Optical multilayer thin film structures have been widely used in numerous photonic applications.However,existing inverse design methods have many drawbacks because they either fail to quickly adapt to different design...Optical multilayer thin film structures have been widely used in numerous photonic applications.However,existing inverse design methods have many drawbacks because they either fail to quickly adapt to different design targets,or are difficult to suit for different types of structures,e.g.,designing for different materials at each layer.These methods also cannot accommodate versatile design situations under different angles and polarizations.In addition,how to benefit practical fabrications and manufacturing has not been extensively considered yet.In this work,we introduce OptoGPT(Opto Generative Pretrained Transformer),a decoder-only transformer,to solve all these drawbacks and issues simultaneously.展开更多
The evolution of a magnetic domain structure induced by temperature and magnetic field is reported in silicon- doped yttrium iron garnet (YIG) films with perpendicular anisotropy. During a cooling-down procedure fro...The evolution of a magnetic domain structure induced by temperature and magnetic field is reported in silicon- doped yttrium iron garnet (YIG) films with perpendicular anisotropy. During a cooling-down procedure from 300K to 7K, a 20% change in the domain width is observed, with the long tails of the stripes being shortened and the twisting stripes being straightened. Under the influence of the stray field of a barium ferrite, the garnet presents an interesting domain structure, which shows an appearance of branching protrusions. The intrinsic mechanisms in these two processes are also discussed.展开更多
The microstructure of CdI2 thin film grown during vapor-phase deposition was investigated by scanning electron microscopy (SEM). The thin film deposited on Si crystal consists of numerous sunflower-like aggregates. Th...The microstructure of CdI2 thin film grown during vapor-phase deposition was investigated by scanning electron microscopy (SEM). The thin film deposited on Si crystal consists of numerous sunflower-like aggregates. These aggregates display well self-assembly characteristics. The size of Sunflower-like aggregates is between 12 and 44 μm. Each sunflower-like aggregate is surrounded with many adjacent wings-'petals'. The structure of central region of the 'sunflower' is obviously difFerent from that of the 'petal'. Electron spectroscopy for chemical analysis (ESCA) was employed in determining the chemical valence of the thin film. Self-organization efFect is used to explain the coring growth process of CdI2 thin film展开更多
Co2MnSi thin films are made by magnetron sputtering onto MgO (001) substrates. The crystalline quality is improved by increasing depositing temperature and/or annealing temperature. The sample deposited at 550℃ and...Co2MnSi thin films are made by magnetron sputtering onto MgO (001) substrates. The crystalline quality is improved by increasing depositing temperature and/or annealing temperature. The sample deposited at 550℃ and subsequently annealed at 550℃ (sample I) exhibits a pseudo-epitaxial growth with partially ordered L21 phase. Sample I shows a four-fold magnetic anisotropy, in addition to a relatively weak uniaxial anisotropy. The Gilbert damping factor of sample I is smaller than 0.001, much smaller than reported ones. The possible reasons responsible for the small Gilbert damping factor are discussed, including weak spin-orbit coupling, small density of states at Fermi level, and so on.展开更多
Regulating the surface instability of thin film/substrate structures has been successfully applied to prepare new ductile electronic devices.However,such electronic devices need to be subjected to external loads durin...Regulating the surface instability of thin film/substrate structures has been successfully applied to prepare new ductile electronic devices.However,such electronic devices need to be subjected to external loads during operation,which can easily induce delamination of the thin-film electronic device from the substrate.This study aims to investigate the instability characteristics of hard films on flexible substrate surfaces from theoretical analysis and numerical simulation perspectives.Considering finite-thickness substrates,this paper establishes theoretical models for pure bending,bent wrinkle,partial delamination,and total delamination buckling of film/substrate structures based on the nonlinear Euler–Bernoulli beam theory and the principle of minimum energy;then the effects of material and geometric parameters of the structure,interfacial adhesion strength,and pre-strain on the evolutionary path of the four patterns are discussed.The study results show that:the greater Young’s modulus of the substrate is,the larger the parameter region where partial delamination of the film/substrate structure occurs,and the smaller the parameter region where bent wrinkle occurs.By varying Young’s modulus,thickness of the film and substrate,interfacial adhesion coefficient,and pre-strain,the buckling pattern of the structure can be predicted and regulated.The parametric design intervals for each pattern are summarized in the phase diagram.The results of this paper provide theoretical support for the design and reliability evaluation of flexible electronic devices.展开更多
