Thickness effect on solar-blind photoelectric properties of ultrathinβ-Ga_(2)O_(3)films prepared by atomic layer deposition

Theβ-Ga_(2)O_(3)films with different thicknesses are prepared by an atomic layer deposition system.The influence of film thickness on the crystal quality is obvious,indicating that the thicker films perform better crystal quality,which is verified from x-ray diffraction(XRD)and scanning electron microscope(SEM)results.The Ga_(2)O_(3)-based solar blind photodetectors with different thicknesses are fabricated and studied.The experimental results show that the responsivity of the photodetectors increases exponentially with the increase of the film thickness.The photodetectors with inter-fingered structure based on 900 growth cyclesβ-Ga_(2)O_(3)active layers(corresponding film thickness of 58 nm)exhibit the best performances including a low dark current of 134 fA,photo-to-dark current ratio of 1.5×10^(7),photoresponsivity of 1.56 A/W,detectivity of 2.77×10^(14)Jones,and external quantum efficiency of 764.49%at a bias voltage of 10 V under 254-nm DUV illumination.The photoresponse rejection ratio(R_(254)/R_(365))is up to 1.86×10^(5).In addition,we find that the photoelectric characteristics also depend on the finger spacing of the MSM structure.As the finger spacing decreases from 50μm to10μW,the photoresponsivity,detectivity,and external quantum efficiency increase significantly.

Transition of photoconductive and photovoltaic operation modes in amorphous Ga_2O_3-based solar-blind detectors tuned by oxygen vacancies

We report on the transition of photovoltaic and photoconductive operation modes of the amorphous Ga_2O_3-based solar-blind photodetectors in metal–semiconductor–metal(MSM) configurations. The conversion from Ohmic to Schottky contacts at Ti/Ga_2O_3 interface is realized by tuning the conductivity of amorphous Ga_2O_3 films with delicate control of oxygen flux in the sputtering process. The abundant donor-like oxygen vacancies distributed near the Ti/Ga_2O_3 interface fascinate the tunneling process across the barrier and result in the formation of Ohmic contacts. As a consequence, the serious sub-gap absorption and persistent photoconductivity(PPC) effect degrades the performance of the photoconductive detectors. In contrast, the photovoltaic device with a Schottky contact exhibits an ultra-low dark current less than 1 pA,a high detectivity of 9.82×10^(12) cm·Hz^(1/2)·W^(-1), a fast response time of 243.9 μs, and a high ultraviolet C(UVC)-toultraviolet A(UVA) rejection ratio of 103. The promoting performance is attributed primarily to the reduction of the subgap states and the resultant suppression of PPC effect. With simple architecture, low fabrication cost, and easy fusion with modern high-speed integrated circuitry, these results provide a cost-effective way to realize high performance solar-blind photodetectors towards versatile practical applications.

Enhanced photoresponse performance in Ga/Ga_2O_3 nanocomposite solar-blind ultraviolet photodetectors

In the present work, we explore the solar-blind ultraviolet（UV） photodetectors（PDs） with enhanced photoresponse,fabricated on Ga/Ga2O3 nanocomposite films. Through pre-burying metal Ga layers and thermally post-annealing the laminated Ga2 O3/Ga/Ga2O3 structures, Ga/Ga2O3 nanocomposite films incorporated with Ga nanospheres are obtained. For the prototype PD, it is found that the photocurrent and photoresponsivity will first increase and then decrease monotonically with the thickness of the pre-buried Ga layer increasing. Each of all PDs shows a spectrum response peak at 260 nm, demonstrating the ability to detect solar-blind UV light. Adjustable photoresponse enhancement factors are achieved by means of the surface plasmon in the nanocomposite films. The PD with a 20 nm thick Ga interlayer exhibits the best solar-blind UV photoresponse characteristics with an extremely low dark current of 8.52 p A at 10-V bias, a very high light-to-dark ratio of ～ 8 × 10~5, a large photoresponsivity of 2.85 A/W at 15-V bias, and a maximum enhancement factor of ～ 220. Our research provides a simple and practical route to high performance solar-blind UV PDs and potential applications in the field of optoelectronics.

