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Electroless Plating of Thin Silver Films on Porous Al_2O_3 Substrate and the Study of Deposition Kinetics 被引量:4
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作者 Fang Mei Donglu Shi 《Tsinghua Science and Technology》 SCIE EI CAS 2005年第6期680-689,共10页
A novel concept has been developed to coat the inner pore surfaces of reticulated alumina with a thin silver film by an electroless-plating method. As a result of coating, the porous alumina sample exhibits a sharp tr... A novel concept has been developed to coat the inner pore surfaces of reticulated alumina with a thin silver film by an electroless-plating method. As a result of coating, the porous alumina sample exhibits a sharp transition from insulating to conducting due to a thin silver layer on the inner pore surfaces. Systematic studies have been carried out to investigate the coating kinetics by employment of scanning electron microscope (SEM), X-ray diffraction (XRD), and computer simulation. Both coating procedures and effects of processing parameters on the quality of films are reported. Also, this paper presents the film bonding strength to the substrate, effects of sintering, and conduction mechanism of coated composite. The fundamental silver electroless-plating mechanism has been identified based on computer modeling. The simulation results indicate an excellent agreement between the silver deposition behavior and the physical model applied. 展开更多
关键词 electroless plating thin silver films deposition kinetics
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