Comparison of α particle detectors based on single-crystal diamond films grown in two types of gas atmospheres by microwave plasma-assisted chemical vapor deposition

Chemical vapor deposition(CVD)-grown diamond films have been developed as irradiation-resistant materials to replace or upgrade current detectors for use in extreme radiation environments. However, their sensitivity in practical applications has been inhibited by space charge stability issues caused by defects and impurities in pure diamond crystal materials. In this study, two high-quality CVD-grown single-crystal diamond(SCD) detectors with low content of nitrogen impurities were fabricated and characterized. The intrinsic properties of the SCD samples were characterized using Raman spectroscopy, stereomicroscopy, and X-ray diffraction with the rocking curve mode, cathode luminescence(CL), and infrared and ultraviolet-visible-near infrared spectroscopies. After packaging the detectors, the dark current and energy resolution under α particle irradiation were investigated. Dark currents of less than 5 pA at 100 V were obtained after annealing the electrodes, which is comparable with the optimal value previously reported. The detector that uses a diamond film with higher nitrogen content showed poor energy resolution, whereas the detector with more dislocations showed poor charge collection efficiency(CCE). This demonstrates that the nitrogen content in diamond has a significant effect on the energy resolution of detectors, while the dislocations in diamond largely contribute to the poor CCE of detectors.

Fabrication of a single-crystal diamond neutron detector and its application in 14.1 MeV neutron detection in deuterium-tritium fusion experiments

A single-crystal diamond detector is fabricated to diagnose 14.1 MeV deuterium-tritium(D-T)fusion neutrons.The size of its diamond film is 4.5 mm×4.5 mm×500μm.This film is sandwiched by a flat,strip-patterned gold electrode.The dark current of this detector is experimentally measured to be lower than 0.1 nA under an electric field of 30 kV cm^(-1).This diamond detector is used to measure D-T fusion neutrons with a flux of about 7.5×10^(5) s^(-1)cm^(-2).The pronounced peak with a central energy of 8.28 MeV characterizing the^(12)C(n,α)~9Be reaction in the neutron energy spectrum is experimentally diagnosed,and the energy resolution is better than 1.69%,which is the best result reported so far using a diamond detector.A clear peak with a central energy of 6.52 MeV characterizing the^(12)C(n,n')3αreaction is also identified with an energy resolution of better than 7.67%.

Laser patterning of large-scale perovskite single-crystal-based arrays for single-mode laser displays

Lead halide perovskites have attracted considerable attention as potential candidates for high-performance nano/microlasers,owing to their outstanding optical properties.However,the further development of perovskite microlaser arrays(especially based on polycrystalline thin films)produced by the conventional processing techniques is hindered by the chemical instability and surface roughness of the perovskite structures.Herein,we demonstrate a laser patterning of large-scale,highly crystalline perovskite single-crystal films to fabricate reproducible perovskite single-crystal-based microlaser arrays.Perovskite thin films were directly ablated by femtosecond-laser in multiple low-power cycles at a minimum machining line width of approximately 300 nm to realize high-precision,chemically clean,and repeatable fabrication of microdisk arrays.The surface impurities generated during the process can be washed away to avoid external optical loss due to the robustness of the single-crystal film.Moreover,the high-quality,large-sized perovskite single-crystal films can significantly improve the quality of microcavities,thereby realizing a perovskite microdisk laser with narrow linewidth(0.09 nm)and low threshold(5.1µJ/cm2).Benefiting from the novel laser patterning method and the large-sized perovskite single-crystal films,a high power and high color purity laser display with single-mode microlasers as pixels was successfully fabricated.Thus,this study may offer a potential platform for mass-scale and reproducible fabrication of microlaser arrays,and further facilitate the development of highly integrated applications based on perovskite materials.

Relationship between the spatial position of the seed and growth mode for single-crystal diamond grown with an enclosed-type holder

The relationship between the spatial position of the diamond seed and growth mode is investigated with an enclosedtype holder for single-crystal diamond growth using the microwave plasma chemical vapor deposition epitaxial method.The results demonstrate that there are three main regions by varying the spatial position of the seed.Due to the plasma concentration occurring at the seed edge,a larger depth is beneficial to transfer the plasma to the holder surface and suppress the polycrystalline diamond rim around the seed edge.However,the plasma density at the edge decreases drastically when the depth is too large,resulting in the growth of a vicinal grain plane and the reduction of surface area.By adopting an appropriate spatial location,the size of single-crystal diamond can be increased from 7 mm×7 mm×0.35 mm to8.6 mm×8.6 mm×2.8 mm without the polycrystalline diamond rim.

