Structure,ferroelectric,and enhanced fatigue properties of sol–gel-processed new Bi-based perovskite thin films of Bi(Cu_(1/2)Ti_(1/2))O_(3)–PbTiO_(3)

Bi-based perovskite ferroelectric thin films have wide applications in electronic devices due to their excellent ferroelectric properties.New Bi-based perovskite thin films Bi(Cu_(1/2)Ti_(1/2))O_(3)–PbTiO_(3)(BCT–PT) are deposited on Pt(111)/Ti/SiO_(2)/Si substrates in the present study by the traditional sol–gel method.Their structures and related ferroelectric and fatigue characteristics are studied in-depth.The BCT–PT thin films exhibit good crystallization within the phase-pure perovskite structure,besides,they have a predominant(100) orientation together with a dense and homogeneous microstructure.The remnant polarization(2P_(r)) values at 30 μC/cm^(2) and 16 μC/cm^(2) are observed in 0.1BCT–0.9PT and 0.2BCT–0.8PT thin films,respectively.More intriguingly,although the polarization values are not so high,0.2BCT–0.8PT thin films show outstanding polarization fatigue properties,with a high switchable polarization of 93.6% of the starting values after 10^(8) cycles,indicating promising applications in ferroelectric memories.

Tuning of Optical Properties via Annealing of Bismuth Ferrite (BiFeO3) Thin Films

In this study we are reporting annealing induced optical properties of bismuth ferrite (BiFeO3) thin films deposited on glass substrate via spin coating at 5000 rpm. The structural, optical and surface morphology of BiFeO3 (BFO) thin films have been studied via X-ray diffraction (XRD), Fourier transform infrared (FT-IR), Optical absorption (UV-Vis) and Photoluminescence (PL) spectroscopy. XRD spectra confirm annealing induced phase formation of BiFeO3 possessing a rhombohedral R3c structure. The films are dense and without cracks, although the presence of porosity in BFO/glass was observed. Moreover, optical absorption spectra indicate annealing induced effect on the energy band structure in comparison to pristine BiFeO3. It is observed that annealing effect shows an intense shift in the UV-Vis spectra as diffuse absorption together with the variation in the optical band gap. The evaluated optical band gap values are approximately equal to the bulk band gap value of BiFeO3.

Temperature-mediated structural evolution of vapor–phase deposited cyclosiloxane polymer thin films for enhanced mechanical properties and thermal conductivity

Polymer-derived ceramic(PDC) thin films are promising wear-resistant coatings for protecting metals and carbon-carbon composites from corrosion and oxidation.However,the high pyrolysis temperature hinders the applications on substrate materials with low melting points.We report a new synthesis route for PDC coatings using initiated chemical vapor deposited poly(1,3,5-trivinyl-1,3,5-trimethylcyclotrisiloxane)(pV_3D_3) as the precurs or.We investigated the changes in siloxane moieties and the network topology,and proposed a three-stage mechanism for the thermal annealing process.The rise of the connectivity number for the structures obtained at increased annealing temperatures was found with strong correlation to the enhanced mechanical properties and thermal conductivity.Our PDC films obtained via annealing at 850℃ exhibit at least 14.6% higher hardness than prior reports for PDCs synthesized below 1100℃.Furthermore,thermal conductivity up to 1.02 W(mK)^(-1) was achieved at the annealing temperature as low as 700℃,which is on the same order of magnitude as PDCs obtained above 1100℃.Using minimum thermal conductivity models,we found that the thermal transport is dominated by diffusons in the films below the percolation of rigidity,while ultra-short mean-free path phonons contribute to the thermal conductivity of the films above the percolation threshold.The findings of this work provide new insights for the development of wear-resistant and thermally conductive PDC thin films for durable protection coatings.

Investigation of UV photosensor properties of Al-doped SnO_(2) thin films deposited by sol-gel dip-coating method

Transparent conducting aluminum doped tin oxide thin films were prepared by sol-gel dip coating method with differ-ent Al concentrations and characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), UV-Vis spectrophotometry and photoconductivity study. The variation observed in the properties of the measured films agrees with a difference in the film's thickness, which decreases when Al concentration augments. X-ray diffraction analysis reveals that all films are polycrystal-line with tetragonal structure, (110) plane being the strongest diffraction peak. The crystallite size calculated by the Debye Scher-rer’s formula decreases from 11.92 to 8.54 nm when Al concentration increases from 0 to 5 wt.%. AFM images showed grains uni-formly distributed in the deposited films. An average transmittance greater than 80% was measured for the films and an en-ergy gap value of about 3.9 eV was deduced from the optical analysis. Finally, the photosensitivity properties like current-voltage characteristics, ION/IOFF ratio, growth and decay time are studied and reported. Also, we have calculated the trap depth energy using the decay portion of the rise and decay curve photocurrent.

