期刊文献+
共找到4篇文章
< 1 >
每页显示 20 50 100
Influence of Negative Bias Voltage on the Mechanical and Tribological Properties of MoS_2/Zr Composite Films 被引量:1
1
作者 宋文龙 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2011年第3期412-416,共5页
MoS2/Zr composite films were deposited on the cemented carbide YT14 (WC+14%TiC+6%Co) by medium-frequency magnetron sputtered and coupled with multi-arc ion plated techniques.The influence of negative bias voltage ... MoS2/Zr composite films were deposited on the cemented carbide YT14 (WC+14%TiC+6%Co) by medium-frequency magnetron sputtered and coupled with multi-arc ion plated techniques.The influence of negative bias voltage on the composite film properties,including adhesion strength,micro-hardness,thickness and tribological properties were investigated.The results showed that proper negative bias voltage could significantly improve the mechanical and tribological properties of composite films.The effects of negative bias voltage on film properties were also put forward.The optimal negative bias voltage was -200 V under this experiment conditions.The obtained composite films were dense,the adhesion strength was about 60 N,the thickness was about 2.4 μm,and the micro-hardness was about 9.0 GPa.The friction coefficient and wear rate was 0.12 and 2.1×10-7 cm3/N·m respectively after 60 m sliding operation against hardened steel under a load of 20 N and a sliding speed of 200 rev·min-1. 展开更多
关键词 medium-frequency magnetron sputtering multi-arc ion plating negative bias voltage MoS2/Zr composite films tribological properties
下载PDF
Electrical and dielectric characterization of Au/ZnO/n-Si device depending frequency and voltage
2
作者 I Orak A Kocyigit S Ahndal 《Chinese Physics B》 SCIE EI CAS CSCD 2017年第2期477-483,共7页
Au/Zn O/n-type Si device is obtained using atomic layer deposition(ALD) for Zn O layer, and some main electrical parameters are investigated, such as surface/interface state(Nss), barrier height(Φb), series res... Au/Zn O/n-type Si device is obtained using atomic layer deposition(ALD) for Zn O layer, and some main electrical parameters are investigated, such as surface/interface state(Nss), barrier height(Φb), series resistance(Rs), donor concentration(Nd), and dielectric characterization depending on frequency or voltage. These parameters are acquired by use of impedance spectroscopy measurements at frequencies ranging from 10 k Hz to 1 MHz and the direct current(DC) bias voltages in a range from-2 V to +2 V at room temperature are used. The main electrical parameters and dielectric parameters,such as dielectric constant(ε"), dielectric loss(ε"), loss tangent(tan δ), the real and imaginary parts of electric modulus(M and M), and alternating current(AC) electrical conductivity(σ) are affected by changing voltage and frequency. The characterizations show that some main electrical parameters usually decrease with increasing frequency because charge carriers at surface states have not enough time to fallow an external AC signal at high frequencies, and all dielectric parameters strongly depend on the voltage and frequency especially in the depletion and accumulation regions. Consequently, it can be concluded that interfacial polarization and interface charges can easily follow AC signal at low frequencies. 展开更多
关键词 Au/ZnO/n–Si device dielectric properties polarization process frequency and voltage dependence
下载PDF
Influence of bias voltage on structure,mechanical and corrosion properties of reactively sputtered nanocrystalline TiN films 被引量:3
3
作者 Chun-lin He Jin-lin Zhang +3 位作者 Guo-feng Ma Zhao-fu Du Jian-ming Wang Dong-liang Zhao 《Journal of Iron and Steel Research International》 SCIE EI CAS CSCD 2017年第12期1223-1230,共8页
Nanocrystalline TiN films were prepared by DC reactive magnetron sputtering.The influence of substrate biases on structure,mechanical and corrosion properties of the deposited films was studied using X-ray diffraction... Nanocrystalline TiN films were prepared by DC reactive magnetron sputtering.The influence of substrate biases on structure,mechanical and corrosion properties of the deposited films was studied using X-ray diffraction,field emission scanning electron microscopy,nanoindentation and electrochemical techniques.The deposited films have a columnar structure,and their preferential orientation strongly depends on bias voltage.The preferential orientations change from(200)plane at low bias to(111)plane at moderate bias and then to(220)plane at relatively high bias.Nanohardness H,elastic modulus E,H/E*and H3/E*2 ratios,and corrosion resistance of the deposited films increase first and then decrease with the increase in bias voltage.All the best values appear at bias of-120 V,attributing to the film with a fine,compact and less defective structure.This demonstrates that there is a close relation among microstructure,mechanical and corrosion properties of the TiN films,and the film with the best mechanical property can also provide the most effective corrosion protection. 展开更多
关键词 TiN film Nanocrystalline Bias voltage Microstructure Mechanical property Corrosion resistance
原文传递
Axial electric wake field inside the induction gap exited by the intense electron beam
4
作者 张开志 张篁 +3 位作者 龙继东 杨国君 何小中 王华岑 《Chinese Physics C》 SCIE CAS CSCD 北大核心 2008年第10期842-845,共4页
While an intense electron beam passes through the accelerating gaps of a linear induction accelerator, a strong wake field will be excited. In this paper a relatively simple model is established based on the interacti... While an intense electron beam passes through the accelerating gaps of a linear induction accelerator, a strong wake field will be excited. In this paper a relatively simple model is established based on the interaction between the transverse magnetic wake field and the electron beam, and the numerical calculation in succession generates a magnetic wake field distribution along the accelerator and along the beam pulse as well. The axial electric wake field is derived based on the relation between field components of a resonant mode. According to some principles in existence, the influence of this field on the high voltage properties of the induction gap is analyzed. The Dragon-I accelerator is taken as an example, and its maximum electric wake field is about 17 kV/cm, which means the effect of the wake field is noticeable. 展开更多
关键词 linear induction accelerator induction gap wake field high voltage breakdown property
原文传递
上一页 1 下一页 到第
使用帮助 返回顶部