Developments of economic systems are critical for bio-regenerative life support systems in manned space missions.In this work we report on the feasibility of using two direct sunlight powered processes sequentially fo...Developments of economic systems are critical for bio-regenerative life support systems in manned space missions.In this work we report on the feasibility of using two direct sunlight powered processes sequentially for the recovery of water and nutrients from urine.The work presents experimental evidence on nutrient and water recovery achieved using the proto-type designed and developed.We report the design and testing of a solar still which would serve on the nutrient recovery front.The cooled condensate from the solar still is fed into a solar powered electrolysis unit where nano-structured indium sulphide(In_(2)S_(3))thin films coated over fluorine doped tin oxide(SnO_(2):F)substrate serve as one of the working electrodes.The electrolysis takes place in the absence of an electrolyte which manifests as a technical achievement of our work.Our results show that the COD level in the recycled water is very low.The In_(2)S_(3)photo-electrodes are stable without any physical damage after the process.展开更多
This work reports the fabrication of via-thin-film light-emitting diode (via-TF-LED) to improve the light output power (LOP) of blue/white GaN-based LEDs grown on Si (111) substrates. The as-fabricated via-TF-LE...This work reports the fabrication of via-thin-film light-emitting diode (via-TF-LED) to improve the light output power (LOP) of blue/white GaN-based LEDs grown on Si (111) substrates. The as-fabricated via-TF-LEDs were featured with a roughened n-GaN surface and the p-GaN surface bonded to a wafer carrier with a silver-based reflective electrode, together with an array of embedded n-type via pillar metal contact from the p-GaN surface etched through the multiple-quantum-wells (MQWs) into the n-GaN layer. When operated at 350 mA, the via-TF- LED gave an enhanced blue LOP by 7.8% and over 3.5 times as compared to the vertical thin-film LED (TF-LED) and the conventional lateral structure LED (LS-LED). After covering with yellow phosphor that converts some blue photons into yellow light, the via-TF-LED emitted an enhanced white luminous flux by 13.5% and over 5 times, as compared with the white TF-LED and the white LS-LED, respectively. The significant LOP improve- ment of the via-TF-LED was attributed to the elimination of light absorption by the Si (111) epitaxial substrate and the finger-like n-electrodes on the roughened emitting surface.展开更多
In this special issue, we invited a few leading materials researchers to present topics in thin films, coatings, and nano structures. Readers will find most recent developments in topics, including recent advances in ...In this special issue, we invited a few leading materials researchers to present topics in thin films, coatings, and nano structures. Readers will find most recent developments in topics, including recent advances in hard, tough, and low friction nanocomposite coatings; thin films for coating nanomaterials; electroless plating of silver thin films on porous Al2O3 substrate; CrN/Nano Cr interlayer coatings; nano-structured carbide derived carbon (CDC) films and their tribology; predicting interdiffusion in high-temperature coatings; gallium-catalyzed silica nanowire growth; and corrosion protection properties of organofunctional silanes. Authors are from both national laboratories and academia.展开更多
Different pattern structures are obtained on the AglnSbTe (AIST) phase change film as induced by laser beam. Atomic force microscopy (AFM) was used to observe and analyze the different pattern structures. The AFM ...Different pattern structures are obtained on the AglnSbTe (AIST) phase change film as induced by laser beam. Atomic force microscopy (AFM) was used to observe and analyze the different pattern structures. The AFM photos clearly show the gradually changing process of pattern structures induced by different threshold effects, such as crystallization threshold, microbump threshold, melting threshold, and ablation threshold. The analysis indicates that the AIST material is very effective in the fabrication of pattern structures and can offer relevant guidance for application of the material in the future.展开更多
