Ge2Sb2Te5 gap filling is one of the key processes for phase-change random access memory manufacture. Physical vapor deposition is the mainstream method of Ge2Sb2Te5 film deposition due to its advantages of film qualit...Ge2Sb2Te5 gap filling is one of the key processes for phase-change random access memory manufacture. Physical vapor deposition is the mainstream method of Ge2Sb2Te5 film deposition due to its advantages of film quality, purity, and accurate composition control. However,the conventional physical vapor deposition process cannot meet the gap- filling requirement with the critical device dimension scaling down to 90 nm or below. In this study, we find that the deposit-etch-deposit process shows better gap-filling capability and scalability than the single-step deposition process, especially at the nano-scale critical dimension. The gap-filling mechanism of the deposit-etch-deposit process was briefly discussed. We also find that re-deposition of phase-change material from via the sidewall to via the bottom by argon ion bombardment during the etch step was a key ingredient for the final good gap filling. We achieve void-free gap filling of phase-change material on the 45-nm via the two-cycle deposit-etch-deposit process. We gain a rather comprehensive insight into the mechanism of deposit-etch-deposit process and propose a potential gap-filling solution for over 45-nm technology nodes for phase-change random access memory.展开更多
The time gap between diagenesis and mineralization (TGDM) for comagmatic gold deposits (CGD) plays an important role in confirming the genetic relationship between gold deposits and their related intrusions. With the ...The time gap between diagenesis and mineralization (TGDM) for comagmatic gold deposits (CGD) plays an important role in confirming the genetic relationship between gold deposits and their related intrusions. With the help of preciously published isotopic ages of some typical gold deposits and their related rocks in China,the authors have discussed and quantified the distribution characteristics and scope of the TGDM. Statistical analyses and Kolmogorov tests showed that mineralizing events are either contemporaneous with or slightly postdate their cognate magma. The TGDM conforms with normal distributions at a 0.05 confidence level and clusters between 0 and 16.0 Ma with a mean of 7.0 Ma. Thus,if the TGDM of CGD is less than 16.0 Ma,it is reasonable to consider,with the aid of other evidence,the possibility of its comagmatic genetic affiliation. The authors also emphasized that to get a precise time gap it is necessary to strengthen the diagenesis-mineralization geological background of the deposits studied,and to pay attention to the study of time gap in combination with trace elements and isotope tracing.展开更多
The slag-free self-shielded flux-cored wire was fabricated to apply for the narrow gap welding.The results showed that narrow gap welding shows lower welding spatter compared with hardfacing except under voltage of 30...The slag-free self-shielded flux-cored wire was fabricated to apply for the narrow gap welding.The results showed that narrow gap welding shows lower welding spatter compared with hardfacing except under voltage of 30 V and current of 260 A.The deposition efficiency keeps over 90%for both 12 mm and 8 mm narrow gap welding.For 12 mm narrow gap welding,when the voltage is 28 V and the current is 264 A(or 286 A),no pores are found in the narrow gap weld.In the continuous welding process,manganese vapor,aluminum vapor and CO continuously generate to form gasbag and occupy the narrow gap space,thus protecting the droplet and molten pool from the invasion of air.展开更多