Investigation of Sprayed Lu2O3 Thin Films Using XPS

Spray pyrolysis method was used to deposit Lutetium Oxide (Lu2O3) thin films using lutetium (III) chloride as source material and water as oxidizer. Annealing was carried out in argon atmosphere at 450°C for 60 minutes of the films. To investigate the composition and stoichiometry of sprayed as-deposited and annealed Lu2O3 thin films, depth profile studies using X-ray photoelectron spectroscopy (XPS) was done. Nearly stoichiometric was observed for both annealed and as-deposited films in inner and surface layers.

XPS Depth Profile Study of Sprayed Ga2O3 Thin Films

Ga2O3 thin films were fabricated by spray pyrolysis method using gallium acetylacetonate as source material and water as oxidizer. The films were annealed at 450°C for 60 minutes in argon atmosphere. X-ray photoelectron spectroscopy (XPS) depth profile studies were carried out to analyze the stoichiometry and composition of sprayed as-deposited and annealed Ga2O3 thin films. Surface layers and the inner layers of as-deposited and annealed films were found nearly stoichiometric.

Effect of boron/phosphorus-containing additives on electrodeposited CoNiFe soft magnetic thin films

CoNiFe,CoNiFeB and CoNiFeP soft magnetic thin films were prepared by cyclic voltammetry method.The morphologies,composition and structures were characterized by scanning electron microscope（SEM）,energy-dispersive X-ray spectroscope（EDS） and X-ray diffractometer（XRD）.The soft magnetic properties were investigated through vibrating sample magnetometer（VSM）.The corrosion resistance was investigated through Tafel polarization and electrochemical impedance spectroscopic（EIS）.The results show that all the electrodeposited CoNiFe,CoNiFeB and CoNiFeP films are mixtures of crystalline and amorphous phases,and high amount of boron/phosphorus-containing additives favors the formation of amorphous state.Nanostructure is obtained in CoNiFe and CoNiFeB films.The inclusion of boron causes the film more dense and also increases its corrosion resistance.Meanwhile,the inclusion of boron lowers its coercivity（Hc） from 851.48 A/m to 604.79 A/m,but the saturation magnetic flux density（Bs） is almost unchanged.However,the addition of phosphorus greatly increases the film particle size and decreases its corrosion stability.The coercivity（Hc） of CoNiFeP film is also highly increased to 12485.79 A/m,and its saturation magnetic flux density（Bs） is greatly decreased to 1.25 T.

Microstructure evolution of copper doped beryllium thin films

Copper （Cu） doped beryllium （Be） thin films were deposited on silicon substrates by using a simple ion beam sputtering method, which can also realize the varying of Cu doping concentration. Detailed morphological and structural characterizations of the samples clearly disclose a microstructure evolution of films upon doping Cu. Doping Cu can effectively suppress film grain growth, causing a small grain size as well as uniform size distribution. Furthermore, doping Cu affects the crystallographic texture of film, which leads to the formation of more compact film structure. In particular, the surface smoothness of the doped films is significantly improved, which makes them promising candidates for various applications.

Fabrication of Hydrogenated Microcrystalline Silicon Thin Films at Low Temperature by VHF-PECVD

Using H 2 diluted silane,series of μc Si∶H films are fabricated at low temperature with VHF PECVD.The thickness measurements reveal that the deposition rates are obviously enhanced with higher plasma excitation frequency or working pressure,but increase firstly and then decrease with the increase of plasma power density.Raman spectra show that the crystallinity and the average grain sizes of the films strongly depend on the temperature of substrate and the concentration of silane.However,the plasma excitation frequency only has effect on the crystallinity,and a maximum occurs during the further increase of plasma excitation frequency.From XRD and TEM experiments,three preferential crystalline orientations (111),(220) and (311) are observed,and the average grain sizes are different for every crystalline orientation.

Plasma Treatment Enhanced Magnetic Properties in Manganese Doped Titanium Nitride Thin Films

The ferromagnetic manganese doped TiN films were grown by plasma assisted molecular beam epitaxy on MgO（001） substrates. The nitrogen concentration and the ratio of manganese at Ti lattice sites increase after the plasma annealing post treatment. TIN（002） peak shifts toward low angle direction and TiN（111） peak disappears after the post treatment. The lattice expansion and peak shift are mainly ascribed to the reduction of nitrogen vacancies in films. The magnetism was suppressed in as-prepared sample due to the pinning effect of the nitrogen vacancies at defect sites or interface. The magnetism can be activated by the plasma implantation along with nitrogen vacancies reduce. The decrease of nitrogen vacancies leads to the enhancement of ferromagnetism.