Preparation of Ga_2O_3 thin film solar-blind photodetectors based on mixed-phase structure by pulsed laser deposition

Gallium oxide(Ga_2O_3) thin films were deposited on a-Al2O3(1120) substrates by pulsed laser deposition(PLD) with different oxygen pressures at 650?C. By reducing the oxygen pressure, mixed-phase Ga_2O_3 films with α and β phases can be obtained, and on the basis of this, mixed-phase Ga_2O_3 thin film solar-blind photodetectors(SBPDs) were prepared.Comparing the responsivities of the mixed-phase Ga_2O_3 SBPDs and the single β-Ga_2O_3 SBPDs at a bias voltage of 25 V,it is found that the former has a maximum responsivity of approximately 12 A/W, which is approximately two orders of magnitude larger than that of the latter. This result shows that the mixed-phase structure of Ga_2O_3 thin films can be used to prepare high-responsivity SBPDs. Moreover, the cause of this phenomenon was investigated, which will provide a feasible way to improve the responsivity of Ga_2O_3 thin film SBPDs.

Effect of temperature on photoresponse properties of solar-blind Schottky barrier diode photodetector based on single crystal Ga_2O_3

A solar-blind photodetector is fabricated on single crystal Ga_2O_3 based on vertical structure Schottky barrier diode. A Cu Schottky contact electrode is prepared in a honeycomb porous structure to increase the ultraviolet(UV) transmittance.The quantum efficiency is about 400% at 42 V. The Ga_2O_3 photodetector shows a sharp cutoff wavelength at 259 nm with high solar-blind/visible(= 3213) and solar-blind/UV(= 834) rejection ratio. Time-resolved photoresponse of the photodetector is investigated at 253-nm illumination from room temperature(RT) to 85.8℃. The photodetector maintains a high reversibility and response speed, even at high temperatures.

Rectifying characteristics and solar-blind photoresponse in β-Ga2O3/ZnO heterojunctions

Heterojunctions composed ofβ-Ga2 O3 and ZnO films are fabricated on sapphire substrates by using the laser molecular beam epitaxy method.The heterojunction possesses excellent rectifying characteristics with an asymmetry ratio over 105.Prominent solar-blind photoresponse effect is also observed in the formed heterojunction.The photodetector exhibits a self-powered behavior with a fast response speed(rise time and decay time are 0.035 s and 0.032 s respectively)at zero bias.The obtained high performance can be related to the built-in field driven photogenerated electron-hole separation.

Recent advances in Ga-based solar-blind photodetectors

Solar-blind ultraviolet photodetectors have many advantages, such as low false alarm rates, the ability to detect weak signals, and high signal-to-noise ratios. Among the various functional solar-blind ultraviolet photodetectors, Ga-based alloys of AlGaN and Ga_2O_3 are the most commonly adopted channel semiconductor materials and have attracted extensive research attention in the past decades. This review presents an overview of the recent progress in Ga-based solar-blind photodetectors. In case of AlGaN-based solar-blind ultraviolet photodetectors, the response properties can be improved by optimizing the AlN nucleation layer and designing the avalanche structure. On the other hand, we also discuss the morphology and growth methods of Ga_2O_3 nanomaterials and their effect on the performance of the corresponding solarblind photodetectors. The mechanically exfoliated Ga_2O_3 flakes show good potential for ultraviolet detection. Also, Ga_2O_3 nanoflowers and nanowires reveal perfect response to ultraviolet light. Finally, the challenges and future development of Ga-based functional solar-blind ultraviolet photodetectors are summarized.

AlGaN solar‐blind APD with low breakdown voltage

A p-i-i-n type AlG a N heterostructure avalanche photodiodes(APDs)is proposed to decrease the avalanche breakdown voltage and to realize higher gain by using high-Al-content AlG aN layer as multiplication layer and low-Al-content AlG aN layer as absorption layer.The calculated results show that the designed APD can significantly reduce the breakdown voltage by almost 30%,and about sevenfold increase of maximum gain compared to the conventional Al GaN APD.The noise in designed APD is also less than that in conventional APD due to its low dark current at the breakdown voltage point.Moreover,the one-dimensional(1D)dual-periodic photonic crystal(PC)with anti-reflection coating filter is designed to achieve the solar-blind characteristic and cutoff wavelength of 282 nm is obtained.