Thin cuprous oxide films have been prepared by chemical vapor deposition(pulsed spray evaporation-chemical vapor deposition)method without post-treatment.The synthesis of cuprous oxide was produced by applying a water...Thin cuprous oxide films have been prepared by chemical vapor deposition(pulsed spray evaporation-chemical vapor deposition)method without post-treatment.The synthesis of cuprous oxide was produced by applying a water strategy effect.Then,the effect of water on the morphology,topology,structure,optical properties and surface composition of the obtained films has been comprehensively investigated.The results reveal that a pure phase of Cu2O was obtained.The introduction of a small quantity of water in the liquid feedstock lowers the band gap energy from 2.16 eV to 2.04 eV.This finding was mainly related to the decrease of crystallite size due to the effect of water.The topology analyses,by using atomic force microscope,also revealed that surface roughness decreases with water addition,namely more uniform covered surface.Moreover,theoretical calculations based on density functional theory method were performed to understand the adsorption and reaction behaviors of water and ethanol on the Cu2O thin film surface.Formation mechanism of the Cu2O thin film was also suggested and discussed.展开更多
Theβ-Ga_(2)O_(3)films are prepared on polished Al_(2)O_(3)(0001)substrates by pulsed laser deposition at different oxygen partial pressures.The influence of oxygen partial pressure on crystal structure,surface morpho...Theβ-Ga_(2)O_(3)films are prepared on polished Al_(2)O_(3)(0001)substrates by pulsed laser deposition at different oxygen partial pressures.The influence of oxygen partial pressure on crystal structure,surface morphology,thickness,optical properties,and photoluminescence properties are studied by x-ray diffraction(XRD),atomic force microscope(AFM),scanning electron microscope(SEM),spectrophotometer,and spectrofluorometer.The results of x-ray diffraction and atomic force microscope indicate that with the decrease of oxygen pressure,the full width at half maximum(FWHM)and grain size increase.With the increase of oxygen pressure,the thickness of the films first increases and then decreases.The room-temperature UV-visible(UV-Vis)absorption spectra show that the bandgap of theβ-Ga_(2)O_(3)film increases from4.76 e V to 4.91 e V as oxygen pressure decreasing.Room temperature photoluminescence spectra reveal that the emission band can be divided into four Gaussian bands centered at about 310 nm(~4.0 e V),360 nm(~3.44 e V),445 nm(~2.79 e V),and 467 nm(~2.66 e V),respectively.In addition,the total photoluminescence intensity decreases with oxygen pressure increasing,and it is found that the two UV bands are related to self-trapped holes(STHs)at O1 sites and between two O2-s sites,respectively,and the two blue bands originate from V_(Ga)^(2-)at Ga1 tetrahedral sites.The photoluminescence mechanism of the films is also discussed.These results will lay a foundation for investigating the Ga_(2)O_(3)film-based electronic devices.展开更多
A 3D Monte Carlo (MC) code PIC- EDDY, based on EDDY (erosion and deposition dynamic simulation) code, was used to investigate the redeposition of different impurities in the gaps of C tiles. By incorporating the r...A 3D Monte Carlo (MC) code PIC- EDDY, based on EDDY (erosion and deposition dynamic simulation) code, was used to investigate the redeposition of different impurities in the gaps of C tiles. By incorporating the rate coefficients of beryllium (Be) and tungsten (W) into the code, we obtain deposition profiles of hydrocarbon, beryllium and tungsten particles in the toroidal and poloidal gaps, respectively. The redeposition rate of tungsten was found to be higher than those of other impurities in the gaps, except at the bottom, due to its easier local deposition within one gyroradius. Due to the effect of reflection coefficients of hydrocarbon fragments on graphite, fewer hydrocarbons were resided at the entrance while more were deposited on the sides of the gap. At elevated plasma temperatures (such as 30 eV), asymmetric deposition distributions were observed between the toroidal and poloidal gaps due to the dominant ionized particles. Ions were mainly deposited within 1 mm depth inside gaps, and the bottom deposition particles were almost all neutrals.展开更多