DG-MOSFETs are the most widely explored device architectures for na</span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="f...DG-MOSFETs are the most widely explored device architectures for na</span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">no-scale CMOS circuit design in sub-50 nm due to the improved subthre</span></span></span><span><span><span style="font-family:""><span style="font-family:Verdana;">shold slope and the reduced leakage power compared to bulk MOSFETs. In thin-film (</span><i><span style="font-family:Verdana;">t</span><sub><span style="font-family:Verdana;">si</span></sub></i><span style="font-family:Verdana;"> < 10 nm) DG-MOS structures, charge carriers are affected</span></span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;"> by</span></span></span><span><span><span style="font-family:""> <i><span style="font-family:Verdana;">t</span><sub><span style="font-family:Verdana;">si</span></sub></i><span style="font-family:Verdana;">-</span></span></span></span><span><span><span style="font-family:""> </span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">induced quantum confinement along with the confinement caused by </span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">a </span></span></span><span><span><span style="font-family:""><span style="font-family:Verdana;">very high electric field at the interface. Therefore, quantum confinement effects on the device characteristics are also quite important and it needs to be incorpo</span><span style="font-family:Verdana;">rated along with short channel effects for nano-scale circuit design. In this</span> </span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">paper</span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">, we analyze</span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">d</span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;"> a DG-MOSFET structure at </span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">the </span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">20 nm technology node</span></span></span><span><span><span style="font-family:""><span style="font-family:Verdana;"> incorporating quantum confinement effects and various short channel effects. The effect of physical parameter variations on performance characteristics of </span><span><span style="font-family:Verdana;">the device such as threshold voltage, subthreshold slope, </span><i><span style="font-family:Verdana;">I</span><sub><span style="font-family:Verdana;">ON</span></sub></i><span style="font-family:Verdana;"> - </span><i><span style="font-family:Verdana;">I</span><sub><span style="font-family:Verdana;">OFF</span></sub></i><span style="font-family:Verdana;"> ratio,</span></span> <i><span style="font-family:Verdana;">DIBL</span></i></span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">,</span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;"> etc. has been investigated and plotted through extensive TCAD simulations. The physical parameters considered in this </span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">paper</span></span></span><span><span><span style="font-family:""><span style="font-family:Verdana;"> are operating temperature </span><span><span style="font-family:Verdana;">(</span><i><span style="font-family:Verdana;">T</span><sub><span style="font-family:Verdana;">op</span></sub></i><span style="font-family:Verdana;">), channel doping concentration (</span><i><span style="font-family:Verdana;">N</span><sub><span style="font-family:Verdana;">c</span></sub></i><span style="font-family:Verdana;">), gate oxide thickness (</span><i><span style="font-family:Verdana;">t</span><sub><span style="font-family:Verdana;">ox</span></sub></i><span style="font-family:Verdana;">) an</span></span><span style="font-family:Verdana;">d Silicon film thickness (</span><i><span style="font-family:Verdana;">t</span><sub><span style="font-family:Verdana;">si</span></sub></i><span style="font-family:Verdana;">). It </span></span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">was</span></span></span><span><span><span style="font-family:""><span style="font-family:Verdana;"> observed that quantum confinement of </span><span style="font-family:Verdana;">charge </span><span style="font-family:Verdana;">carriers significantly affect</span></span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">ed</span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;"> the performance characteristics (mostly the</span></span></span><span><span><span style="font-family:""><span style="font-family:Verdana;"> subth</span><span style="font-family:Verdana;">reshold characteristics) of the device and therefore, it cannot be ignored in</span><span style="font-family:Verdana;"> the </span><span style="font-family:Verdana;">subthreshold region</span></span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">-</span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">based circuit design like in many previous research</span></span></span><span><span><span style="font-family:""><span style="font-family:Verdana;"> works. </span><span><span style="font-family:Verdana;">The ATLAS</span><sup><span style="font-family:Verdana;">TM</span></sup><span style="font-family:Verdana;"> device simulator has been used in this </span></span></span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">paper</span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;"> to perform simu</span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">lation and parameter extraction. The TCAD analysis presented in the</span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;"> manuscript can be incorporated for device modeling and device</span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;"> matching. It can be used to illustrate exact device behavior and for proper device control.展开更多
基金the National Science Foundation(PFI-008513 and FET-2309403)for the support of this work.
