A novel cleaning solution, named FA/O alkaline cleaner, was proposed and demonstrated in the removal of colloidal silica abrasives. In order to remove both the chemical and physical absorbed colloidal silica abrasives...A novel cleaning solution, named FA/O alkaline cleaner, was proposed and demonstrated in the removal of colloidal silica abrasives. In order to remove both the chemical and physical absorbed colloidal silica abrasives, an FA/OII chelating agent and non-ionic surfactant were added into the cleaner. By varying the concentration of chelating agent and non-ionic surfactant, a series of experiments were performed to determine the best cleaning results. This paper discusses the mechanism of the removal of colloidal silica abrasives with a FA/O alkaline cleaner. Based on the experiment results, it is concluded that both the FA/OII chelating and non-ionic surfactant could benefit the removal of colloidal silica abrasives. When the concentration of FAJOII chelating agent and FA/O non-ionic surfactant reached the optima value, it was demonstrated that silica abrasives could be removed efficiently by this novel cleaning solution.展开更多
基金Project supported by the Specific Project Items No.2 in National Long-Term Technology Development Plan(No.2009zx02308-003)the Hebei Province Department of Education Fund(No.QN2014208)
文摘A novel cleaning solution, named FA/O alkaline cleaner, was proposed and demonstrated in the removal of colloidal silica abrasives. In order to remove both the chemical and physical absorbed colloidal silica abrasives, an FA/OII chelating agent and non-ionic surfactant were added into the cleaner. By varying the concentration of chelating agent and non-ionic surfactant, a series of experiments were performed to determine the best cleaning results. This paper discusses the mechanism of the removal of colloidal silica abrasives with a FA/O alkaline cleaner. Based on the experiment results, it is concluded that both the FA/OII chelating and non-ionic surfactant could benefit the removal of colloidal silica abrasives. When the concentration of FAJOII chelating agent and FA/O non-ionic surfactant reached the optima value, it was demonstrated that silica abrasives could be removed efficiently by this novel cleaning solution.