A theoretical and experimental evaluation of Ⅲ–nitride solar-blind UV photocathode

We have developed a superior solar-blind ultraviolet （UV） photocathode with an AlxGa1_xrN photocathode （x ～ 0.45） in semi-transparent mode, and assessed spectra radiant sensitivity related to practical use. Betbre being grown over a basal plane sapphire substrate by low-pressure metal organic chemical vapor deposition （MOCVD）, a reasonable design was made to the photocathode epitaxy structure, focusing on the AlxGa1_xN： Mg active layer, then followed by a comprehen- sive analysis of the structural and optical characterization. The spectra radiant sensitivity is peaked of 41.395 mA/W at wavelength 257 nm and then decreases by about 3 to 4 decades at 400 nm demonstrating the ability of this photocathode for solar-blind application prospects.

Solar-blind ultraviolet band-pass filter based on metal–dielectric multilayer structures

Solar-blind ultraviolet （UV） band-pass filter has significant value in many scientific, commercial, and military appli- cations, in which the detection of weak UV signal against a strong background of solar radiation is required. In this work, a solar-blind filter is designed based on the concept of ＂transparent metal＂. The filter consisting of Al/SiO2 multilayers could exhibit a high transmission in the solar-blind wavelength region and a wide stopband extending from near-ultraviolet to infrared wavelength range. The central wavelength, bandwidth, Q factor, and rejection ratio of the passband are numerically studied as a function of individual layer thickness and multilayer period.

基于石墨电极的硅基金刚石日盲紫外探测器

金刚石优异的材料特性使其在日盲紫外探测领域有很大的应用潜力。本文采用微波等离子体化学气相沉积设备在(111)晶面单晶硅衬底上沉积金刚石薄膜,并基于该薄膜采用光刻胶热解法制备石墨材料平面叉指电极MSM结构金刚石日盲紫外探测器,为全碳金刚石探测器的实现提供了新方法。结果表明,该硅基金刚石薄膜为高取向多晶薄膜,(111)晶面的XRD 2θ扫描半峰宽为0.093°,拉曼光谱金刚石特征峰峰位1332 cm^(-1),半峰宽为4 cm^(-1),薄膜晶体质量较高;石墨电极紫外探测器在5 V偏置电压下的暗电流为2.07×10^(-8) A,光暗电流比为77,开关特性良好,并且石墨电极探测器具有优异的时间响应,上升时间为30 ms,下降时间为430 ms。

氧化镓悬臂式薄膜日盲探测器及其电弧检测应用

金属-半导体-金属(MSM)型氧化镓薄膜探测器的性能高度依赖于氧化镓薄膜的均匀性,工艺难度较高,对规模化、量产化薄膜探测器提出了挑战.本文首次在量产化悬臂式薄膜芯片表面物理沉积氧化镓薄膜,实现了一个五对叉指电极结构的MSM型氧化镓薄膜日盲探测器.得益于微机电系统(MEMS)工艺制备的悬臂式电极结构保护了内部电路与探测薄膜的完整均匀性,所获得的氧化镓薄膜虽然是非晶结构,但探测器仍然具备良好的紫外探测性能.在18 V偏压下其探测率达到7.9×10^(10) Jones,外量子效率达到1779%,上升和下降时间分别为1.22 s和0.24 s,接近晶体氧化镓薄膜的探测性能.该探测器在无任何光学聚焦系统的情况下,实现了对户外日光环境下脉冲电弧的灵敏检测,将在日盲探测领域具有良好的潜在应用价值.本工作基于MEMS工艺的悬臂式电极结构开发的敏感功能薄膜沉积技术,避免了功能薄膜大面积均匀性对刻蚀电路的影响,为MSM型薄膜探测器的制备提供了新的技术方法和工艺路线.

