SURFACE MODIFICATION OF TITANIUM FILMS WITH SODIUM ION IMPLANTATION:SURFACE PROPERTIES AND PROTEIN ADSORPTION

Sodium implanted titanium films with different ion doses were characterized to correlate their ion implantation parameters. Native titanium films and ion implanted titanium films were characterized with combined techniques of X-ray photoelectron spectroscopy （XPS）, atomic force microscopy （AFM）, and light microscopy （LM）. The surface presented increased sodium concentration on treated titanium films with ion dose increasing, except for the group with the highest ion dose of 4×10^17ions/cm^2. XPS depth profiling displayed that sodium entered titanium film around 25-50nm depth depending on its implantation ion dose. AFM characterization showed that sodium ion implantation treatment changed the surface morphology from a relatively smooth titanium film to rough surfaces corresponding to different implantation doses. After sodium implantation, implanted titanium films presented big particles with island structure morphology. The surface morphology and particle growth displayed the corresponding trend. Fibrinogen adsorption on these titanium films was performed to correlate with the surface properties of treated titanium films. The results show that protein adsorption on ion-implanted samples with dose of 2×10^17 and 4×10^17 are statistically higher （p 〈0.01） than samples treated with dose of 5×10^16 and 1×10^17, as well as the control samples.

Fabrication and characterization of anodic oxide films on a Ti-10V-2Fe-3Al titanium alloy

Anodic oxide films of the titanium alloy Ti-10V-2Fe-3Al in ammonium tartrate electrolyte without hydrofluoric acid or fluoride were fabricated. The morphology, components, and microstructure of the films were characterized by scanning electron microscopy （SEM）, X-ray photoelectron spectroscopy （XPS）, X-ray diffraction （XRD）, and Raman spectroscopy. The results showed that the films were thick, uniform, and nontransparent. Such films exhibited sedimentary morphology, with a thickness of about 3 μm, and the pore diameters of the deposits ranged from several hundred nanometers to 1.5 μm. The films were mainly titanium dioxide. Some coke-like deposits, which may contain or be changed by OH, NH, C-C, C-O, and C=O groups, were doped in the films. The films were mainly amorphous with a small amount of anatase and rutile phase.

In vitro biocompatibility of titanium-nickel alloy with titanium oxide film by H_2O_2 oxidation

Titanium oxide film with a graded interface to NiTi matrix was synthesized in situ on NiTi shape memory alloy(SMA) by oxidation in H2O2 solution. In vitro studies including contact angle measurement, hemolysis, MTT cytotoxicity and cell morphology tests were employed to investigate the biocompatibility of the H2O2-oxidized NiTi SMAs with this titanium oxide film. The results reveal that wettability, blood compatibility and fibroblasts compatibility of NiTi SMA are improved by the coating of titanium oxide film through H2O2 oxidation treatment.

Biodegradable starch/poly(vinyl alcohol) film reinforced with titanium dioxide nanoparticles

Biodegradable starch/poly （vinyl alcohol）/nano-titanium dioxide （ST/PVA/nano-Ti02） nanocomposite films were prepared via a solution casting method. Their biodegradability, mechanical properties, and thermal properties were also studied in this paper. A general full factorial experimental approach was used to determine effective parameters on the mechanical properties of the prepared films. ST/PVA/TiO2 nanocomposites were characterized by scanning electron microscopy （SEM） and X-ray diffraction （XRD）. The results of mechanical analysis show that ST/PVA films with higher contents of PVA have much better mechanical properties. In thermal analysis, it is found that the addition of Ti02 nanoparticles improves the thermal stability of the films. SEM micrographs, taken from the fracture surface of samples, illustrate that the addition of PVA makes the film softer and more flexible. The results of soil burial biodegradation indicate that the biodegradability of ST/PVA/TiO2 films strongly depends on the starch proportion in the film matrix. The degradation rate is increased by the addition of starch in the films.

