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Preparation,Characterization and Photothermal Study of PVA/Ti_(2)O_(3) Composite Films
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作者 尚蒙娅 HE Yanyan +3 位作者 YU Jianhui YAN Jiahui XIE Haodi 李金玲 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS CSCD 2024年第3期658-663,共6页
In this work,flexible photothermal PVA/Ti_(2)O_(3) composite films with different amount(0 wt%,5 wt%,10 wt%,15 wt%)of Ti_(2)O_(3) particles modified by steric acid were prepared by a simple solution casting method.The... In this work,flexible photothermal PVA/Ti_(2)O_(3) composite films with different amount(0 wt%,5 wt%,10 wt%,15 wt%)of Ti_(2)O_(3) particles modified by steric acid were prepared by a simple solution casting method.The microstructures,XRD patterns,FTIR spectra,UV-Vis-NIR spectra thermo-conductivity,thermo-stability and photothermal effects of these composite films were all characterized.These results indicated that Ti_(2)O_(3) particles were well dispersed throughout the polyvinyl alcohol(PVA)matrix in the PVA/Ti_(2)O_(3) composite films.And Ti_(2)O_(3) particles could also effectively improve the photothermal properties of the composite films which exhibited high light absorption and generated a high temperature(about 57.4℃for film with 15 wt%Ti_(2)O_(3) amount)on the surface when it was irradiated by a simulated sunlight source(1 kW/m^(2)). 展开更多
关键词 Ti_(2)o_(3)particles solution casting method composite film photothermal conversion
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Thickness effect on solar-blind photoelectric properties of ultrathinβ-Ga_(2)O_(3)films prepared by atomic layer deposition 被引量:1
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作者 王少青 程妮妮 +6 位作者 王海安 贾一凡 陆芹 宁静 郝跃 刘祥泰 陈海峰 《Chinese Physics B》 SCIE EI CAS CSCD 2023年第4期707-713,共7页
Theβ-Ga_(2)O_(3)films with different thicknesses are prepared by an atomic layer deposition system.The influence of film thickness on the crystal quality is obvious,indicating that the thicker films perform better cr... Theβ-Ga_(2)O_(3)films with different thicknesses are prepared by an atomic layer deposition system.The influence of film thickness on the crystal quality is obvious,indicating that the thicker films perform better crystal quality,which is verified from x-ray diffraction(XRD)and scanning electron