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Commercial Application of Technology for Catalytic Combustion of Waste Gases from Wastewater Treatment System in Petrochemical Enterprises 被引量:1
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作者 Chen Yuxiang Wang Xuehai +1 位作者 Liu Zhongsheng Wang Xin (Fushun Research Institute of Petroleum and Petrochemicals,SINOPEC,Fushun 113001) 《China Petroleum Processing & Petrochemical Technology》 SCIE CAS 2009年第3期29-32,共4页
The catalytic combustion technology for treating waste gases exiting from wastewater treatment system and oil separators in petrochemical enterprises was introduced in this article. Commercial application of this tech... The catalytic combustion technology for treating waste gases exiting from wastewater treatment system and oil separators in petrochemical enterprises was introduced in this article. Commercial application of this technology showed that the process "desulfurization and total hydrocarbon concentration homogenizationcatalytic combustion" and the associated WSH-1 combustion catalyst were suitable for treating volatile organic gases emitted from the oil separators, floatation tanks, inlet water-collecting well, waste oil tanks, etc. The commercial unit was equipped with an advanced auto-control system, featuring a simple operation and low energy consumption with good treatment effect. The purified gases could meet the national emission standard. 展开更多
关键词 wastewater treatment system catalytic combustion CATALYST DESULFURIZATION total hydrocarbon concentration homogenization waste gases fouling gases nasty odor
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Abatement of waste gases and water during the processes of semiconductor fabrication
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作者 WENRui-mei IJANGJun-wu 《Journal of Environmental Sciences》 SCIE EI CAS CSCD 2002年第4期482-488,共7页
The purpose of this article is to examine the methods and equipment for abating waste gases and water produced during the manufacture of semiconductor materials and devices. Three separating methods and equipment are ... The purpose of this article is to examine the methods and equipment for abating waste gases and water produced during the manufacture of semiconductor materials and devices. Three separating methods and equipment are used to control three different groups of electronic wastes. The first group includes arsine and phosphine emitted during the processes of semiconductor materials manufacture. The abatement procedure for this group of pollutants consists of adding iodates, cupric and manganese salts to a multiple shower tower (MST) structure. The second group includes pollutants containing arsenic, phosphorus, HF, HCl, NO 2, and SO 3 emitted during the manufacture of semiconductor materials and devices. The abatement procedure involves mixing oxidants and bases in an oval column with a separator in the middle. The third group consists of the ions of As, P and heavy metals contained in the waste water. The abatement procedure includes adding CaCO 3 and ferric salts in a flocculation sedimentation compact device equipment. Test results showed that all waste gases and water after the abatement procedures presented in this article passed the discharge standards set by the State Environmental Protection Administration of China. 展开更多
关键词 waste gases waste water ABATEMENT POLLUTANT SEMICONDUCTOR
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