Fluorinated amorphous carbon films (a-C:F) were prepared at different temperatures using a microwave electron cyclotron resonance chemical vapor deposition (ECR-CVD) reactor with CHF3 and C2H2 as source gases. Films w...Fluorinated amorphous carbon films (a-C:F) were prepared at different temperatures using a microwave electron cyclotron resonance chemical vapor deposition (ECR-CVD) reactor with CHF3 and C2H2 as source gases. Films were annealed at 500℃ in vacuum ambience in order to investigate the relationship of their thermal stability, optical and electrical properties with deposition temperature. Results indicate that the films deposited at high temperature have a less CFX bonding and a more cross-linking structure thus a better thermal stability. They also have a lower bandgap, higher dielectric constant and higher leakage current.展开更多
In the past studies have shown that the addition of Ge and Sn into Si lattice to form SiGeSn enhances its carrier mobility and band-gap properties. Conventionally SiGeSn epitaxial films are grown using Ultra-High Vacu...In the past studies have shown that the addition of Ge and Sn into Si lattice to form SiGeSn enhances its carrier mobility and band-gap properties. Conventionally SiGeSn epitaxial films are grown using Ultra-High Vacuum (UHV) conditions with pressures ranging from 10<sup>-8</sup> torr to 10<sup>-10</sup> torr which makes high volume manufacturing very expensive. On the contrary, the use of low-pressure CVD processes (vacuum levels of 10<sup>-2</sup> torr to 10<sup>-4</sup> torr) is economically more viable and yields faster deposition of SiGeSn films. This study outlines the use of a cost-effective Plasma Enhanced Chemical Vapor Deposition (PECVD) reactor to study the impact of substrate temperature and substrate type on the growth and properties of polycrystalline SiGeSn films. The onset of polycrystallinity in the films is attributed to the oxygen-rich PECVD chamber conditions explained using the Volmer-Weber (3D island) mechanism. The properties of the films were characterized using varied techniques to understand the impact of the substrate on film composition, thickness, crystallinity, and strain.展开更多
为进一步提升分布式能源的调节潜力,基于信息差距决策理论,将探讨虚拟电厂(virtual power plant,VPP)在参与需求响应(demand response,DR)策略时的竞价方式分为平衡型、保守型和进取型3种策略模型,并为每种策略设计鲁棒函数和机会函数,...为进一步提升分布式能源的调节潜力,基于信息差距决策理论,将探讨虚拟电厂(virtual power plant,VPP)在参与需求响应(demand response,DR)策略时的竞价方式分为平衡型、保守型和进取型3种策略模型,并为每种策略设计鲁棒函数和机会函数,分别实现对不同类型决策的优化。同时,设置ε约束模型,考虑了碳排放和利润的权衡关系。采用IEEE 18节点系统作为仿真环境,验证了所提方法的优点和必要性。仿真结果表明,保守型VPP能够保证在未来价格落入最大鲁棒性区间时获得最小关键利润;进取型VPP能够从意外的价格波动中获益,并实现期望的利润。展开更多
为满足更长间隙距离、更高电压等级气体开关在较低工作系数下的可靠触发,设计了一种基于毛细管放电的大气压等离子体射流喷射装置,即两间隙毛细管等离子体喷射装置(two gap capillary,TGC)。通过引入中间电极将毛细管通道分为触发通道...为满足更长间隙距离、更高电压等级气体开关在较低工作系数下的可靠触发,设计了一种基于毛细管放电的大气压等离子体射流喷射装置,即两间隙毛细管等离子体喷射装置(two gap capillary,TGC)。通过引入中间电极将毛细管通道分为触发通道和主通道,借助触发通道在放电初始时的弱毛细管放电引燃主通道的放电,实现了重复放电。等离子体射流在触发后的169μs时达到了11 cm左右。主通道电弧电阻呈现"U型"分布,电阻值开始时随主通道电弧电流的增长快速减小,最低时不到200 m?,而后随着电流的跌落快速增加。同时,主通道电弧电阻值在电流增长时要高于电流跌落时,这一差异在流过主通道电弧电流较小时十分明显,而后随着电流幅值的增加逐渐减小。由于没有传统放电结构金属丝电爆的过程,电容器所储能量主要释放于喷射装置主通道,主通道电弧能量沉积效率几乎是传统放电结构的2倍,达到了62.7%。喷射装置寿命大概在300次左右,使用扫描电子显微镜(SEM)拍摄触发通道表面,发现喷射装置TGC中间电极的烧蚀和触发通道的碳化是影响TGC寿命的关键因素,对TGC的寿命优化设计还需做进一步的努力。展开更多