Surface Analysis of Chemical Stripping Titanium Alloy Oxide Films

The chemical stripping method of titanium alloy oxide films was studied. An environment friendly solution hydrogen peroxide and sodium hydroxide without hydrofluoric acid or fluoride were used to strip the oxide films. The morphologies of the surface and cross-section of the oxide films before and after the films stripping were characterized by using scanning electron microscopy （SEM）. The microstructure and chemical compositions of the oxide films before and after the films stripping were investigated by using Raman spectroscopy （Raman） and X-ray photoelectron spectroscopy （XPS）. It was shown that the thickness of the oxide film was in the range of 5-6 μm. The oxide films were stripped for 2 to 8 min in the solution. Moreover, the effect of the stripping time on the efficiency of the film stripping was investigated, and the optimum stripping time was between 6-8 min. When the stripping solution completely dissolved the whole film, the α/β microstructure of the titanium alloy Ti-10V-2Fe-3Al was partly revealed. The stripping mechanism was discussed in terms of the dissolution of film delamination. The hydrogen peroxide had a significant effect on the dissolution of the titanium alloy anodic oxide film. The feasibility of the dissolution reaction also was evaluated.

Preparation and bioactivity of SiO_2 functional films on titanium by PACVD

SiO2 functional films were deposited on the surface of titanium by plasma assisted chemical vapour deposition(PACVD) and the composition of films was studied by XPS. Samples deposited with SiO2 films were immersed in different concentration simulated body fluid(SBF) for biomimetic deposition of hydroxyapatite(HA). The results show that SiO2 functional films deposited on titanium surface with PACVD have good bioactivity. Hydroxyapatite is formed while titanium coated with SiO2 is immersed in simulated body fluid for seven days.

Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Films by Dielectric Barrier Discharge in TiCl_4/O_2/N_2 Gas Mixtures

Low-pressure dielectric barrier discharge（DBD） TiCl4/O2and N2 plasmas have been used to deposit titanium oxide films at different power supply driving frequencies. A homemade large area low pressure DBD reactor was applied, characterized by the simplicity of the experimental set-up and a low consumption of feed gas and electric power, as well as being easy to operate. Atomic force microscopy, scanning electron microscopy, energy dispersive spectroscopy,and contact angle measurements have been used to characterize the deposited films. Experimental results show all deposited films are uniform and hydrophilic with a contact angle of about 15 o.Compared to titanium oxide films deposited in TiCl4/O2gas mixtures, those in TiCl4/O2/N2gas mixtures are much more stable. The contact angle of titanium oxide films in TiCl4/O2/N2gas mixtures with the addition of 50% N2 and 20% TiCl4 is still smaller than 20 o, while that of undoped titanium oxide films is larger than 64 owhen they are measured after one week. The low-pressure TiCl4/O2plasmas consist of pulsed glow-like discharges with peak widths of several microseconds, which leads to the uniform deposition of titanium oxide films. Increasing a film thickness over several hundreds of nm leads to the film’s fragmentation due to the over-high film stress. Optical emission spectra（OES） of TiCl4/O2DBD plasmas at various power supply driving frequencies are presented.

Effects of helium on titanium films and the helium diffusion

Using direct current-magnetron sputtering,Helium-trapped Ti films with a He/Ar mixture was studied.The relative helium content,helium depth profiles for the Ti films and crystallization capacity were analyzed by Enhanced Proton Backscattering Spectrometry(EPBS)and X-ray diffraction(XRD).It was found that helium diffusion enhanced as more helium trapping into Ti films,and the He holding ratios were 95.9%,94.9%,93.9%,82.8% when the Ti films with the He/Ti of concentrations of 9.7 at.%,19.5 at.%,19.7 at.%,48.3 at.% were measured again 4 months later,respectively.The diffraction peaks be-came weak and wider,the peak of(002)plane was shifted to smaller diffraction angles and the relevant interplanar spacing d(hkl)increased gradually as more helium trapping into Ti films.The main peak was made trending to the(101)plane by both higher deposition temperature and more helium trapping.

Fabrication of Titanium Dioxide Thin Films by DBD-CVD Under Atmosphere

Titanium dioxide films were firstly deposited on glass substrate by DBD-CVD （dielectric barrier discharge enhanced chemical vapor deposition） technique. The structure of the films was investigated by X-ray diffraction （XRD）, scanning electron microscopy （SEM）. TiO2 films deposited under atmosphere pressure show preferred orientation, and exhibit columnar-like structure, while TiO2 films deposited under low gas pressure show no preferred orientation. The columnar-like structure with preferred orientation exhibits higher photocatalytic efficiency, since the columnar structure has larger surface area. However, it contributes little to the improvement of hydrophilicity. DBD-CVD is an alternative method to prepare photocatalytic TiO2 for its well-controllable property.