Effect of La Doping on Microstructure and Ferroelectric Prop-erties of Bi_4Ti_3O_(12) Thin Films Prepared by Sol-gel Method

The Bi4Ti3Oi2 and Bi3.25La0.75Ti3O12 thin films were prepared on the Pt/Ti/SiO2/Si substrate using the sol-gel method. The effect of La doping on the microstructure and ferroelectric properties of Bi4Ti3O12 films were investigated. Both the Bi4Ti3O12 and Bi3.25La0.75Ti3O12 thin films exhibited typical bismuth layered perovskite structure. The 2Pr （remanent polarization） value of Bi3.25La0.75Ti3O12 thin films is 18.6 μC/cm^2, which is much larger than that of Bi4Ti3O12 thin films. And the Bi3.2eLa0.75Ti3O12 films show fatigue-free behavior, while the Bi4Ti3O12 thin films exhibit the fatigue problem. The mechanism of improvement of La doping was discussed.

Effect of Ag Addition on the Microstructure and Magnetic Properties of FePt Thin Films

FePt thin films and [FePt/Ag]n multilayer thin films were prepared by magnetron sputtering technique and subsequent annealing process. By comparing the microstructure and magnetic properties of these two kinds of thin films, effects of Ag addition on the structure and properties of FePt thin films were investigated. Proper Ag addition was found helpful for FePt phase transition at lower annealing temperature. With Ag addition, the magnetic domain pattern of FePt thin film changed from maze-like pattern to more discrete island-like domain pattern in [FePt/Ag]n multilayer thin films. In addition, introducing nonmagnetic Ag hindered FePt grains from growing larger. The in-depth defects in FePt films and [FePt/Ag]n multilayer films verify that Ag addition is attributed to a large number of pinning site defects in [FePt/Ag]n film and therefore has effects on its magnetic properties and microstructure.

Accuracy analysis of plane-strain bulge test for determining mechanical properties of thin films

The effect of a variety of geometrics, initial conditions and material properties on the deformation behavior of thin films in the plane-strain bulge test was systematically scrutinized by performing the finite element analysis, and then the accuracy of the plane-strain bulge test in determining the mechanical properties of thin films in terms of our finite element results was analyzed. The results indicate that although the determination of the plane-strain modulus in the light of the plane-strain bulge equation is fairly accurate, the calculation of the residual stress is not satisfied as expected, especially for low residual stress. Finally, an approach is proposed for analyzing bulge test data, which will improve the accuracy and reliability of this bulge test technique.

Influence of pyrolysis temperature on ferroelectric properties of La and Mn co-doped BiFeO_3 thin films

Bi0.9La0.1Fe0.95Mn0.05O3 （BLFMO） ferroelectric thin films were fabricated on Pt/Ti/SiO2/Si/ substrates by the sol-gel process at different pyrolysis temperatures. The mass loss of BLFMO powder was investigated by thermo gravimetry analyser （TGA）, and the polycrystalline structure and smooth surface of BLFMO thin films were characterized by X-ray diffraction （XRD） and atomic force microscopy （AFM）, respectively. The remnant polarization （Pr） of the BLFMO films pyrolyzed at 420 ℃ is 21.2 μC/cm2 at the coercive field （Ec） of 99 kV/cm and the leakage current density is 7.1×10-3 A/cm2, which indicates that the BLFMO thin films display relatively good ferroelectric property at this temperature.

An Investigation into the Role of Capping on Second Harmonic Generation from Nonlinear Organic Polymer and Guest-Host Thin Films by In-Situ Poling

In attempts to fabricate thermally stable second-order nonlinear polymer thin films, we have investigated the second harmonic generation (SHG) from both nonlinear polymer and guest-host thin films. We have also investigated the role of capping on the SHG, temporal stability and relaxation of dipole alignment. Corona poling techniques were employed to orient the dopants into the noncentrosymmetric structure required to obtain the SHG. The effect of capping with a polymeric encapsulant below the glass transition temperature of the polymers on the unpoled and corona poled thin films was studied. Capping of the nonlinear polymer and guest host thin films have resulted in high SHG with good temporal stability. SHG signal falls drastically during the first 8 days after poling while no further significant decay in SHG signal was observed after about 33 days. Our investigations have identified the characteristics required for a good encapsulant on a non-con-ductive surface.