microscope(SEM)results.The Ga_(2)O_(3)-based solar blind photodetectors with different thicknesses are fabricated and studied.The experimental results show that the responsivity of the photodetectors increases exponentially with the increase of the film thickness.The photodetectors with inter-fingered structure based on 900 growth cyclesβ-Ga_(2)O_(3)active layers(corresponding film thickness of 58 nm)exhibit the best performances including a low dark current of 134 fA,photo-to-dark current ratio of 1.5×10^(7),photoresponsivity of 1.56 A/W,detectivity of 2.77×10^(14)Jones,and external quantum efficiency of 764.49%at a bias voltage of 10 V under 254-nm DUV illumination.The photoresponse rejection ratio(R_(254)/R_(365))is up to 1.86×10^(5).In addition,we find that the photoelectric characteristics also depend on the finger spacing of the MSM structure.As the finger spacing decreases from 50μm to10μW,the photoresponsivity,detectivity,and external quantum efficiency increase significantly. 展开更多
关键词 β-ga_(2)o_(3) film thickness solar blind photodetectors photoelectric response
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β-Ga_(2)O_(3)的p型掺杂研究进展
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作者 何俊洁 矫淑杰 +3 位作者 聂伊尹 高世勇 王东博 王金忠 《发光学报》 EI CAS CSCD 北大核心 2024年第4期557-567,共11页
β-Ga_(2)O_(3)具有超宽禁带宽度、高击穿场强、较高的巴利加优值等优点使其成为一种新兴半导体材料,在高功率电子器件、气体传感器、日盲紫外探测器等方面有着极大的应用潜力,但p型掺杂难的问题成为了β-Ga_(2)O_(3)发展的巨大障碍。... β-Ga_(2)O_(3)具有超宽禁带宽度、高击穿场强、较高的巴利加优值等优点使其成为一种新兴半导体材料,在高功率电子器件、气体传感器、日盲紫外探测器等方面有着极大的应用潜力,但p型掺杂难的问题成为了β-Ga_(2)O_(3)发展的巨大障碍。本文首先简要概述了β-Ga_(2)O_(3)的优点,并介绍了其晶体结构和基本性质。其次,说明了β-Ga_(2)O_(3)的本征缺陷,尤其是氧空位对导电性能的影响。然后,详细讨论了β-Ga_(2)O_(3) p型掺杂的研究现状,包括p型掺杂困难的原因和N掺杂、Mg掺杂、Zn掺杂、其他受主元素掺杂、两种元素共掺杂以及其他方法。最后,总结并对β-Ga_(2)O_(3)未来的发展进行了展望。 展开更多
关键词 β-ga_(2)o_(3) 本征缺陷 P型掺杂 宽禁带半导体 半导体
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AlN/β-Ga_(2)O_(3)HEMT直流特性仿真
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作者 贺小敏 唐佩正 +4 位作者 张宏伟 张昭 胡继超 李群 蒲红斌 《人工晶体学报》 CAS 北大核心 2024年第5期766-772,共7页
本文利用器件仿真软件对AlN/β-Ga_(2)O_(3)高电子迁移率晶体管(HEMT)器件的直流特性进行研究。由于AlN具有很强的极化效应,在AlN/β-Ga_(2)O_(3)异质结界面处产生高浓度二维电子气(2DEG),使AlN/β-Ga_(2)O_(3)异质结基HEMT具有更加优... 本文利用器件仿真软件对AlN/β-Ga_(2)O_(3)高电子迁移率晶体管(HEMT)器件的直流特性进行研究。由于AlN具有很强的极化效应,在AlN/β-Ga_(2)O_(3)异质结界面处产生高浓度二维电子气(2DEG),使AlN/β-Ga_(2)O_(3)异质结基HEMT具有更加优越的器件性能。理论计算得到AlN/β-Ga_(2)O_(3)异质结界面处产生的面电荷密度为2.75×10^(13) cm^(-2)。通过分析器件的能带结构、沟道电子浓度分布,研究AlN势垒层厚度、栅极长度、栅漏间距,以及金属功函数等参数对器件转移特性和输出特性的影响。结果表明:随着AlN势垒层厚度的增大,阈值电压减小,最大跨导减小,沟道电子浓度增大使饱和漏电流增大;随着栅极长度缩短,跨导增大,当栅极长度缩短至0.1μm时,器件出现了短沟道效应,并且随着栅极长度的缩短,栅下沟道区电子浓度增大,而电子速度基本不变,导致饱和漏电流增大,导通电阻减小,并且器件的饱和特性变差;随着栅漏间距的增大,跨导增大,沟道区电子浓度不变,而电子速度略有增加,导致饱和漏电流增大;肖特基栅金属功函数的增加会增大阈值电压,不会改变器件跨导,沟道电子浓度减小导致饱和漏电流减小。上述结论为后面的器件的优化改进提供了理论依据。 展开更多