Superconductivity of bilayer titanium/indium thin film grown on SiO2/Si(001)

Bilayer superconducting films with tunable transition temperature（Tc） are a critical ingredient to the fabrication of high-performance transition edge sensors. Commonly chosen materials include Mo/Au, Mo/Cu, Ti/Au, and Ti/Al systems. Here in this work, titanium/indium（Ti/In） bilayer superconducting films are successfully fabricated on SiO2/Si（001）substrates by molecular beam epitaxy（MBE）. The success in the epitaxial growth of indium on titanium is achieved by lowering the substrate temperature to-150？C during indium evaporation. We measure the critical temperature under a bias current of 10 μA, and obtain different superconducting transition temperatures ranging from 645 m K to 2.7 K by adjusting the thickness ratio of Ti/In. Our results demonstrate that the transition temperature decreases as the thickness ratio of Ti/In increases.

Effects of Different Titanium Sub-oxide on the Properties of Titanium Dioxide Thin Films Prepared by E-beam Evaporation Deposition with Ion Auxiliary

TiO2 thin films were prepared with Ti2O3, Ti3O5 and TiO2 as raw materials, by electron-beam evaporation deposition, using O^2- ion beam （ O2 purity up to 99.99% ） as auxiliary means. The crystal structures of the samples were inspected by the X-ray diffraction （XRD） method, and the evaporation character of warious raw materials was analyzed. Transmittance spectra were measured through a U-3310 spectrophotometer （ wavelength ranging from 200 nm to 900 nm）. The refractive index n and the thickness of films were determined from transmission spectra. The experimental results show that the thin films taking Ti2O3 as their raw material have a strong absorption, when taking Ti3O5 and TiO2 as raw materials, the thin films would have good optical properties. The experiments also show that, the crystal structure of all thin films is amorphous before post-annealing and the Ti3O5 is a congruent evaporation phase in the Ti-O system.

New Preparation Method of Visible Light Responsive Titanium Dioxide Photocatalytic Films

We report a new and simple preparation method of the visible light responsive Titanium dioxide (TiO2) photocatalytic films using sol-gel method and ultraviolet light (UV) irradiation. Proposed films were prepared on fused silica plates using titanium tetra-isopropoxide, urea, 2-methoxyethanol, water and UV irradiation. The 650°C-annealed films were carbon-containing anatase type TiO2, not carbon-doped ones. The prepared films absorbed visible light with wavelengths longer than 400 nm. Also, organic dyes were effectively photodegradated by visible light irradiation in the presence of these films.

Cellular response to titanium discs coated with polyelectrolyte multilayer films

The purpose of this study was to investigate the effects ofpolyelectrolyte multilayer （PEM） coatings on the biological behavior of titanium （Ti） substrates. Collagen type I/hyaluronic acid （Col/HA） and chitosan/hyaluronic acid （Chi/HA） multilayer PEM coatings were introduced onto Ti substrates using layer-by-layer assembly. Contact angle instruments and quartz crystal microbalance were used for film characterization. The results obtained showed that both Col/HA and Chi/HA surfaces had high hydrophilicity and promoted cell adhesion in MC3T3-E1 pre-osteoblast and human gingival fibroblast cells. In addition, the synthesis of function-related proteins and gene expression levels in both MC3T3-E1 and fibroblast cells was higher for the Col/HA coating compared with the Chi/HA coating, indicating better cellular response to the Col/HA coating.

Synthesis and Characterization of Metal Organic Chemical Vapour Deposited Copper Titanium Oxide (Cu-Ti-O) Thin Films from Single Solid Source Precursor

Thin films of copper titanium oxide were deposited by metal organic chemical vapour deposition technique from the synthesized single solid source precursor, copper titanium acetylacatonate Cu [Ti(C5H7O2)3] at the deposition temperature of 420°C. The deposited films were characterized using Rutherford Backscattering Spectroscopy, Scanning Electron Microscopy with Energy Dispersive X-Ray facility attached to it, X-Ray Diffractometry, UV-Visible Spectrometry and van-der Pauw Conductivity measurement. Results show that the thickness of the prepared film is determined as 101.236 nm and the film is amorphous in structure, having average grain size of approximately 1 μm. The optical behaviour showed that the absorption edge of the film was at 918 nm near infrared with corresponding direct energy band gap of 1.35 eV. The electrical characterization of the film gave the values of resistivity, sheet resistance and conductivity of the film as 3.43 × 10-1 Ω-cm, 3.39 × 106 Ω/square and 2.91 (Ω-cm)-1 respectively.

