Bayesian network( BN) is a powerful tool of uncertainty reasoning. Considering the insufficient information,incorporating fuzzy probability into BN is an effective method. Fuzzy BN was used to solve this problem. In t...Bayesian network( BN) is a powerful tool of uncertainty reasoning. Considering the insufficient information,incorporating fuzzy probability into BN is an effective method. Fuzzy BN was used to solve this problem. In this paper,fuzzy BN was applied in wafer stage system,which was an important part of lithography. BN of wafer stage was transferred from fault tree( FT). The quantitative assessment based on fuzzy BN was carried out. The Birnbaum importance factors of basic events were calculated. Therefore,the system failure probability and the vulnerable components could be gotten.展开更多
In order to optimize the transitional time during the successive exposure scans for a step-and-scanlithography and improve the productivity in a wafer production process,an investigation of the motion tra-jectory plan...In order to optimize the transitional time during the successive exposure scans for a step-and-scanlithography and improve the productivity in a wafer production process,an investigation of the motion tra-jectory planning along the scanning direction for wafer stage was carried out.The motions of wafer stagewere divided into two respective logical moves(i.e.step-move and scan-move)and the multi-motion-overlap algorithms(MMOA)were presented for optimizing the transitional time between the successive ex-posure scans.The conventional motion planning method,the Hazehon method and the MMOA were ana-lyzed theoretically and simulated using MATLAB under four different exposure field sizes.The resultsshow that the total time between two successive scans consumed by MMOA is reduced by 4.82%,2.62%,3.06% and 3.96%,compared with those of the conventional motion planning method;and re-duced by 2.58%,0.76%,1.63% and 2.92%,compared with those of the Hazelton method respec-tively.The theoretical analyses and simulation results illuminate that the MMOA can effectively minimizethe transitional step time between successive exposure scans and therefore increase the wafer fabricatingproductivity.展开更多
For the outputs of two nth-order linear control systems to work insynchronization and meanwhile to track their commands, a H_(infinity) synchronization control schemeis presented. In terms of two uncoupled single vari...For the outputs of two nth-order linear control systems to work insynchronization and meanwhile to track their commands, a H_(infinity) synchronization control schemeis presented. In terms of two uncoupled single variable linear systems, a multivariable coupledsystem is established by choosing one output and the difference of the two outputs as a new outputvector, so that both command tracking and synchronization properties can be demonstrated by aH_(infinity) performance index. To improve the synchronization and trailing performance and toguarantee the system robust stability, the mixed sensitivity H_(infinity), design methodology isadopted. The presented synchronization scheme is then extended to the case where one of the twosystems include two input variables, and then applied to the position synchronization control of awafer-retical stage. The wafer-reticle stage consists of a wafer stage, a reticle coarse stage, anda reticle fine stage. The reticle coarse stage picks up the reticle fine stage. The three stagesought to tack their commands, but synchronization between the wafer stage and the reticle fine stagemust be stressed in the tracking process. In the application, by appropriately determining theweighting matrices for the sensitivity function and the complementary sensitivity function, asatisfactory KL synchronization controller is obtained to realize highly accurate positionsynchronization, and to guarantee tracking performance. The above results are verified by simulationexperiments.展开更多
基金the Fundamental Research Funds for the Central Universities,China(Nos.ZYGX2011J090,ZYGX2011J084)
文摘Bayesian network( BN) is a powerful tool of uncertainty reasoning. Considering the insufficient information,incorporating fuzzy probability into BN is an effective method. Fuzzy BN was used to solve this problem. In this paper,fuzzy BN was applied in wafer stage system,which was an important part of lithography. BN of wafer stage was transferred from fault tree( FT). The quantitative assessment based on fuzzy BN was carried out. The Birnbaum importance factors of basic events were calculated. Therefore,the system failure probability and the vulnerable components could be gotten.
基金the National Basic Research Program of China(No.2003CB716206)the National Natural Science Foundation of China(No.50605025)
文摘In order to optimize the transitional time during the successive exposure scans for a step-and-scanlithography and improve the productivity in a wafer production process,an investigation of the motion tra-jectory planning along the scanning direction for wafer stage was carried out.The motions of wafer stagewere divided into two respective logical moves(i.e.step-move and scan-move)and the multi-motion-overlap algorithms(MMOA)were presented for optimizing the transitional time between the successive ex-posure scans.The conventional motion planning method,the Hazehon method and the MMOA were ana-lyzed theoretically and simulated using MATLAB under four different exposure field sizes.The resultsshow that the total time between two successive scans consumed by MMOA is reduced by 4.82%,2.62%,3.06% and 3.96%,compared with those of the conventional motion planning method;and re-duced by 2.58%,0.76%,1.63% and 2.92%,compared with those of the Hazelton method respec-tively.The theoretical analyses and simulation results illuminate that the MMOA can effectively minimizethe transitional step time between successive exposure scans and therefore increase the wafer fabricatingproductivity.
基金This project is supported by Japan Society for the Promotion of Sci-ence(No.P01208)National Natural Science Foundation of China (No.60104003).
文摘For the outputs of two nth-order linear control systems to work insynchronization and meanwhile to track their commands, a H_(infinity) synchronization control schemeis presented. In terms of two uncoupled single variable linear systems, a multivariable coupledsystem is established by choosing one output and the difference of the two outputs as a new outputvector, so that both command tracking and synchronization properties can be demonstrated by aH_(infinity) performance index. To improve the synchronization and trailing performance and toguarantee the system robust stability, the mixed sensitivity H_(infinity), design methodology isadopted. The presented synchronization scheme is then extended to the case where one of the twosystems include two input variables, and then applied to the position synchronization control of awafer-retical stage. The wafer-reticle stage consists of a wafer stage, a reticle coarse stage, anda reticle fine stage. The reticle coarse stage picks up the reticle fine stage. The three stagesought to tack their commands, but synchronization between the wafer stage and the reticle fine stagemust be stressed in the tracking process. In the application, by appropriately determining theweighting matrices for the sensitivity function and the complementary sensitivity function, asatisfactory KL synchronization controller is obtained to realize highly accurate positionsynchronization, and to guarantee tracking performance. The above results are verified by simulationexperiments.