Epitaxial growth of CsPbBr_(3)/PbS single-crystal film heterostructures for photodetection

Epitaxial high-crystallization film semiconductor heterostructures has been proved to be an effective method to prepare single-crystal films for different functional devices in modern microelectronics,electro-optics,and optoelectronics.With superior semiconducting properties,halide perovskite materials are rising as building blocks for heterostructures.Here,the conformal vapor phase epitaxy of CsPbBr3 on PbS single-crystal films is realized to form the CsPbBr3/PbS heterostructures via a two-step vapor deposition process.The structural characterization reveals that PbS substrates and the epilayer CsPbBr3 have clear relationships:CsPbBr3(110)//PbS(100),CsPbBr3[001]//PbS[001]and CsPbBr3[001]//PbS[010].The absorption and photoluminescence(PL)characteristics of CsPbBr3/PbS heterostructures show the broadband light absorption and efficient photogenerated carrier transfer.Photodetectors based on the heterostructures show superior photoresponsivity of 15 A/W,high detectivity of 2.65×10^(11) Jones,fast response speed of 96 ms and obvious rectification behavior.Our study offers a convenient method for establishing the high-quality CsPbBr3/PbS single-crystal film heterostructures and providing an effective way for their application in optoelectronic devices.

Ohmic and Schottky contacts of hydrogenated and oxygenated boron-doped single-crystal diamond with hill-like polycrystalline grains

Hill-like polycrystalline diamond grains(HPDGs)randomly emerged on a heavy boron-doped p+single-crystal diamond(SCD)film by prolonging the growth duration of the chemical vapor deposition process.The Raman spectral results confirm that a relatively higher boron concentration(~1.1×10^(21) cm^(-3))is detected on the HPDG with respect to the SCD region(~5.4×10^(20) cm^(-3)).It demonstrates that the Au/SCD interface can be modulated from ohmic to Schottky contact by varying the surface from hydrogen to oxygen termination.The current-voltage curve between two HPDGs is nearly linear with either oxygen or hydrogen termination,which means that the HPDGs provide a leakage path to form an ohmic contact.There are obvious rectification characteristics between oxygen-terminated HPDGs and SCD based on the difference in boron doping levels in those regions.The results reveal that the highly boron-doped HPDGs grown in SCD can be adopted as ohmic electrodes for Hall measurement and electronic devices.

A MONTE CARLO SIMULATION OF THE CVD DIAMOND FILM

A Monte Carlo algorithm has been developed by the authors to simulate the chemical vapor deposition (CVD) processes of diamond films. The method considers both the diffusion and the incorporation of the growth radicals on the growing surface in simulating the evolution of the morphology and microstructure. The calculation of configuration energy is used to determine the orientation of adsorbed growth radicals. The effect of processing variables such as nucleation density and substrate temperature on the morphology and microstructure is discussed. It is found that competitive characteristic and coarsening effect exist in the simulation results, which agree with the experimental observations.

Electrochemical Characteristics and Applications of Boron-Doped Polycrystalline Diamond Film Electrodes

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Effects of Alcohol Addition on the Deposition of Diamond Thick Films by dc Plasma Chemical Vapor Deposition Method

Diamond films have been deposited by dc plasma chemical vapor deposition method.The addition of alcohol in the resource gas largely increases the deposition rate.The effects of alcohol addition on deposition rate and film quality are analyzed by scanning electron microscopy and Raman spectrometry.The mechanism of experimental phenomena is discussed.

Blue-Green Electroluminescence of Free-Standing Diamond Thin Films

Blue-green electroluminescence has been observed in free-standing diamond films which were deposited by microwave plasma assisted CVD on silicon substrates.The electroluminescence device is driven by a 60 Hz power supply.The threshold voltage was about 112 V peak-to-peak.The electroluminescence spectrum at room temperature,showed a blue-green band with the peak centered at 485nm suggesting band A type emission.Electroluminescence was also observed at 77K.