基金Project supported by the National Basic Research Program of China (Grant Nos.2010CB934300,2011CBA00607,and 2011CB932800)the National Integrate Circuit Research Program of China (Grant No. 2009ZX02023-003)+1 种基金the National Natural Science Foundation of China (Grant Nos. 60906004,60906003,61006087,and 61076121)the Science and Technology Council of Shanghai,China (Grant No. 1052nm07000)
文摘Ge2Sb2Te5 gap filling is one of the key processes for phase-change random access memory manufacture. Physical vapor deposition is the mainstream method of Ge2Sb2Te5 film deposition due to its advantages of film quality, purity, and accurate composition control. However,the conventional physical vapor deposition process cannot meet the gap- filling requirement with the critical device dimension scaling down to 90 nm or below. In this study, we find that the deposit-etch-deposit process shows better gap-filling capability and scalability than the single-step deposition process, especially at the nano-scale critical dimension. The gap-filling mechanism of the deposit-etch-deposit process was briefly discussed. We also find that re-deposition of phase-change material from via the sidewall to via the bottom by argon ion bombardment during the etch step was a key ingredient for the final good gap filling. We achieve void-free gap filling of phase-change material on the 45-nm via the two-cycle deposit-etch-deposit process. We gain a rather comprehensive insight into the mechanism of deposit-etch-deposit process and propose a potential gap-filling solution for over 45-nm technology nodes for phase-change random access memory.
基金supported by the Doctoral Education Program Fund of the Ministry of Education,Peoples Republic of China (No. 20040491502)
文摘The time gap between diagenesis and mineralization (TGDM) for comagmatic gold deposits (CGD) plays an important role in confirming the genetic relationship between gold deposits and their related intrusions. With the help of preciously published isotopic ages of some typical gold deposits and their related rocks in China,the authors have discussed and quantified the distribution characteristics and scope of the TGDM. Statistical analyses and Kolmogorov tests showed that mineralizing events are either contemporaneous with or slightly postdate their cognate magma. The TGDM conforms with normal distributions at a 0.05 confidence level and clusters between 0 and 16.0 Ma with a mean of 7.0 Ma. Thus,if the TGDM of CGD is less than 16.0 Ma,it is reasonable to consider,with the aid of other evidence,the possibility of its comagmatic genetic affiliation. The authors also emphasized that to get a precise time gap it is necessary to strengthen the diagenesis-mineralization geological background of the deposits studied,and to pay attention to the study of time gap in combination with trace elements and isotope tracing.
基金supported by China Postdoctoral Science Foundation Funded Project(Grant No.2016M601753)Natural Science Foundation of Jiangsu Province(Grant No.BK20201453)Major Projects of Natural Science Research in Colleges and Universities in Jiangsu(Grant No.19KJA460009).
文摘The slag-free self-shielded flux-cored wire was fabricated to apply for the narrow gap welding.The results showed that narrow gap welding shows lower welding spatter compared with hardfacing except under voltage of 30 V and current of 260 A.The deposition efficiency keeps over 90%for both 12 mm and 8 mm narrow gap welding.For 12 mm narrow gap welding,when the voltage is 28 V and the current is 264 A(or 286 A),no pores are found in the narrow gap weld.In the continuous welding process,manganese vapor,aluminum vapor and CO continuously generate to form gasbag and occupy the narrow gap space,thus protecting the droplet and molten pool from the invasion of air.
