Nowadays,TFT-LCD manufacturing has become a very complex process,in which many different products being manufactured with many different tools.The ability to predict the quality of product in such a high-mix system is...Nowadays,TFT-LCD manufacturing has become a very complex process,in which many different products being manufactured with many different tools.The ability to predict the quality of product in such a high-mix system is critical to developing and maintaining a high yield.In this paper,a statistical method is proposed for building a virtual metrology model from a number of products using a high-mix manufacturing process.Stepwise regression is used to select ＂key variables＂ that really affect the quality of the products.Multivariate analysis of covariance is also proposed for simultaneously applying the selected variables and product effect.This framework provides a systematic method of building a processing quality prediction system for a high-mix manufacturing process.The experimental results show that the proposed quality prognostic system can not only estimate the critical dimension accurately but also detect potentially faulty glasses.展开更多
This paper presents an innovative R2R(run to run)control strategy.This novel approach has made use of circuit design structure through virtually put up the structure before reach the actual structure developing step.T...This paper presents an innovative R2R(run to run)control strategy.This novel approach has made use of circuit design structure through virtually put up the structure before reach the actual structure developing step.The most significant difference between this approach and other R2R control strategies is this approach can solve issues caused by limitation of metrology instrument such as measuring target is inside a deep hole and cannot be measured clearly.Furthermore,the study proposed a multi-steps rolling wave control plan to safeguard the outcome of this control strategy.Although this control strategy has only performed trials on DRAM(Dynamic Random Access Memory)manufacturing process but it can be applied to other industry as well.展开更多
This paper proposes to develop a data-driven via＇s depth estimator of the deep reactive ion etching process based on statistical identification of key variables.Several feature extraction algorithms are presented to ...This paper proposes to develop a data-driven via＇s depth estimator of the deep reactive ion etching process based on statistical identification of key variables.Several feature extraction algorithms are presented to reduce the high-dimensional data and effectively undertake the subsequent virtual metrology（VM） model building process.With the available on-line VM model,the model-based controller is hence readily applicable to improve the quality of a via＇s depth.Real operational data taken from a industrial manufacturing process are used to verify the effectiveness of the proposed method.The results demonstrate that the proposed method can decrease the MSE from 2.2×10^（-2） to 9×10^（-4） and has great potential in improving the existing DRIE process.展开更多
基金Project supported by the National Nature Science Foundation of China(No.60904053)the Research Startup Foundation of Excellent Talents in Jiangsu University(No.08JDG046)
文摘Nowadays,TFT-LCD manufacturing has become a very complex process,in which many different products being manufactured with many different tools.The ability to predict the quality of product in such a high-mix system is critical to developing and maintaining a high yield.In this paper,a statistical method is proposed for building a virtual metrology model from a number of products using a high-mix manufacturing process.Stepwise regression is used to select ＂key variables＂ that really affect the quality of the products.Multivariate analysis of covariance is also proposed for simultaneously applying the selected variables and product effect.This framework provides a systematic method of building a processing quality prediction system for a high-mix manufacturing process.The experimental results show that the proposed quality prognostic system can not only estimate the critical dimension accurately but also detect potentially faulty glasses.
基金supported by my department manager Haw-Jyue Luo for gently sharing his years of semiconductor manufacturing experience.
文摘This paper presents an innovative R2R(run to run)control strategy.This novel approach has made use of circuit design structure through virtually put up the structure before reach the actual structure developing step.The most significant difference between this approach and other R2R control strategies is this approach can solve issues caused by limitation of metrology instrument such as measuring target is inside a deep hole and cannot be measured clearly.Furthermore,the study proposed a multi-steps rolling wave control plan to safeguard the outcome of this control strategy.Although this control strategy has only performed trials on DRAM(Dynamic Random Access Memory)manufacturing process but it can be applied to other industry as well.
基金supported by the National Natural Science Foundation of China(No.60904053)the Natural Science Foundation of Jiangsu(No. SBK201123307)the Priority Academic Program Development of Jiangsu Higher Education Institutions(PAPD)
文摘This paper proposes to develop a data-driven via＇s depth estimator of the deep reactive ion etching process based on statistical identification of key variables.Several feature extraction algorithms are presented to reduce the high-dimensional data and effectively undertake the subsequent virtual metrology（VM） model building process.With the available on-line VM model,the model-based controller is hence readily applicable to improve the quality of a via＇s depth.Real operational data taken from a industrial manufacturing process are used to verify the effectiveness of the proposed method.The results demonstrate that the proposed method can decrease the MSE from 2.2×10^（-2） to 9×10^（-4） and has great potential in improving the existing DRIE process.