日盲型AlGaN紫外阵列探测器研制

针对日盲紫外波段光信号的探测,研制了1 280×1 024/15μm×15μm AlGaN阵列型紫外探测器。像元采用共用N面电极的PIN台面结构,介绍了器件的结构、材料生长和制作工艺,并对器件进行了光电性能测试。结果表明:器件的正向开启电压大于10 V,反向击穿电压大于90 V;0.5 V偏压时单像元暗电流约为0.1 fA,1 V偏压时光谱响应范围为255~282 nm, 270 nm峰值波长响应度约为0.12 A/W。器件实现了日盲紫外成像演示。

基于日盲紫外光辐射特性的非共光轴紫外成像仪集成研制

基于日盲紫外波段放电发射光谱特性和紫外光(ultraviolet,UV)辐射传输特性,集成研制可见光与紫外非共光轴结构的日盲紫外成像仪。首先,利用放电发射光谱测量试验平台,获得针-板模型和瓷绝缘子沿面放电的日盲紫外波段发射光谱。紫外成像仪采用非共光轴双光路结构设计,根据测得的放电发射光谱选定了日盲紫外滤光片,并基于紫外光辐射传输特性确定了通光口径、系统焦距和80%弥散斑半径等紫外光学系统技术指标。然后,利用仿射变换模型和加权平均法进行了可见光与紫外图像融合系统设计,集成后仪器样机的最小紫外灵敏度为2×10^(-10)μW/cm^(2)。最后,利用紫外检测结果一致性校准方法,建立了紫外检测辐射传输模型,对集成研制的紫外成像仪进行了一致性校准。

氧分压对a-Ga_(2)O_(3)基日盲紫外光电探测器性能的影响研究

非晶氧化镓(a-Ga_(2)O_(3))基日盲紫外光电探测器的性能与a-Ga_(2)O_(3)薄膜内的氧空位有关,氧空位的浓度制约着探测器的响应度和响应速度。为了在探测器的响应度和响应速度之间达到平衡,本文通过微调射频磁控溅射过程中的氧分压,调控薄膜内的氧空位浓度,并在此基础上成功制备金属-半导体-金属(metal-semiconductor-metal,MSM)型日盲紫外探测器。研究结果显示,通过掺入氧气能减少薄膜内的氧空位,改善薄膜的致密度。适当条件的氧分压可以使探测器在维持良好响应度的前提下,同时拥有较快的响应速度,在两种互相制约的特性上达到了平衡。特别地,在3%氧分压条件下制备得到的日盲探测器在254 nm、80μW/cm^(2)的紫外光照射下具有2.6 A/W的响应度以及2.2 s/0.96 s的快速响应速度。

超广角透射式日盲紫外光学系统设计

为了扩大日盲紫外光学系统在高压电晕放电检测、战术导弹告警等领域中的检测视场角范围,首先基于反远距结构型式,在近轴光学镜头前添加2片负弯月型透镜,使得光学系统的全视场角达到100°;然后,提出了应用高斯光学和三阶像差理论来确定近轴光学镜头中3片透镜的一阶光学参数的方法,再应用光学设计软件设计了一款超广角透射式日盲紫外光学系统。该光学系统工作波段为240~280 nm,F数为4,焦距为1.0 mm;系统中5片透镜均采用熔石英光学材料、标准球面,大大降低了系统复杂程度和加工制造成本。此外,该超广角透射式日盲紫外光学系统在奈奎斯特频率为20 lp/mm时,全视场角的调制传递函数值均高于0.42,相对照度大于97.9%且能量损失小,成像质量好,具有一定的实际应用前景。本工作为该类光学系统初始结构参数确定及设计提供了一种有效的指导方法。