关键词 β-ga_(2)o_(3) ALN HEMT 阈值电压 跨导 饱和漏电流
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Al掺杂对β-Ga_(2)O_(3)薄膜光学性质的影响研究
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作者 钟琼丽 王绪 +1 位作者 马奎 杨发顺 《人工晶体学报》 CAS 北大核心 2024年第8期1352-1360,共9页
近年来,半导体器件向着高散热性、高击穿场强和低能耗的方向发展,因此超宽禁带半导体材料β-Ga_(2)O_(3)具有广阔的应用前景,而有效掺杂是实现β-Ga_(2)O_(3)器件的基础。实验采用磁控溅射法制备Ga_(2)O_(3)/Al/Ga_(2)O_(3)/Al/Ga_(2)O_... 近年来,半导体器件向着高散热性、高击穿场强和低能耗的方向发展,因此超宽禁带半导体材料β-Ga_(2)O_(3)具有广阔的应用前景,而有效掺杂是实现β-Ga_(2)O_(3)器件的基础。实验采用磁控溅射法制备Ga_(2)O_(3)/Al/Ga_(2)O_(3)/Al/Ga_(2)O_(3)复合结构,经高温退火使Al原子热扩散进入薄膜中,形成Al掺杂的β-Ga_(2)O_(3)薄膜。采用激光区熔法使薄膜区域熔化再结晶,进一步提升掺杂质量。对Al掺杂β-Ga_(2)O_(3)薄膜的晶体性质、杂质含量及光学性质进行了测试表征。结果表明:Al掺杂不改变β-Ga_(2)O_(3)薄膜的晶体结构;随着Al层溅射时间延长,掺杂含量逐渐增加;当Al溅射时间为5和10 s时,薄膜紫外吸收率分别为40%和50%;随着Al溅射时间的增加,Al掺杂β-Ga_(2)O_(3)薄膜紫外区域光吸收率逐渐增强,Al溅射时间为300 s时,β-Ga_(2)O_(3)薄膜的光吸收率接近90%;低浓度的Al掺杂会导致β-Ga_(2)O_(3)薄膜的禁带宽度变窄。 展开更多
关键词 β-ga_(2)o_(3)薄膜 AL掺杂 磁控溅射 Ga_(2)o_(3)/Al/Ga_(2)o_(3)/Al/Ga_(2)o_(3)复合结构 光吸收 光学带隙
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p-Si/n-Ga_(2)O_(3)异质结制备与特性研究
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作者 陈沛然 焦腾 +6 位作者 陈威 党新明 刁肇悌 李政达 韩宇 于含 董鑫 《人工晶体学报》 北大核心 2024年第1期73-81,共9页
本实验采用金属有机化学气相沉积(MOCVD)工艺,在p(111)型Si衬底上制备了p-Si/n-Ga_(2)O_(3)结构的PN结。通过X射线衍射仪、原子力显微镜等对样品进行了晶体结构、表面形貌、表面粗糙度等的表征分析;通过磁控溅射与蒸镀方法在样品上生长T... 本实验采用金属有机化学气相沉积(MOCVD)工艺,在p(111)型Si衬底上制备了p-Si/n-Ga_(2)O_(3)结构的PN结。通过X射线衍射仪、原子力显微镜等对样品进行了晶体结构、表面形貌、表面粗糙度等的表征分析;通过磁控溅射与蒸镀方法在样品上生长Ti/Au电极并进行I-V特性曲线、开启电压、开关电流比、反向饱和电流、理想因子、零偏压下的势垒高度等结特性测试,研究了掺杂浓度与薄膜厚度对PN结特性的影响,并对其原因进行了分析;通过二步生长法和缓冲层温度优化实验,减少了Si衬底与β-Ga_(2)O_(3)之间的晶格失配与热失配带来的影响,对薄膜与器件特性进行了优化。最终获得了表面粗糙度最低可达到4.21 nm的高质量n型β-Ga_(2)O_(3)薄膜,以及具有较低理想因子(42.1)的PN结。 展开更多
关键词 β-ga_(2)o_(3)薄膜 金属有机化学气相沉积 p-Si/n-ga_(2)o_(3) PN结 晶体质量 电学特性
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基于第一性原理GGA+U方法研究Si掺杂β-Ga_(2)O_(3)电子结构和光电性质
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作者 张英楠 张敏 +1 位作者 张派 胡文博 《物理学报》 SCIE EI CAS CSCD 北大核心 2024年第1期296-305,共10页