Mechanism and prediction of failure of diamond films deposited on various substrates by HFCVD

Diamond films were deposited on the WC-Co cemented carbide and Si3N4 ceramic cutting tool substrates by hot-filament-assisted chemical vapour deposition. The adherence property of diamond films was estimated using the critical load (Pcr) in the indentation test. The adhesive strength of diamond films is related to the intermediate layer between the film and the substrate. Poor adhesion of diamond films to polished cemented carbide substrate is owing to the formation of graphite phase in the interface. The adhesion of diamond films deposited on acid etched cemented carbide substrate is improved, and the peeling-off of the films often happens in the loosen layer of WC particles where the cobalt element is nearly removed. The diamond films' adhesion to cemented carbide substrate whose surface layer is decarbonizated is strengthened dramatically because WC phase forms by reaction between the deposited carbon and tungsten in the surface layer of substrates during the deposition of diamond, which results in chemical combination in the film-substrate interface. The adhesion of diamond films to silicon nitride substrate is the firmest due to the formation of chemical combination of the SiC intermediate layer in the interfaces. In the piston-turning application, the diamond-coated Si3N4 ceramic and the cemented carbide cutting tools usually fail in the form of collapsing of edge and cracking or flaking respectively. They have no built-up edge(BUE) as long as coating is intact.As it wears through, BUE develops and the cutting force on it increases 1 - 3 times than that prior to failure. This can predict the failure of diamond-coated cutting tools.

Emission spectra of microwave plasma and MPCVD transparent diamond film

The emission spectra of microwave plasma was in line measured in visible light wave band using a self made optical fiber spectrometer, the change rule of the atomic hydrogen ( H ) and double carbon radical( C 2) was given under different CH 4/H 2 ratios of volume flow. The effect of atomic hydrogen ( H ) on CVD diamond, deposited high quality and transparent diamond film by microwave plasma CVD (MPCVD) was analyzed according to the measured results by scanning electron microscopy(SEM), laser Raman spectrometry(Raman), and Fourier transform infrared spectrometry(FTIR). The results showed that the diamond film consisted of (220) orientation and it was homogeneous, compact, low defective, high quality film, its infrared transmissibility was about 70%, approached theoretical transmissibility of diamond. It was key conditions that a large number of atomic hydrogen ( H γ ) and double carbon radical( C 2) exist in the course of high quality diamond film growth. The research provided a rapid method for technology exploration of microwawe plasma CVD, and a reliable basis for research on growth mechanism of diamond film.

Preparation and Characterization of High Quality Diamond Films by DC ArcPlasma Jet CVD Method

OneoftheimpoftantprogressesinCVDdiamondresearchesisthepreparationofopticalgradetransparentdiamondfilmsinrecentyears[l-2].ThephysicalandchemicalpropertiesofthesefilmsarenearlythesameasthatofthenaturaltypeIladiamond,soopticalgradediamondfilmshavepotent...

The fabrication of ideal diamond disk(IDD)by casting diamond film on silicon wafer

With the relentless densification of interconnected circuitry dictated by Moore’ s Law,the CMP manufacture of such delicate wafers requires the significant reduction of polishing pressure of integrated circuits,not only globally,but also locally on every tip of the pad asperities.Conventional diamond disks used for dressing the polyurethane pads cannot produce asperities to achieve such uniformity.A new design of diamond disk was fabricated by casting diamond film on a silicon wafer that contains patterned etching pits. This silicon mold was subsequently removed by dissolution in a hydroxide solution.The diamond film followed the profile of the etching pits on silicon to form pyramids of identical in size and shape.The variation of their tip heights was in microns of single digit that was about one order of magnitude smaller than conventional diamond disks for CMP production.Moreover,the diamond film contained no metal that might contaminate the circuits on polished wafer during a CMP operation.The continuous diamond film could resist any corrosive attack by slurry of acid or base.Consequently,in-situ dressing during CMP is possible that may improve wafer uniformity and production throughput.This ideal diamond disk(IDD) is designed for the future manufacture of advanced semiconductor chips with node sizes of 32 nm or smaller.

A review on polishing technology of large area free-standing CVD diamond films

Recently,with the rapid development of chemical vapor deposition(CVD)technology,large area free-standing CVD diamond films have been produced successfully.However,the coarse grain size on the surface and the non-uniform thickness of unprocessed CVD diamond films make it difficult to meet the application requirement.The current study evaluates several existing polishing methods for CVD diamond films,including mechanical polishing,chemical mechanical polishing and tribochemical polishing technology.