n-Ga_(2)O_(3)/p-GaAs异质结日盲紫外探测器制备

采用金属有机化学气相沉积(MOCVD)工艺在p-GaAs(100)衬底上外延了Ga_(2)O_(3)薄膜并制备了n-Ga_(2)O_(3)/p-GaAs异质结日盲紫外探测器。通过X射线衍射仪、原子力显微镜、场发射扫描电子显微镜等方法对Ga_(2)O_(3)薄膜表面形貌、晶体质量进行了测试与分析。结果表明,Ga_(2)O_(3)薄膜呈单一晶向,薄膜表面平整且为Volmer-Weber模式外延。测试表明,n-Ga_(2)O_(3)/p-GaAs异质结探测器具有明显的整流特性。器件在5 V反向偏压和紫外光(254 nm)照射下实现了超过3.0×10^(4)的光暗电流比、7.0 A/W的响应度、3412%的外量子效率、4.6×10^(13)Jones的探测率。我们利用TCAD软件对器件结构进行仿真,得到了器件内的电场分布和能带结构,并分析了器件的工作原理。该异质结探测器性能较好,制造工艺简单,为Ga_(2)O_(3)超灵敏日盲紫外探测器的研制提供了新途径。

感光层厚度对a-GaO_(x)基日盲紫外光电探测器的性能影响研究

为制备高性能日盲紫外光电探测器,采用低温金属有机物化学气相沉积方法制备了非晶氧化镓薄膜。通过对薄膜结构特性测试证明了薄膜的非晶特性,并且薄膜表面较为平坦,光学吸收边位于深紫外波段范围内。在此基础上,研制了日盲紫外光电探测器。随非晶氧化镓感光层厚度由33.2 nm增至133.6 nm,探测器的光电流和暗电流均提升了2个数量级,并且响应度和外量子效率均随感光层厚度提升而增大,探测器的响应度和外量子效率的最大值分别达到2.91 A/W和1419.12%。探测器的厚度依赖特性可归因于界面高缺陷层、光吸收强度以及探测器的几何参数。此外,探测器展现出良好的波长选择性以及时间分辨响应稳定性。

基于紫外光辐射照度特征的污秽瓷绝缘子绝缘状态评估方法

绝缘子污秽放电严重威胁电力系统的安全稳定运行,及时掌握污秽绝缘子的绝缘状态意义重大,文中旨在研究基于日盲紫外检测的污秽瓷绝缘子绝缘状态评估方法。首先,基于220 kV输电线路瓷绝缘子污秽放电试验,结合污秽绝缘子的放电现象、泄漏电流信号及紫外放电图像特征,将污秽瓷绝缘子的绝缘状态划分为“正常”、“一般”、“较差”、“极差”,并利用紫外放电检测结果一致性方法以及统计分析的方法,选取了3个基于紫外光辐射照度的特征参量;其次,以环境湿度、仪器增益及3个光辐射照度特征参量为输入变量,绝缘状态为输出变量,采用黏菌优化算法对支持向量机的惩罚因子与核函数参数进行优化并建立了污秽瓷绝缘子的绝缘状态评估模型;最后,将绝缘状态评估模型的测试集验证结果与采用粒子群优化算法、麻雀搜索算法优化的支持向量机分类模型进行对比,发现其分类准确率更高,可达93.85%。文中所建立的污秽瓷绝缘子绝缘状态评估模型同样适用于其他型号的紫外成像仪,极大提高了污秽绝缘子紫外检测的实用性。

镓基氧化物薄膜日盲紫外探测器研究进展

日盲紫外探测器在国防和民用领域均具有广阔的应用前景。基于宽禁带半导体材料的日盲紫外探测器具有无需昂贵的滤光片、工作电压低、全固态、体积小、重量轻、抗干扰能力强、工作温度范围广等特点,是公认的新一代紫外探测器。在众多的宽禁带半导体材料中,以Ga_(2)O_(3)作为典型代表的镓基氧化物材料因其优异的电学和光电特性已经成为近年来微电子学和光电子学领域的研究热点,特别是其本征日盲、耐高温、耐高压、化学稳定性好等优异特点使得该类材料在日盲紫外光电探测领域展现出巨大的发展潜力。鉴于此,本文综述了不同晶体结构的Ga_(2)O_(3)、镓酸盐氧化物、镓锡氧化物、镓铝氧化物等镓基氧化物薄膜及其日盲紫外探测器研究进展。