采用基于密度泛函理论的GGA+U方法,计算了本征和Si掺杂β-Ga_(2)O_(3)的形成能、能带结构、态密度、差分电荷密度和光电性质.结果表明,Si取代四面体Ga(1)更容易实验合成,得到的β-Ga_(2)O_(3)带隙和Ga-3d态峰值与实验结果吻合较好,且贫... 采用基于密度泛函理论的GGA+U方法,计算了本征和Si掺杂β-Ga_(2)O_(3)的形成能、能带结构、态密度、差分电荷密度和光电性质.结果表明,Si取代四面体Ga(1)更容易实验合成,得到的β-Ga_(2)O_(3)带隙和Ga-3d态峰值与实验结果吻合较好,且贫氧条件下更倾向于获得有效掺杂.Si掺杂后,总能带向低能端移动,费米能级进入导带,呈现n型导电性;Si-3s轨道电子占据导带底,电子公有化程度加强,电导率明显改善.随着Si掺杂浓度的增加,介电函数ε_(2)(ω)的结果表明,激发导电电子的能力先增强后减弱,与电导率的量化分析结果一致.光学带隙增大,吸收带边上升速度减慢;吸收光谱结果显示Si掺杂β-Ga_(2)O_(3)具有较强的深紫外光电探测能力.计算结果将为下一步Si掺杂β-Ga_(2)O_(3)实验研究和器件设计的创新及优化提供理论参考. 展开更多
关键词 GGA+U方法 Si掺杂β-ga_(2)o_(3) 电子结构 光电性质
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AlN/β-Ga_(2)O_(3)HEMT频率特性仿真研究
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作者 贺小敏 唐佩正 +3 位作者 刘若琪 宋欣洋 胡继超 苏汉 《人工晶体学报》 CAS 北大核心 2024年第8期1361-1368,共8页
器件的频率特性影响较为复杂,本文利用Sentaurus TCAD研究了AlN势垒层厚度、栅长、栅漏间距和功函数对AlN/β-Ga_(2)O_(3)高电子迁移率晶体管(HEMT)频率特性的影响,得到以下结论:随着AlN势垒层厚度从10 nm增加到25 nm,截止频率(f_(T))... 器件的频率特性影响较为复杂,本文利用Sentaurus TCAD研究了AlN势垒层厚度、栅长、栅漏间距和功函数对AlN/β-Ga_(2)O_(3)高电子迁移率晶体管(HEMT)频率特性的影响,得到以下结论:随着AlN势垒层厚度从10 nm增加到25 nm,截止频率(f_(T))和最高振荡频率(f_(max))分别增加了18和17 GHz,栅电容减小是f_(T)增加的主要原因,同时研究表明势垒层厚度减小有利于增强栅极对沟道电子的控制。栅长从0.9μm减小到0.1μm,f_(T)和f_(max)分别增加了84和98 GHz,其对频率特性的影响远远超过了势垒层厚度;栅长小于0.1μm时,发生短沟道效应。栅漏间距增大时,f_(T)微弱减小,在源电阻和f_(T)共同减小作用下,器件仅在栅源电压(V_(GS))大于-1.2 V时,f_(max)与f_(T)的变化趋势相同。功函数几乎不会影响器件的f_(T)和f_(max),但是功函数的增加改善了器件的夹断特性。本文研究表明,在栅长缩短的同时,增加AlN势垒层厚度、栅漏间距和功函数可以在提高频率特性的同时改善器件的夹断特性,对AlN/β-Ga_(2)O_(3) HEMT器件的设计有一定的指导意义。 展开更多
关键词 β-ga_(2)o_(3) ALN HEMT 截止频率 最高振荡频率
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Investigation of β-Ga_(2)O_(3) thick films grown on c-plane sapphire via carbothermal reduction
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作者 Liyuan Cheng Hezhi Zhang +1 位作者 Wenhui Zhang Hongwei Liang 《Journal of Semiconductors》 EI CAS CSCD 2023年第6期59-64,共6页
We investigated the influence of the growth temperature, O_(2) flow, molar ratio between Ga_(2)O_(3) powder and graphite powder on the structure and morphology of the films grown on the c-plane sapphire(0001) substrat... We investigated the influence of the growth temperature, O_(2) flow, molar ratio between Ga_(2)O_(3) powder and graphite powder on the structure and morphology of the films grown on the c-plane sapphire(0001) substrates by a carbothermal reduction method. Experimental results for the heteroepitaxial growth of β-Ga_(2)O_(3) illustrate that β-Ga_(2)O_(3) growth by the carbothermal reduction method can be controlled. The optimal result was obtained at a growth temperature of 1050 °C. The fastest growth rate of β-Ga_(2)O_(3) films was produced when the O_(2) flow was 20 sccm. To guarantee that β-Ga_(2)O_(3) films with both high-quality crystal and morphology properties, the ideal molar ratio between graphite powder and Ga_(2)O_(3) powder should be set at 10 : 1. 展开更多