文摘Optical multilayer thin film structures have been widely used in numerous photonic applications.However,existing inverse design methods have many drawbacks because they either fail to quickly adapt to different design targets,or are difficult to suit for different types of structures,e.g.,designing for different materials at each layer.These methods also cannot accommodate versatile design situations under different angles and polarizations.In addition,how to benefit practical fabrications and manufacturing has not been extensively considered yet.In this work,we introduce OptoGPT(Opto Generative Pretrained Transformer),a decoder-only transformer,to solve all these drawbacks and issues simultaneously.
基金Supported by the National Basic Research Program of China under Grant No 2013CB922304the National Natural Science Foundation of China under Grant No 91321310
文摘The evolution of a magnetic domain structure induced by temperature and magnetic field is reported in silicon- doped yttrium iron garnet (YIG) films with perpendicular anisotropy. During a cooling-down procedure from 300K to 7K, a 20% change in the domain width is observed, with the long tails of the stripes being shortened and the twisting stripes being straightened. Under the influence of the stray field of a barium ferrite, the garnet presents an interesting domain structure, which shows an appearance of branching protrusions. The intrinsic mechanisms in these two processes are also discussed.
文摘The microstructure of CdI2 thin film grown during vapor-phase deposition was investigated by scanning electron microscopy (SEM). The thin film deposited on Si crystal consists of numerous sunflower-like aggregates. These aggregates display well self-assembly characteristics. The size of Sunflower-like aggregates is between 12 and 44 μm. Each sunflower-like aggregate is surrounded with many adjacent wings-'petals'. The structure of central region of the 'sunflower' is obviously difFerent from that of the 'petal'. Electron spectroscopy for chemical analysis (ESCA) was employed in determining the chemical valence of the thin film. Self-organization efFect is used to explain the coring growth process of CdI2 thin film
基金Supported by the National Basic Research Program of China under Grant No 2015CB921502the National Natural Science Foundation of China under Grant Nos 11474184 and 11174183+3 种基金the 111 Project under Grant No B13029the Natural Science Foundation of Shandong Province under Grant No JQ201201the Doctorate Foundation of Shandong Province under Grant No BS2013CL042the Young Scientists Fund of the National Natural Science Foundation of China under Grant No 11204164
文摘Co2MnSi thin films are made by magnetron sputtering onto MgO (001) substrates. The crystalline quality is improved by increasing depositing temperature and/or annealing temperature. The sample deposited at 550℃ and subsequently annealed at 550℃ (sample I) exhibits a pseudo-epitaxial growth with partially ordered L21 phase. Sample I shows a four-fold magnetic anisotropy, in addition to a relatively weak uniaxial anisotropy. The Gilbert damping factor of sample I is smaller than 0.001, much smaller than reported ones. The possible reasons responsible for the small Gilbert damping factor are discussed, including weak spin-orbit coupling, small density of states at Fermi level, and so on.
基金funded by the Practice and Innovation Funds for Graduate Students of Northwestern Polytechnical University(Grant No.2021201712).
文摘Regulating the surface instability of thin film/substrate structures has been successfully applied to prepare new ductile electronic devices.However,such electronic devices need to be subjected to external loads during operation,which can easily induce delamination of the thin-film electronic device from the substrate.This study aims to investigate the instability characteristics of hard films on flexible substrate surfaces from theoretical analysis and numerical simulation perspectives.Considering finite-thickness substrates,this paper establishes theoretical models for pure bending,bent wrinkle,partial delamination,and total delamination buckling of film/substrate structures based on the nonlinear Euler–Bernoulli beam theory and the principle of minimum energy;then the effects of material and geometric parameters of the structure,interfacial adhesion strength,and pre-strain on the evolutionary path of the four patterns are discussed.The study results show that:the greater Young’s modulus of the substrate is,the larger the parameter region where partial delamination of the film/substrate structure occurs,and the smaller the parameter region where bent wrinkle occurs.By varying Young’s modulus,thickness of the film and substrate,interfacial adhesion coefficient,and pre-strain,the buckling pattern of the structure can be predicted and regulated.The parametric design intervals for each pattern are summarized in the phase diagram.The results of this paper provide theoretical support for the design and reliability evaluation of flexible electronic devices.
基金R.Jayakrishnan thanks KSCSTE for funding this work under the SPYTiS scheme(Grant No.25/SPYTiS III/2017/KSCSTE)also thanks DoECC,Government of Kerala for supporting the work(Grant No.DoECC/E3/R&D/1751/2017).
