Under the conditions of tetramethyl ammonia chloride (TMAC) used as starting material, Ti-based Dimensionally Stable Anode (DSA), stainless steel used as cathode and Nafion 900 cation membrane as cell diaphragm, this ...Under the conditions of tetramethyl ammonia chloride (TMAC) used as starting material, Ti-based Dimensionally Stable Anode (DSA), stainless steel used as cathode and Nafion 900 cation membrane as cell diaphragm, this paper studies the synthesis of tetramethyl ammonium hydroxide (TMAH) by cell diaphragm electrolytic method, examining not only the effects of current density, concentration of starting material and cell temperature, on the product purity and current efficiency, but also the effects of electrolyte circulation rate on the service life of Ti-based DSA. The experiment puts forward an optimum processing condition, and experimental findings show that preparing TMAH by using this technique can obtain a current efficiency 74.7% and get product with a purity greater than 99.9%.展开更多
An optimal concentration of the etching solution for deep etching of silicon, including 3% tetramethyl ammonium hydroxide and 0.3% (NH4)2S208, was achieved in this paper. For this etching solution, the etching rates o...An optimal concentration of the etching solution for deep etching of silicon, including 3% tetramethyl ammonium hydroxide and 0.3% (NH4)2S208, was achieved in this paper. For this etching solution, the etching rates of silicon and silicon dioxide were about 1.1μm.min^-1 and 0.5 nm.min^-1, respectively. The etching ratio between (100) and (111) planes was about 34:1, and the etched surface was very smooth.展开更多
文摘Under the conditions of tetramethyl ammonia chloride (TMAC) used as starting material, Ti-based Dimensionally Stable Anode (DSA), stainless steel used as cathode and Nafion 900 cation membrane as cell diaphragm, this paper studies the synthesis of tetramethyl ammonium hydroxide (TMAH) by cell diaphragm electrolytic method, examining not only the effects of current density, concentration of starting material and cell temperature, on the product purity and current efficiency, but also the effects of electrolyte circulation rate on the service life of Ti-based DSA. The experiment puts forward an optimum processing condition, and experimental findings show that preparing TMAH by using this technique can obtain a current efficiency 74.7% and get product with a purity greater than 99.9%.
文摘An optimal concentration of the etching solution for deep etching of silicon, including 3% tetramethyl ammonium hydroxide and 0.3% (NH4)2S208, was achieved in this paper. For this etching solution, the etching rates of silicon and silicon dioxide were about 1.1μm.min^-1 and 0.5 nm.min^-1, respectively. The etching ratio between (100) and (111) planes was about 34:1, and the etched surface was very smooth.
