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Ultra Fast Shutter Driven by Pulsed High Current 被引量:2
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作者 曾江涛 孙凤举 +3 位作者 邱爱慈 尹佳辉 郭建明 陈玉兰 《Plasma Science and Technology》 SCIE EI CAS CSCD 2005年第2期2781-2784,共4页
Radiation simulation utilizing plasma radiation sources (PRS) generates a large number of undesirable debris, which may damage the expensive diagnosing detectors. An ultra fast shutter (UFS) driven by pulsed high curr... Radiation simulation utilizing plasma radiation sources (PRS) generates a large number of undesirable debris, which may damage the expensive diagnosing detectors. An ultra fast shutter (UFS) driven by pulsed high current can erect a physical barrier to the slowly moving debris after allowing the passage of X-ray photons. The UFS consists of a pair of thin metal foils twisting the parallel axes in a Nylon cassette, compressed with an outer magnetic field, generated from a fast capacitor bank, discharging into a single turn loop. A typical capacitor bank is of 7.5μF charging voltages varying from 30 kV to 45 kV, with corresponding currents of approximately 90 kA to140 kA and discharging current periods of approximately 13.1μs. A shutter closing time as fast as 38 microseconds has been obtained with an aluminium foil thickness of 100 micrometers and a cross-sectional area of 15 mm by 20 mm. The design, construction and the expressions of the valve-closing time of the UFS are presented along with the measured results of valve-closing velocities. 展开更多
关键词 plasma radiation source (PRS) ultra fast shutter pulsed high current
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