基金supported by the Ministry of Science and Technology of China(No.2017YFA0402800)the National Natural Science and Technology of China(No.91541102 and No.51476168)+2 种基金the support by Chinese Academy of Sciences for Senior International Scientists within President’s International Fellowship Initiative(PIFI)programthe financial support during his Ph.D.research stay at Bielefeld UniversityThe Moroccan institute of IRESEN is acknowledged for the financial support(Innowind13 Nanolubricant)
文摘Thin cuprous oxide films have been prepared by chemical vapor deposition(pulsed spray evaporation-chemical vapor deposition)method without post-treatment.The synthesis of cuprous oxide was produced by applying a water strategy effect.Then,the effect of water on the morphology,topology,structure,optical properties and surface composition of the obtained films has been comprehensively investigated.The results reveal that a pure phase of Cu2O was obtained.The introduction of a small quantity of water in the liquid feedstock lowers the band gap energy from 2.16 eV to 2.04 eV.This finding was mainly related to the decrease of crystallite size due to the effect of water.The topology analyses,by using atomic force microscope,also revealed that surface roughness decreases with water addition,namely more uniform covered surface.Moreover,theoretical calculations based on density functional theory method were performed to understand the adsorption and reaction behaviors of water and ethanol on the Cu2O thin film surface.Formation mechanism of the Cu2O thin film was also suggested and discussed.
基金Project supported by the Guizhou Provincial Science and Technology Planning Project,China(Grant No.2018-5781)the National Natural Science Foundation of China(Grant No.51762010)+1 种基金the Guizhou Provincial Science and Technology Foundation,China(Grant Nos.2020-1Y021 and 2020-1Y271)the Guizhou Provincial High-level Innovative Talents,China(Grant No.2018-4006)。
文摘Theβ-Ga_(2)O_(3)films are prepared on polished Al_(2)O_(3)(0001)substrates by pulsed laser deposition at different oxygen partial pressures.The influence of oxygen partial pressure on crystal structure,surface morphology,thickness,optical properties,and photoluminescence properties are studied by x-ray diffraction(XRD),atomic force microscope(AFM),scanning electron microscope(SEM),spectrophotometer,and spectrofluorometer.The results of x-ray diffraction and atomic force microscope indicate that with the decrease of oxygen pressure,the full width at half maximum(FWHM)and grain size increase.With the increase of oxygen pressure,the thickness of the films first increases and then decreases.The room-temperature UV-visible(UV-Vis)absorption spectra show that the bandgap of theβ-Ga_(2)O_(3)film increases from4.76 e V to 4.91 e V as oxygen pressure decreasing.Room temperature photoluminescence spectra reveal that the emission band can be divided into four Gaussian bands centered at about 310 nm(~4.0 e V),360 nm(~3.44 e V),445 nm(~2.79 e V),and 467 nm(~2.66 e V),respectively.In addition,the total photoluminescence intensity decreases with oxygen pressure increasing,and it is found that the two UV bands are related to self-trapped holes(STHs)at O1 sites and between two O2-s sites,respectively,and the two blue bands originate from V_(Ga)^(2-)at Ga1 tetrahedral sites.The photoluminescence mechanism of the films is also discussed.These results will lay a foundation for investigating the Ga_(2)O_(3)film-based electronic devices.
基金supported by the National Magnetic Confinement Fusion Science Program of China(Nos.2011GB110003,2011GB110001 and2013GB107004)National Natural Science Foundation of China(Nos.11005125,11205198 and 11375010)
文摘A 3D Monte Carlo (MC) code PIC- EDDY, based on EDDY (erosion and deposition dynamic simulation) code, was used to investigate the redeposition of different impurities in the gaps of C tiles. By incorporating the rate coefficients of beryllium (Be) and tungsten (W) into the code, we obtain deposition profiles of hydrocarbon, beryllium and tungsten particles in the toroidal and poloidal gaps, respectively. The redeposition rate of tungsten was found to be higher than those of other impurities in the gaps, except at the bottom, due to its easier local deposition within one gyroradius. Due to the effect of reflection coefficients of hydrocarbon fragments on graphite, fewer hydrocarbons were resided at the entrance while more were deposited on the sides of the gap. At elevated plasma temperatures (such as 30 eV), asymmetric deposition distributions were observed between the toroidal and poloidal gaps due to the dominant ionized particles. Ions were mainly deposited within 1 mm depth inside gaps, and the bottom deposition particles were almost all neutrals.
