This paper presents the analytical modeling of subthreshold current and subthreshold swing of short- channel fully-depleted （FD） strained-Si-on-insulator （SSOI） MOSFETs having vertical Gaussian-like doping pro- fi...This paper presents the analytical modeling of subthreshold current and subthreshold swing of short- channel fully-depleted （FD） strained-Si-on-insulator （SSOI） MOSFETs having vertical Gaussian-like doping pro- file in the channel. The subthreshold current and subthreshold swing have been derived using the parabolic approx- imation method. In addition to the effect of strain on silicon layer, various other device parameters such as channel length （L）, gate-oxide thickness （tox）, strained-Si channel thickness （ts_Si）, peak doping concentration （Np）, project range （Rp） and straggle （op） of the Gaussian profile have been considered while predicting the device characteris- tics. The present work may help to overcome the degradation in subthreshold characteristics with strain engineering. These subthreshold current and swing models provide valuable information for strained-Si MOSFET design. Ac- curacy of the proposed models is verified using the commercially available ATLASTM, a two-dimensional （2D） device simulator from SILVACO.展开更多
文摘This paper presents the analytical modeling of subthreshold current and subthreshold swing of short- channel fully-depleted （FD） strained-Si-on-insulator （SSOI） MOSFETs having vertical Gaussian-like doping pro- file in the channel. The subthreshold current and subthreshold swing have been derived using the parabolic approx- imation method. In addition to the effect of strain on silicon layer, various other device parameters such as channel length （L）, gate-oxide thickness （tox）, strained-Si channel thickness （ts_Si）, peak doping concentration （Np）, project range （Rp） and straggle （op） of the Gaussian profile have been considered while predicting the device characteris- tics. The present work may help to overcome the degradation in subthreshold characteristics with strain engineering. These subthreshold current and swing models provide valuable information for strained-Si MOSFET design. Ac- curacy of the proposed models is verified using the commercially available ATLASTM, a two-dimensional （2D） device simulator from SILVACO.