文摘Developments of economic systems are critical for bio-regenerative life support systems in manned space missions.In this work we report on the feasibility of using two direct sunlight powered processes sequentially for the recovery of water and nutrients from urine.The work presents experimental evidence on nutrient and water recovery achieved using the proto-type designed and developed.We report the design and testing of a solar still which would serve on the nutrient recovery front.The cooled condensate from the solar still is fed into a solar powered electrolysis unit where nano-structured indium sulphide(In_(2)S_(3))thin films coated over fluorine doped tin oxide(SnO_(2):F)substrate serve as one of the working electrodes.The electrolysis takes place in the absence of an electrolyte which manifests as a technical achievement of our work.Our results show that the COD level in the recycled water is very low.The In_(2)S_(3)photo-electrodes are stable without any physical damage after the process.
基金Project supported by the National Key R&D Program(Nos.2016YFB0400100,2016YFB0400104)the National Natural Science Foundation of China(Nos.61534007,61404156,61522407,61604168,61775230)+7 种基金the Key Frontier Scientific Research Program of the Chinese Academy of Sciences(No.QYZDB-SSW-JSC014)the Science and Technology Service Network Initiative of the Chinese Academy of Sciencesthe Key R&D Program of Jiangsu Province(No.BE2017079)the Natural Science Foundation of Jiangsu Province(No.BK20160401)the China Postdoctoral Science Foundation(No.2016M591944)supported by the Open Fund of the State Key Laboratory of Luminescence and Applications(No.SKLA-2016-01)the Open Fund of the State Key Laboratory on Integrated Optoelectronics(Nos.IOSKL2016KF04,IOSKL2016KF07)the Seed Fund from SINANO,CAS(No.Y5AAQ51001)
文摘This work reports the fabrication of via-thin-film light-emitting diode (via-TF-LED) to improve the light output power (LOP) of blue/white GaN-based LEDs grown on Si (111) substrates. The as-fabricated via-TF-LEDs were featured with a roughened n-GaN surface and the p-GaN surface bonded to a wafer carrier with a silver-based reflective electrode, together with an array of embedded n-type via pillar metal contact from the p-GaN surface etched through the multiple-quantum-wells (MQWs) into the n-GaN layer. When operated at 350 mA, the via-TF- LED gave an enhanced blue LOP by 7.8% and over 3.5 times as compared to the vertical thin-film LED (TF-LED) and the conventional lateral structure LED (LS-LED). After covering with yellow phosphor that converts some blue photons into yellow light, the via-TF-LED emitted an enhanced white luminous flux by 13.5% and over 5 times, as compared with the white TF-LED and the white LS-LED, respectively. The significant LOP improve- ment of the via-TF-LED was attributed to the elimination of light absorption by the Si (111) epitaxial substrate and the finger-like n-electrodes on the roughened emitting surface.
文摘In this special issue, we invited a few leading materials researchers to present topics in thin films, coatings, and nano structures. Readers will find most recent developments in topics, including recent advances in hard, tough, and low friction nanocomposite coatings; thin films for coating nanomaterials; electroless plating of silver thin films on porous Al2O3 substrate; CrN/Nano Cr interlayer coatings; nano-structured carbide derived carbon (CDC) films and their tribology; predicting interdiffusion in high-temperature coatings; gallium-catalyzed silica nanowire growth; and corrosion protection properties of organofunctional silanes. Authors are from both national laboratories and academia.
基金supported by the National Natural Science Foundation of China(Nos.50772120, 60977004,and 11054001)the Shanghai Rising Star Tracking Program(No.10QH1402700)the Basic Research Program of China(No.2007CB935400)
文摘Different pattern structures are obtained on the AglnSbTe (AIST) phase change film as induced by laser beam. Atomic force microscopy (AFM) was used to observe and analyze the different pattern structures. The AFM photos clearly show the gradually changing process of pattern structures induced by different threshold effects, such as crystallization threshold, microbump threshold, melting threshold, and ablation threshold. The analysis indicates that the AIST material is very effective in the fabrication of pattern structures and can offer relevant guidance for application of the material in the future.