The Effects of Annealing on the Surface Properties of Titania Films Prepared on Titanium by Micro-Arc Oxidation

Titanium and its alloys are widely used in the aerospace, marine, and biomedical industry due to their unique bulk properties such as high strength-to-weight ratio and melting temperature, good corrosion resistance, and favorable biocom- patibility. However, in some applications, com- ponents made of titanium or titanium alloys exhibit poor wear resistance under stationary or dynamic loading as well as contact corrosion manifested by the relatively negative standard electrode potential （-1.63 V ） . In order to improve the surface properties of titanium and its alloys, several techniques such as PVD （ physical vapor deposition ） /CVD （chemical vapor deposition ） coatings,

Macroscopic Studies on the Properties of the Anodic Oxide Films on Titanium

The effect of fluoride ions on the formation and dissolution behaviour of anodic oxide films on Ti has been investigated in acidic fluoride media (pH=1) using impedance and galvanostatic techniques. A5 the fluoride ion concentration and temperature increase the rate of oxide film formation decreases while the dissolution process increases. oxide film formed at high tem-perature and formation voltage was found to contain more defect sites in the film than that formed at a lower one. Activation energies are calculated during the oxide film formation and dissolution and found to be 20.76 and 28.72 kJ/mol, respectively. Formation rate and reciprocal capacitance data are reported as a function of polarizing current density. Values are recorded for the electrolytic parameters A and B. Potentiostatic curves are derived from the galvanostatic results.

钛合金表面超疏水膜的制备及其耐蚀性与机械稳定性

采用阳极氧化工艺在Ti6A14V钛合金表面制备阳极氧化膜作为过渡层,然后喷涂SiO_(2)颗粒溶胶烘烤使其固化成膜,再通过正辛基三乙氧基硅烷表面修饰,制备出具有微纳米表面结构、接触角为151.6°的超疏水膜。结果表明:超疏水膜的主要成分为Ti、O、Si和C元素,腐蚀电流密度仅为8.06×10^(-8)A/cm^(2),较裸钛合金降低约一个数量级,并且电荷转移电阻和低频阻抗模值较裸钛合金分别增大约7000Ω·cm^(2)、3000Ω·cm^(2),表现出良好的耐蚀性,可作为耐腐蚀膜层对钛合金起到防护作用。超疏水膜经受80次落砂冲击、50次胶带剥离以及沿砂纸往复摩擦400 cm后,接触角仍然大于150°,保持超疏水状态。蜂窝状多孔结构的阳极氧化膜充当过渡层,使溶胶膜和表面修饰形成的薄膜与钛合金基体牢固结合,从而表现出良好的机械稳定性。

Nanometer Thick Diffused Hafnium and Titanium Oxide Light Sensing Film Structures

We examine 10 nm thick film structures containing either Hf or Ti sandwiched between two respective oxide layers. The layers are deposited onto heated substrates to create a diffusion region. We observe a high degree of light sensitivity of the electric current through the film thickness for one polarity of an applied voltage. For the other polarity, the current is not affected by the light. We explain the observed phenomenology using the single-particle model based on the existence of interface states on the metal-oxide interfaces.

钛椭圆低肋横槽管外降膜蒸发流热特性

为提高钛椭圆低肋横槽管外降膜蒸发器传热效率,在试验验证基础上对椭圆系数E在1.0~2.0内管外液膜流热特性进行多相流数值模拟。结果表明:管外液膜分布均存在不同程度干斑,且液膜在临近干斑处较其他区域增厚明显,当E为1.2时液膜覆盖率最高;液膜沿轴/周向均减速铺展,当E为1.0和1.8时管上端液膜速度在无量纲轴向长度Z*为-0.25~-0.375及0.25~0.375之间骤减,液膜厚度沿轴向从喷淋口正下方位置向喷淋口远端变化趋势为先减小后增大;最大传热系数随着E增大而增大,管壁在液膜与干斑交界区域附近传热系数最高;平均传热系数先增大后减小,相较圆管,E为1.2和2.0时平均传热系数分别增大34.5%和15.7%;槽内汽含率分布与液膜分布呈相反规律,液膜整体汽含率随E的增大先增大后减小,槽内/外平均汽含率差值随E增加而增大。