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Surface engineering of synthetic nanopores by atomic layer deposition and their applications 被引量:2
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作者 Ce-Ming WANG De-Lin KONG +1 位作者 Qiang CHEN Jian-Ming XUE 《Frontiers of Materials Science》 SCIE CSCD 2013年第4期335-349,共15页
In the past decade, nanopores have been developed extensively for various potential applications, and their performance greatly depends on the surface properties of the nanopores. Atomic layer deposition (ALD) is a ... In the past decade, nanopores have been developed extensively for various potential applications, and their performance greatly depends on the surface properties of the nanopores. Atomic layer deposition (ALD) is a new technology for depositing thin films, which has been rapidly developed from a niche technology to an established method. ALD films can cover the surface in confined regions even in nanoscale conformally, thus it is proved to be a powerful tool to modify the surface of the synthetic nanopores and also to fabricate complex nanopores. This review gives a brief introduction on nanopore synthesis and ALD fundamental knowledge, and then focuses on the various aspects of synthetic nanopores processing by ALD and their applications, including single-molecule sensing, nanofiuidic devices, nanostructure fabrication and other applications. 展开更多
关键词 synthetic nanopore atomic layer deposition (ALD) surface engineering
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