文摘DG-MOSFETs are the most widely explored device architectures for na</span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">no-scale CMOS circuit design in sub-50 nm due to the improved subthre</span></span></span><span><span><span style="font-family:""><span style="font-family:Verdana;">shold slope and the reduced leakage power compared to bulk MOSFETs. In thin-film (</span><i><span style="font-family:Verdana;">t</span><sub><span style="font-family:Verdana;">si</span></sub></i><span style="font-family:Verdana;"> < 10 nm) DG-MOS structures, charge carriers are affected</span></span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;"> by</span></span></span><span><span><span style="font-family:""> <i><span style="font-family:Verdana;">t</span><sub><span style="font-family:Verdana;">si</span></sub></i><span style="font-family:Verdana;">-</span></span></span></span><span><span><span style="font-family:""> </span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">induced quantum confinement along with the confinement caused by </span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">a </span></span></span><span><span><span style="font-family:""><span style="font-family:Verdana;">very high electric field at the interface. Therefore, quantum confinement effects on the device characteristics are also quite important and it needs to be incorpo</span><span style="font-family:Verdana;">rated along with short channel effects for nano-scale circuit design. In this</span> </span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">paper</span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">, we analyze</span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">d</span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;"> a DG-MOSFET structure at </span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">the </span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">20 nm technology node</span></span></span><span><span><span style="font-family:""><span style="font-family:Verdana;"> incorporating quantum confinement effects and various short channel effects. The effect of physical parameter variations on performance characteristics of </span><span><span style="font-family:Verdana;">the device such as threshold voltage, subthreshold slope, </span><i><span style="font-family:Verdana;">I</span><sub><span style="font-family:Verdana;">ON</span></sub></i><span style="font-family:Verdana;"> - </span><i><span style="font-family:Verdana;">I</span><sub><span style="font-family:Verdana;">OFF</span></sub></i><span style="font-family:Verdana;"> ratio,</span></span> <i><span style="font-family:Verdana;">DIBL</span></i></span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">,</span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;"> etc. has been investigated and plotted through extensive TCAD simulations. The physical parameters considered in this </span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">paper</span></span></span><span><span><span style="font-family:""><span style="font-family:Verdana;"> are operating temperature </span><span><span style="font-family:Verdana;">(</span><i><span style="font-family:Verdana;">T</span><sub><span style="font-family:Verdana;">op</span></sub></i><span style="font-family:Verdana;">), channel doping concentration (</span><i><span style="font-family:Verdana;">N</span><sub><span style="font-family:Verdana;">c</span></sub></i><span style="font-family:Verdana;">), gate oxide thickness (</span><i><span style="font-family:Verdana;">t</span><sub><span style="font-family:Verdana;">ox</span></sub></i><span style="font-family:Verdana;">) an</span></span><span style="font-family:Verdana;">d Silicon film thickness (</span><i><span style="font-family:Verdana;">t</span><sub><span style="font-family:Verdana;">si</span></sub></i><span style="font-family:Verdana;">). It </span></span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">was</span></span></span><span><span><span style="font-family:""><span style="font-family:Verdana;"> observed that quantum confinement of </span><span style="font-family:Verdana;">charge </span><span style="font-family:Verdana;">carriers significantly affect</span></span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">ed</span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;"> the performance characteristics (mostly the</span></span></span><span><span><span style="font-family:""><span style="font-family:Verdana;"> subth</span><span style="font-family:Verdana;">reshold characteristics) of the device and therefore, it cannot be ignored in</span><span style="font-family:Verdana;"> the </span><span style="font-family:Verdana;">subthreshold region</span></span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">-</span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">based circuit design like in many previous research</span></span></span><span><span><span style="font-family:""><span style="font-family:Verdana;"> works. </span><span><span style="font-family:Verdana;">The ATLAS</span><sup><span style="font-family:Verdana;">TM</span></sup><span style="font-family:Verdana;"> device simulator has been used in this </span></span></span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">paper</span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;"> to perform simu</span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;">lation and parameter extraction. The TCAD analysis presented in the</span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;"> manuscript can be incorporated for device modeling and device</span></span></span><span style="font-family:Verdana;"><span style="font-family:Verdana;"><span style="font-family:Verdana;"> matching. It can be used to illustrate exact device behavior and for proper device control.