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First-principles Investigation on Solution Hardening of Interstitial Impurity Elements (O,N) inγ-TiAl
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作者 Longguang ZHOU Lianlong HE +1 位作者 Lin DONG Caibei ZHANG 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2000年第6期573-576,共4页
We have calculated the electronic Structures of O-doped and N-doped r-TiAl using the firstprinciples discrete variational method (DVM) with the aim to understand the solution hardening effects of oxygen and nitrogen ... We have calculated the electronic Structures of O-doped and N-doped r-TiAl using the firstprinciples discrete variational method (DVM) with the aim to understand the solution hardening effects of oxygen and nitrogen in r-TiAl. Our combination analysis on the electronic density, density of states (DOS) and the local environment total bond orders (LTBO) will show that, X atom (X is O or N) can strongly bind with its six surrounding atoms via electronic hybridizations of Ti-3d/X-2p and Al-3p/X-2p. As a sequence, there forms a 'hard' cohesive region around the impurity atom. A pinning model based on the calculations is proposed to explain the hardening effects. The consistent results are obtained between the present calculation and formal test experiments. 展开更多
关键词 TiAl First-principles Investigation on solution Hardening of Interstitial Impurity Elements O N
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