. The comparison of the characteristics of the electronic and optoelectronic devices fabricated with the wafers under different interface properties has been carried out. And it also has been demonstrated that the wafer surface morphology changes with the compositional gradation in a certain relationship.

Growth and characterization of InAsSb alloys by metalorganic chemical vapour deposition

Low pressure metalorganic chemical vapour deposition （LP-MOCVD） growth and characteristics of InAsSb on （100） GaSb substrates are investigated. Mirror-like surfaces with a minimum lattice mismatch are obtained. The samples are studied by photoluminescence spectra, and the output is 3.17μm in wavelength. The surface of InAsSb epilayer shows that its morphological feature is dependent on buffer layer. With an InAs buffer layer used, the best surface is obtained. The InAsSb film shows to be of n-type conduction with an electron concentration of 8.52 × 10^16 cm^-3.

Numerical Simulation of the Multicomponent Mass Transfer during Bridgman Growth of CdZnTe Crystal Using Maxwell-Stefan Diffusion Model

To reveal the complicated mechanism of the multicomponent mass transfer during the growth of ternary compound semiconductors, a numerical model based on Maxwell-Stefan equations was developed to simulate the Bridgman growth of CdZnTe crystal. The Maxwell-Stefan diffusion coefficients in the melt were estimated. Distributions of Zn, Cd, and Te were calculated with variable ampoule traveling rate and diffusion coefficients. The experimental results show that Zn in melt near the growth interface decreases and diffuses from the bulk melt to the growth interface. For Cd, the situation is just the opposite. The coupling effects of Zn and Cd diffusions result in an uphill diffusion of Te at the beginning of the growth. Throughout the growth, the concentration of Te in the melt keeps low near the growth interface but high far from the growth interface. Increasing the ampoule traveling rate will aggravate the segregation of Zn and Cd, and hence deteriorate the uniformity of Te. We also find that not only the diffusion coefficients but also the ratios between them have significant influence on the species diffusions.

High power red-light GalnP/AlGalnP laser diodes with nonabsorbing windows based on Zn diffusion-induced quantum well intermixing

The layer structure of GaInP/AlGaInP quantum well laser diodes （LDs） was grown on GaAs substrate using low-pressure metalorganic chemical vapor deposition （LP-MOCVD） technique. In order to improve the catastrophic optical damage （COD） level of devices, a nonabsorbing window （NAW）, which was based on Zn diffusion-induced quantum well intermixing, was fabricated near the both ends of the cavities. Zn diffusions were respectively carried out at 480, 500, 520. 540, and 580 ℃ for 20 minutes. The largest energy blue shift of 189.1 meV was observed in the window regions at 580 ℃. When the blue shift was 24.7 meV at 480 ℃, the COD power for the window LD was 86.7% higher than the conventional LD.

Evolution of stress in evaporated silicon dioxide thin films

The evolution of stress in evaporated SiO2, used as optical coatings, is investigated experimentally through in situ stress measurement. A typical evolution pattern consisting of five subprocedures （thin film deposition, stopping deposition, cooling, venting the vacuum chamber, and exposing coated optics to the atmosphere） is put forward. Further investigations into the subprocedures reveal their features. During the deposition stage, the stresses are usually compressive and reach a stable state when the deposited film is thicker than 100 nm. An increment of compressive stress value is observed with the decrease of residual gas pressure or deposition rate. A very low stress of-20 MPa is formed in SiO2 films deposited at 3×10^-2 Pa. After deposition, the stress increases slightly in the compressive direction and is subject to the stabilization in subsequent tens of minutes. In the process of venting and exposure, the compressive component increases rapidly with the admission of room air and then reaches saturation, followed by a logarithmic decrement of the compressive state in the succeeding hours. An initial discussion of these behaviors is given.

High power AlGaInP laser diodes with zinc-diffused window mirror structure

The technology of zinc-diffusion to improve catastrophic optical damage (COD) threshold of compressively strained GaInP/AlGaInP quantum well laser diodes has been introduced. After zinc-diffusion, about 20 μm-long region at each facet of laser diode has been formed to serve as the window of the lasing light. As a result, the COD threshold has been significantly improved due to the enlargement of bandgap by the zinc-diffusion induced quantum well intermixing, compared with that of the conventional non-window structure. 40-mW continuous wave output power with the fundamental transverse mode has been realized under room temperature for the 3.5μm-wide ridge waveguide diode. The operation current is 84 mA and the slope efficiency is 0.74 W/A at 40 mW. The lasing wavelength is 656 nm.

Low threshold voltage light-emitting diode in silicon-based standard CMOS technology

Low-voltage silicon （Si）-based light-emitting diode （LED） is designed based on the former research of LED in Si-based standard complementary metal oxide semiconductor （CMOS） technology. The low-voltage LED is designed under the research of cross-finger structure LEDs and sophisticated structure enhanced LEDs for high efficiency and stable light source of monolithic chip integration. The device size of low-voltage LED is 45.85x38.4 （#m）, threshold voltage is 2.2 V in common condition, and temperature is 27 ~C. The external quantum efficiency is about 10-6 at stable operating state of 5 V and 177 mA.