关键词 β-ga_(2)o_(3)epitaxy carbothermal reduction method growth parameters
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基于SF_(6)/Ar的电感耦合等离子体干法刻蚀β-Ga_(2)O_(3)薄膜
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作者 曾祥余 马奎 杨发顺 《半导体技术》 CAS 北大核心 2024年第7期624-628,共5页
使用SF_(6)/Ar混合气体作为刻蚀气体,采用电感耦合等离子体(ICP)刻蚀方法,研究了不同激励功率和偏置功率对Ga_(2)O_(3)薄膜刻蚀速率的影响以及不同刻蚀时间对表面粗糙度的影响,并观察了光刻胶的损伤情况以调整刻蚀工艺参数。实验结果表... 使用SF_(6)/Ar混合气体作为刻蚀气体,采用电感耦合等离子体(ICP)刻蚀方法,研究了不同激励功率和偏置功率对Ga_(2)O_(3)薄膜刻蚀速率的影响以及不同刻蚀时间对表面粗糙度的影响,并观察了光刻胶的损伤情况以调整刻蚀工艺参数。实验结果表明,适度地增大激励功率和偏置功率可以提高刻蚀速率;合适的刻蚀时间可以在得到低粗糙度表面的同时不会过度损伤光刻胶掩膜。通过优化工艺参数,在激励功率为600 W、偏置功率为150 W、刻蚀时间为17 min下,可得到30 nm/min的Ga_(2)O_(3)薄膜刻蚀速率,刻蚀表面的垂直度高、粗糙度低,同时光刻胶掩膜形貌完好。 展开更多
关键词 电感耦合等离子体(ICP)刻蚀 Ga_(2)o_(3)薄膜 刻蚀速率 光刻胶掩膜 低粗糙度表面
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Two-step growth of β-Ga_(2)O_(3) on c-plane sapphire using MOCVD for solar-blind photodetector
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作者 Peipei Ma Jun Zheng +3 位作者 Xiangquan Liu Zhi Liu Yuhua Zuo Buwen Cheng 《Journal of Semiconductors》 EI CAS CSCD 2024年第2期51-56,共6页
In this work,a two-step metal organic chemical vapor deposition(MOCVD)method was applied for growingβ-Ga_(2)O_(3) film on c-plane sapphire.Optimized buffer layer growth temperature(T_(B))was found at 700℃ and theβ-... In this work,a two-step metal organic chemical vapor deposition(MOCVD)method was applied for growingβ-Ga_(2)O_(3) film on c-plane sapphire.Optimized buffer layer growth temperature(T_(B))was found at 700℃ and theβ-Ga_(2)O_(3) film with full width at half maximum(FWHM)of 0.66°was achieved.A metal−semiconductor−metal(MSM)solar-blind photodetector(PD)was fabricated based on theβ-Ga_(2)O_(3) film.Ultrahigh responsivity of 1422 A/W@254 nm and photo-to-dark current ratio(PDCR)of 10^(6) at 10 V bias were obtained.The detectivity of 2.5×10^(15) Jones proved that the photodetector has outstanding performance in detecting weak signals.Moreover,the photodetector exhibited superior wavelength selectivity with rejection ratio(R_(250 nm)/R_(400 nm))of 105.These results indicate that the two-step method is a promising approach for preparation of high-qualityβ-Ga_(2)O_(3)films for high-performance solar-blind photodetectors. 展开更多