基金The project supported by the National Nature Science Foundation of China (No. 10175048)
文摘Fluorinated amorphous carbon films (a-C:F) were prepared at different temperatures using a microwave electron cyclotron resonance chemical vapor deposition (ECR-CVD) reactor with CHF3 and C2H2 as source gases. Films were annealed at 500℃ in vacuum ambience in order to investigate the relationship of their thermal stability, optical and electrical properties with deposition temperature. Results indicate that the films deposited at high temperature have a less CFX bonding and a more cross-linking structure thus a better thermal stability. They also have a lower bandgap, higher dielectric constant and higher leakage current.
文摘In the past studies have shown that the addition of Ge and Sn into Si lattice to form SiGeSn enhances its carrier mobility and band-gap properties. Conventionally SiGeSn epitaxial films are grown using Ultra-High Vacuum (UHV) conditions with pressures ranging from 10<sup>-8</sup> torr to 10<sup>-10</sup> torr which makes high volume manufacturing very expensive. On the contrary, the use of low-pressure CVD processes (vacuum levels of 10<sup>-2</sup> torr to 10<sup>-4</sup> torr) is economically more viable and yields faster deposition of SiGeSn films. This study outlines the use of a cost-effective Plasma Enhanced Chemical Vapor Deposition (PECVD) reactor to study the impact of substrate temperature and substrate type on the growth and properties of polycrystalline SiGeSn films. The onset of polycrystallinity in the films is attributed to the oxygen-rich PECVD chamber conditions explained using the Volmer-Weber (3D island) mechanism. The properties of the films were characterized using varied techniques to understand the impact of the substrate on film composition, thickness, crystallinity, and strain.
文摘为进一步提升分布式能源的调节潜力,基于信息差距决策理论,将探讨虚拟电厂(virtual power plant,VPP)在参与需求响应(demand response,DR)策略时的竞价方式分为平衡型、保守型和进取型3种策略模型,并为每种策略设计鲁棒函数和机会函数,分别实现对不同类型决策的优化。同时,设置ε约束模型,考虑了碳排放和利润的权衡关系。采用IEEE 18节点系统作为仿真环境,验证了所提方法的优点和必要性。仿真结果表明,保守型VPP能够保证在未来价格落入最大鲁棒性区间时获得最小关键利润;进取型VPP能够从意外的价格波动中获益,并实现期望的利润。
文摘为满足更长间隙距离、更高电压等级气体开关在较低工作系数下的可靠触发,设计了一种基于毛细管放电的大气压等离子体射流喷射装置,即两间隙毛细管等离子体喷射装置(two gap capillary,TGC)。通过引入中间电极将毛细管通道分为触发通道和主通道,借助触发通道在放电初始时的弱毛细管放电引燃主通道的放电,实现了重复放电。等离子体射流在触发后的169μs时达到了11 cm左右。主通道电弧电阻呈现"U型"分布,电阻值开始时随主通道电弧电流的增长快速减小,最低时不到200 m?,而后随着电流的跌落快速增加。同时,主通道电弧电阻值在电流增长时要高于电流跌落时,这一差异在流过主通道电弧电流较小时十分明显,而后随着电流幅值的增加逐渐减小。由于没有传统放电结构金属丝电爆的过程,电容器所储能量主要释放于喷射装置主通道,主通道电弧能量沉积效率几乎是传统放电结构的2倍,达到了62.7%。喷射装置寿命大概在300次左右,使用扫描电子显微镜(SEM)拍摄触发通道表面,发现喷射装置TGC中间电极的烧蚀和触发通道的碳化是影响TGC寿命的关键因素,对TGC的寿命优化设计还需做进一步的努力。