Manufacture tolerance analysis and control for a polymer-on-silicon Mach-Zehnder-interferometer-based electro-optic switch

To enhance the electro-optic (EO) modulation efficiency and realize the impedance-matching, a polymer-on-silicon multi-mode interference (MMI) Mach-Zehnder interferometer (MZI)-based electro-optic (EO) switch is designed and optimized. Under the central operation wavelength of 1550 nm, the driving voltages of the designed switch are 0 and ±1.375 V, respectively, with a short active region length of 5 mm, and the characteristic impedance of the electrode is about 49.6 ?. The manufacture tolerance is analyzed for instructing the device fabrication. The results show that to realize ideal switching function, high fabrication accuracy on the buffer thickness, core thickness, electrode width and MMI waveguide width is extremely required, and a small voltage drift of-0.03-0.05 V is also expected for reducing the crosstalk to less than-30 dB. The allowed 3 dB bandwidth is 60 nm, and within this spectrum range, the insertion loss and crosstalk are less than 6.71 dB and-30 dB, respectively.

GaInN light-emitting diodes with omni-directional reflector using nanoporous SnO_2 film

Enhancement of light extraction in a GaInN light-emitting diode （LED） employing an omni-directional reflector （ODR） consisting of GaN, SnO2 nanorod and an Ag layer was presented. The ODR comprises a transparent, quarterwave layer of SnO2 nanorod claded by silver and serves as an ohmic contact to p-type GaN. Transparent SnO2 sols were obtained by sol-gel method from SnCl2·2H2O, and SnO2 thin films were prepared by dip-coating technique. The average size of the spherical SnO2 particles obtained is 200 nm. The refractive index of the nanorod SnO2 film layer is 2.01. The GaInN LEDs with GaN/SnO2/Ag ODR show a lower forward voltage. This was attributed to the enhanced reflectivity of the ODR that employs the nanorod SnO2 film layer. Experimental results show that ODR-LEDs have lower optical losses and higher extraction efficiency as compared to conventional LEDs with Ni/Au contacts and conventional LEDs employing a distributed Bragg reflector （DBR）.

Influence of reaction temperature on the formation process of ZnO quantum dots and the optical properties

ZnO quantum dots (QDs)with the sizes of 3.0-5.6 nm are synthesized by solution-phase method at different temperatures. We find that temperature has great influence on the size of ZnO QDs. The growth process is the most sensitive to temperature, and the process is well explained by Lifshitz–Slyozov–Wagner (LSW) model. By photoluminescence (PL) spectra of the quantum dots at different temperatures and reactive time, we come to a conclusion that ultraviolet emission is mainly due to surface defects, and the or...

Molybdenum thin films fabricated by rf and dc sputtering for Cu(In,Ga)Se2 solar cell applications

Molybdenum （Mo） thin films, most commonly used as electrical back contacts in Cu（In, Ga）Se2 （CIGS） solar cells, are deposited by rf and dc magnetron sputtering in identical systems to study the discrepancy and growth mechanisms of the two sputtering techniques. The results reveal that though different techniques generally de- posit films with different characteristic properties, Mo films with similar structural and physical properties can be obtained at respective suitable deposition conditions. Highly adhesive and conductive Mo films on soda lime glass are further optimized, and the as-fabricated solar cells reach efficiencies as high as 9.4% and 9.1% without an antireflective laver.

Silicon electro-optic modulator with high-permittivity gate dielectric layer

A high-permittivity （high-k） material is applied as the gate dielectric layer in a silicon metal-oxide- semiconductor （MOS） capacitor to form a special electro-optic （EO） modulator. Both induced charge density and modulation efficiency in the proposed modulator are improved due to the special structure design and the application of the high-k material. The device has an ultra-compact dimension of 691 μm in length.

Intrinsic ZnO films fabricated by DC sputtering from oxygen-deficient targets for Cu(In,Ga)Se_2 solar cell application

Intrinsic zinc oxide films, normally deposited by radio frequency （RF） sputtering, are fabricated by direct current （DC） sputtering. The oxygen-deficient targets are prepared via a newly developed double crucible method. The 800-nm-thick film obtaines significantly higher carrier mobility compareing with that of the 800-nm-thick ZnO film. This is achieved by the widely used RF sputtering, which favors the prevention of carrier recombination at the interfaces and reduction of the series resistance of solar cells. The optimal ZnO film is used in a Cu （ln, Ga） Se2 （CIGS） solar cell with a high efficiency of 11.57%. This letter demonstrates that the insulating ZnO films can be deposited by DC sputtering from oxygen-deficient ZnO targets to lower the cost of thin film solar cells.

Portable infrared spectral radiance measurement apparatus based on PbSe detectors

A portable infrared spectral radiance measurement apparatus without the cooling based on PbSe detectors is designed to measure the spectral radiance of the object in the wavelength range from 2.1 to 4.1μm. Cores Luxell 256 module is applied which integrates 256 pixel line array PbSe detectors, amplifiers, analog-to-digital convertors, and Universal Serial Bus output interface. Electric aperture is applied to eliminate the effect of temperature drift. Wavelength and response function of the apparatus is calibrated with the blackbody. Results show that the wavelength resolution is 10 nm. The relative error of measured spectral radiance is below 2.3%.

Dielectrophoretic assembly of ZnO nanowires

The synthesis of zinc oxide （ZnO） nanowires is achieved by vapor phase transportation （VPT） method. The designed quartz tube, whose both ends are narrow and the middle is wider, is used to control the growth of ZnO nanowires. Dielectrophoresis （DEP） method is employed to align and manipulate ZnO nanowires which are ultrasonic dispersed and suspended in ethanol solution. Under the dielectrophoretic force, the nanowires are trapped on the pre-patterned electrodes, and further aligned along the electric field and bridge the electrode gap. The dependence of the alignment yield on the applied voltage and frequency is investigated.