关键词 MoCVD two-step growth β-ga_(2)o_(3) solar-blind photodetector responsivity
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Dual-Schottky-junctions coupling device based on ultra-longβ-Ga_(2)O_(3)single-crystal nanobelt and its photoelectric properties
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作者 Haifeng Chen Xiaocong Han +9 位作者 Chenlu Wu Zhanhang Liu Shaoqing Wang Xiangtai Liu Qin Lu Yifan Jia Zhan Wang Yunhe Guan Lijun Li Yue Hao 《Journal of Semiconductors》 EI CAS CSCD 2024年第5期90-98,共9页
High qualityβ-Ga_(2)O_(3)single crystal nanobelts with length of 2−3 mm and width from tens of microns to 132μm were synthesized by carbothermal reduction method.Based on the grown nanobelt with the length of 600μm... High qualityβ-Ga_(2)O_(3)single crystal nanobelts with length of 2−3 mm and width from tens of microns to 132μm were synthesized by carbothermal reduction method.Based on the grown nanobelt with the length of 600μm,the dual-Schottky-junctions coupling device(DSCD)was fabricated.Due to the electrically floating Ga_(2)O_(3)nanobelt region coupling with the double Schottky-junctions,the current I_(S2)increases firstly and rapidly reaches into saturation as increase the voltage V_(S2).The saturation current is about 10 pA,which is two orders of magnitude lower than that of a single Schottky-junction.In the case of solar-blind ultraviolet(UV)light irradiation,the photogenerated electrons further aggravate the coupling physical mechanism in device.I_(S2)increases as the intensity of UV light increases.Under the UV light of 1820μW/cm^(2),I_(S2)quickly enters the saturation state.At V_(S2)=10 V,photo-to-dark current ratio(PDCR)of the device reaches more than 104,the external quantum efficiency(EQE)is 1.6×10^(3)%,and the detectivity(D*)is 7.5×10^(12)Jones.In addition,the device has a very short rise and decay times of 25−54 ms under different positive and negative bias.DSCD shows unique electrical and optical control characteristics,which will open a new way for the application of nanobelt-based devices. 展开更多
关键词 β-ga_(2)o_(3)nanobelt carbothermal reduction UV light dual-Schottky coupling device
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切削液对金刚石线锯切割β-Ga_(2)O_(3)晶片表面质量的影响