Effect of nitrogen on deposition and field emission properties of boron-doped micro-and nano-crystalline diamond films

In this paper,we report the effect of nitrogen on the deposition and properties of boron doped diamond films synthesized by hot filament chemical vapor deposition.The diamond films consisting of micro-grains(nano-grains) were realized with low(high) boron source flow rate during the growth processes.The transition of micro-grains to nano-grains is speculated to be strongly(weekly) related with the boron(nitrogen) flow rate.The grain size and Raman spectral feature vary insignificantly as a function of the nitrogen introduction at a certain boron flow rate.The variation of electron field emission characteristics dependent on nitrogen is different between microcrystalline and nanocrystalline boron doped diamond samples,which are related to the combined phase composition,boron doping level and texture structure.There is an optimum nitrogen proportion to improve the field emission properties of the boron-doped films.

Nucleation and Oriented Textured Growth of Diamond Films on Si(100) via Electron Emission in Hot Filament Chemical Vapor Deposition

Oriented textured diamond films were obtained on Si（100） substrate via electron emission in hot filament chemical vapor deposition （HFCVD）. A dc bias voltage relative to the filament was applied to the tungsten electrode between the substrate and the filament. The nucleation and subsequent growth of diamond films were characterized by scanning electron microscopy and Raman spectroscopy. The experimental results showed that the electron emission from the diamond coating on the electrode played a critical role during the nucleation.The maximum value of nucleation density was up to 1011 cm-2 on pristine Si surface at emission current of 250 mA. The effect of the electron emission on the reactive gas composition was analyzed by in situ infrared absorption, indicating that the concentration of CH3 and C2H2 near the substrate surface was extremely increased. This may be responsible for the enhanced nucleation by electron emission.

Factors Influencing Thermal Conductivity in Diamond Film

Diamond films were synthesized on Si substrate by electron-assisted chemical vapor deposition method using gas mixtures of methane(or acetone)and hydrogen.Various crystal structures of diamond films were obtained by synthesis with various deposition conditions.The influences of various deposition conditions on thermal conductivity of diamond film were studied.The results show that large-grain(100)-oriented diamond films synthesized at lower concentration of methane and acetone have higher thermal conductivity,and thermal conductivity increases with the increasing in film thickness and the removal of the Sic layer on the back of the film,at last,annealing in ambience of hydrogen is advantageous to acquiring diamond film with high thermal conductivity.

Effects of the electric field at the edge of a substrate to deposit a φ100 mm uniform diamond film in a 2.45 GHz MPCVD system

In this study,uniform diamond films with a diameter of 100 mm were deposited in a 15 kW/2.45 GHz ellipsoidal microwave plasma chemical vapour deposition system.A phenomenological model previously developed by our group was used to simulate the distribution of the electric strength and electron density of plasma.Results indicate that the electric field in the cavity includes multiple modes,i.e.TM_(02) and TM_(03).When the gas pressure exceeds 10 kPa,the electron density of plasma increases and plasma volume decreases.A T-shaped substrate was developed to achieve uniform temperature,and the substrate was suspended in air fromφ70 to 100 mm,thus eliminating vertical heat dissipation.An edge electric field was added to the system after the introduction of the T-shaped substrate.Moreover,the plasma volume in this case was greater than that in the central electric field but smaller than that in the periphery electric field of the TM_(02) mode.This indicates that the electric field above and below the edge benefits the plasma volume rather than the periphery electric field of the TM_(02) mode.The quality,uniformity and surface morphology of the deposited diamond films were primarily investigated to maintain substrate temperature uniformity.When employing the improved substrate,the thickness unevenness of theφ100 mm diamond film decreased from 22%to 7%.

Simulations of the Dependence of Gas Physical Parameters on Deposition Variables during HFCVD Diamond Films

在钻石拍摄的热细丝化学药品蒸汽免职(HFCVD ) 的生长期间，在 2-D 的数字模拟数学模型被雇用在煤气的物理参数上调查各种各样的免职参数的影响包括温度，气体的速度和卷密度。甚至在优化免职参数的情况中，煤气的参数的空间分布是异构的，这被发现首先对热阻塞到期来自热细丝和低温实验法的泵效果从冷反应堆墙产生。卷密度的分发与热圆流动的现象同意了很好，到获得高生长的关键障碍之一在 HFCVD 评价进程。在有高温度或反应堆墙的断热的边界状况的等温的边界的优点，然而， thermalround 流动深刻地被减少并且作为后果，煤气的物理参数的一致性更加被改进，由试验性的电影生长识别了。