Effect of annealing treatment on the structural, optical, and electrical properties of Al-doped ZnO thin films

Highly conductive and transparent Al-doped ZnO （AZO） thin films were prepared from a zinc target containing Al （1.5 wt.%） by direct current （DC） and radio frequency （RF） reactive magnetron sputtering. The structural, optical, and electrical properties of AZO films as-deposited and submitted to annealing treatment （at 300 and 400℃, respectively） were characterized using various techniques. The experimental results show that the properties of AZO thin films can be further improved by annealing treatment. The crystallinity of ZnO films improves after annealing treatment. The transmittances of the AZO thin films prepared by DC and RF reactive magnetron sputtering are up to 80% and 85% in the visible region, respectively. The electrical resistivity of AZO thin films prepared by DC reactive magnetron sputtering can be as low as 8.06 x 10-4 Ωcm after annealing treatment. It was also found that AZO thin films prepared by RF reactive magnetron sputtering have better structural and optical properties than that prepared by DC reactive magnetron sputtering.

MICROWAVE PERMEABILITY SPECTRA OF SPUTTERED Fe-Co-B SOFT MAGNETIC THIN FILMS

Permeability characteristics of sputtered soft magnetic Fe40Co40B20 thin films are investigated in the range of O. 5 to 5 GHz by a shortened microstrip transmission line perturbation method. Excellent microwave permeability is achieved at 0.4 Pa argon pressure： fr is 3.32 GHz, the real and imaginary part of permeability at 0.5 GHz are 104 and 61, respectively. In addition, the thickness effect on permeability is also studied. The minimum damping can be achieved at the thinnest film. Different sources contributed to in-plane anisotropy are discussed briefly. The deviation between the peak frequency of the imaginary part and the zero-crossing frequency of the real part of permeability is also presented.

Influence of oxygen gas content on the structural and optical properties of ZnO thin films deposited by RF magnetron sputtering at room temperature

Zinc oxide （ZnO） thin films were deposited on sapphire （0001） substrates at room temperature by radiofrequency （RF） magnetron sputtering at oxygen gas contents of 0%, 25%, 50% and 75%, respectively. The influence of oxygen gas content on the structural and optical properties of ZnO thin films was studied by a surface profile measuring system, X-ray diffraction analysis, atomic force microscopy, and UV spectro- photometry. It is found that the size of ZnO crystalline grains increases first and then decreases with the increase of oxygen gas content, and the maximum grain size locates at the 25% oxygen gas content. The crystalline quality and average optical transmittance （〉90%） in the visi- ble-light region of the ZnO film prepared at an oxygen gas content of 25% are better than those of ZnO films at the other contents. The obtained results can be attributed to the resputtefing by energetic oxygen anions in the growing process.

Grain Size and Photocatalytic Activity of Nanometer TiO_2 Thin Films Prepared by the Sol-gel Method

Transparent anatase TiO2 nanometer thin films with photocatalytic activity were prepared via the sol-gel method on soda-lime glass. The thickness , crystalline phase, grain size, surface hydroxyl amount and so on were characterized by scanning electron microscopy (SEM) , X-ray diffraction (XRD), transmission electron microscopy ( TEM), X-ray photoelectron spectroscopy (XPS) and UV-visible spectrophotometer ( UV-VIS). The photocatalytic activity of TiO2 thin films was evaluated for the photocatalytic decolorization of aqueous methyl orange . The effects of film thickness on the crystalline phase, grain size, transmittance and photocatalytic activity of nanometer Ti02 thin films were discussed.

Rapid communication Preparation of TiO_2 nanometer thin films with high photocatalytic activity by reverse micellar method

Two kinds of TiO_2 nanometer thin films were prepared on stainless steel bythe reverse micellar and sol-gel methods, respectively. The calcined TiO_ 2 thin films werecharacterized by X-ray diffraction (XRD), atomic force microscopy (AFM), BET surface area and X-rayphotoelectron spectroscopy (XPS). Photocatalytic activity was evaluated by photocatalyticdecoloration of methyl orange aqueous solution. The results showed that the TiO_2 thin filmsprepared by reverse micellar method (designated as RM-TiO_2 films) showed higher photocatalyticactivity than those by sol-gel method (designated as SG-TiO_2 films). This is attributed to the factthat the former is composed of smaller monodispersed spherical particles with a size of about 15 nmand possesses higher surface areas.