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X射线离体照射人体淋巴细胞诱发染色体畸变的剂量-效应关系 被引量:2
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作者 张连珍 邓志诚 +3 位作者 李云华 詹江海 金璀珍 刘秀林 《辐射防护》 CAS CSCD 北大核心 1989年第3期-,共4页
本文介绍用180kV X射线离体照射人体淋巴细胞诱发染色体畸变的剂量-效应关系的实验结果。实验设9个剂量点(0.1—5.0Gy)和1个对照点(0Gy)。分析结果表明,在(?)剂量范围内。双着丝点体加三着丝点体的畸变率 Y_1(%)、无着丝点断片畸变率 Y_... 本文介绍用180kV X射线离体照射人体淋巴细胞诱发染色体畸变的剂量-效应关系的实验结果。实验设9个剂量点(0.1—5.0Gy)和1个对照点(0Gy)。分析结果表明,在(?)剂量范围内。双着丝点体加三着丝点体的畸变率 Y_1(%)、无着丝点断片畸变率 Y_2(%)和总畸变率 Y_3(%)与剂量 D(Gy)的关系宜分别拟合为下列方程:Y_1=-0.336+3.89D+4.49D^2(适用于0.1~5.0Gy);Y_2=0.811+2.15D+2.77D^2;Y_3=0.6(?)5.7D+7.66D^2。在低剂量(0—0.5Gy)范围内,双着丝点体的畸变率Y_(dic)(%)和无着丝点断片畸变率 Y_(Ac)·(%)与剂量 D(Gy)的关系,可分别拟合为 Y_(dic)=-0.0013+4.02D(适用于0.1—0.5Gy),(?)=0.218+4.74D。 展开更多
关键词 染色体畸变 X射线 剂量 效应 淋巴细胞 生物剂量计
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Study of (Ga, Mn)N prepared by Mn-ion implantation using optical techniques
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作者 徐大庆 张义门 +5 位作者 张玉明 李培咸 王超 吕红亮 汤晓燕 王悦湖 《Chinese Physics B》 SCIE EI CAS CSCD 2008年第12期4648-4651,共4页
This paper reports that (Ga, Mn)N is prepared using implantation of 3at.% Mn Ions into undoped GaN. Structural characterization of the crystals was performed using x-ray diffraetion(XRD). Detailed XRD measurements... This paper reports that (Ga, Mn)N is prepared using implantation of 3at.% Mn Ions into undoped GaN. Structural characterization of the crystals was performed using x-ray diffraetion(XRD). Detailed XRD measurements have revealed the characteristic of Mn-ion implanted GaN with a small contribution of other compounds. With Raman spectroscopy measurements, the spectra corresponding to the intrinsic GaN layers demonstrate three Raman active excitations at 747, 733 and 566 cm-1 identified as EI(LO), A1 (LO) and E~, respectively. The Mn-doped GaN layers exhibit additional excitations at 182, 288, 650 725, 363, 506cm^-1 and the vicinity of E~ mode. The modes observed at 182, 288, 650 725em 1 are assigned to macroscopic disorder or vacancy-related defects caused by Mn-ion implantation. Other new phonon modes are assigned to Mnx-Ny, Gax-Mny modes and the local vibrational mode of Mn atoms in the (Ga, Mn)N, which are in fair agreement with the standard theoretical results. 展开更多
关键词 Mn-ion implantation GaN diluted magnetic semiconductors Raman spectroscopy x- ray diffraction
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Surface Modification of Titanium by Producing Ti/TiN Surface Composite Layers via FSP 被引量:4
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作者 Ali Shamsipur Seyed-Farshid Kashani-Bozorg Abbas Zarei-Hanzaki 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2017年第6期550-557,共8页
In this paper, we report the use of blowing nitrogen gas for the successful fabrication of a composite layer composed of Ti/TiN on a substrate of commercially pure titanium (cp-2) using the friction stir processing ... In this paper, we report the use of blowing nitrogen gas for the successful fabrication of a composite layer composed of Ti/TiN on a substrate of commercially pure titanium (cp-2) using the friction stir processing technique. The prepared composite layer was characterized by X-ray diffraction, scanning electron microscopy and energy-dispersive X-ray spectrometry. The maximum microhardness of the Ti/TiN composite reached 1024 HV, which is 6.4 times higher than that of the titanium substrate. The results of wear test indicated that the Ti/TiN composite layer possesses excellent abrasive and adhesive wear resistance because of the formation of the TiN and its high hardness. 展开更多
关键词 Friction stir processing Surface composite TITANIUM TiN HARDNESS Wear resistance x- ray diffraction
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