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作者 王晓龙 高鹏程 +2 位作者 檀柏梅 杜浩毓 王方圆 《润滑与密封》 CAS CSCD 北大核心 2024年第3期133-142,共10页
为了开发出更适合β-Ga_(2)O_(3)晶片切片的切削液,探讨金刚石线锯切片过程中不同切削液对β-Ga_(2)O_(3)晶片表面质量的影响,通过测量接触角和表面张力,研究不同切削液对β-Ga_(2)O_(3)晶片表面的润湿性。采用粗糙度测量仪、非接触式... 为了开发出更适合β-Ga_(2)O_(3)晶片切片的切削液,探讨金刚石线锯切片过程中不同切削液对β-Ga_(2)O_(3)晶片表面质量的影响,通过测量接触角和表面张力,研究不同切削液对β-Ga_(2)O_(3)晶片表面的润湿性。采用粗糙度测量仪、非接触式测厚仪和扫描电镜(SEM)对晶片表面进行测试表征,研究去离子水、添加AEO-9的水基切削液和乳化切削液在不同工艺参数下对切割(010)面β-Ga_(2)O_(3)晶片的表面粗糙度、表面形貌、总厚度变化以及亚表面损伤层深度的影响。结果表明:与去离子水相比,添加AEO-9的水基切削液和乳化切削液均能有效降低β-Ga_(2)O_(3)表面的接触角和表面张力,表明2种切削液均可提高晶片表面润滑性;乳化切削液的效果随着工艺参数的变化而波动很大,只有在低切削热和大切削力的条件下,才能明显优化晶圆表面质量,而水基切削液可稳定地获得较高的晶片表面质量,更适用于β-Ga_(2)O_(3)晶片切割。 展开更多
关键词 β-ga_(2)o_(3)单晶 线锯切割 切削液 润滑能力 表面质量
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基于β-Ga_(2)O_(3)/NiO异质结日盲光电探测器性能研究
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作者 关幼幼 陈海峰 +2 位作者 郭天翔 陆芹 刘祥泰 《电子元件与材料》 CAS 北大核心 2024年第5期528-537,共10页
采用原子层沉积法(ALD)在氧化硅衬底上沉积厚度为60 nm的氧化镓(Ga_(2)O_(3))薄膜,制备基于β-Ga_(2)O_(3)/NiO异质结结构的日盲光电探测器,研究器件的电极间距(d)、薄膜退火温度和欧姆退火温度对其光电性能的影响。研究结果显示,随着d... 采用原子层沉积法(ALD)在氧化硅衬底上沉积厚度为60 nm的氧化镓(Ga_(2)O_(3))薄膜,制备基于β-Ga_(2)O_(3)/NiO异质结结构的日盲光电探测器,研究器件的电极间距(d)、薄膜退火温度和欧姆退火温度对其光电性能的影响。研究结果显示,随着d从30μm缩短至10μm时,器件的光电流(Iphoto)、暗电流(Idark)、光响应度(R)、外部量子效率(EQE)和比探测率(D^(*))增大,上升时间(τr)和下降时间(τd)缩短。随着薄膜退火温度从500℃升至900℃时,器件的Iphoto、Idark、R、 EQE和D^(*)增大,τr和τd缩短。随着欧姆退火温度从350℃升至550℃时,Iphoto、Idark、R和EQE增大,τr和τd缩短。研究表明器件的光电性能在d为10μm、薄膜退火温度为900℃且欧姆退火温度为550℃的条件下最优,在10 V偏压时对应的光暗电流比(PDCR)为1802.63,R为5.27×10^(2)A/W,EQE为257587.76%,D^(*)为5.45×10^(13)Jones。 展开更多
关键词 β-ga_(2)o_(3) 原子层沉积 NIo 异质结 光电探测器 退火温度
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纳米Cr_(2)O_(3)对铝合金微弧氧化膜组织和性能的影响
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作者 方琴 陈庚 +4 位作者 曾舟 李京筱 白莹莹 苗景国 王正云 《兵器材料科学与工程》 CAS CSCD 北大核心 2024年第4期77-84,共8页
在恒流模式下对7050铝合金开展微弧氧化试验。用SEM、EDS、XRD、膜层测厚仪、维氏硬度计、电化学工作站和磨损试验机等研究了不同纳米Cr_(2)O_(3)含量对7050铝合金微弧氧化陶瓷膜组织和性能的影响。结果表明:添加纳米Cr_(2)O_(3)能减小... 在恒流模式下对7050铝合金开展微弧氧化试验。用SEM、EDS、XRD、膜层测厚仪、维氏硬度计、电化学工作站和磨损试验机等研究了不同纳米Cr_(2)O_(3)含量对7050铝合金微弧氧化陶瓷膜组织和性能的影响。结果表明:添加纳米Cr_(2)O_(3)能减小陶瓷膜孔径,提升致密度,优化陶瓷膜结构;当纳米Cr_(2)O_(3)由1 g/L增至5 g/L时,陶瓷膜的厚度、硬度均先增后减;与未添加相比,添加纳米Cr_(2)O_(3)的陶瓷膜的耐蚀性和耐磨性均明显提升;陶瓷膜主要由γ-Al_(2)O_(3)相和少量的α-Al_(2)O_(3)相、莫来石相、Cr_(2)O_(3)相构成;总体来看,当纳米Cr_(2)O_(3)为3 g/L时,陶瓷膜的性能最优,厚度、显微硬度、自腐蚀电流和磨耗比分别为30.98μm、1273HV0.1、5.162×10^(-8)A/cm^(2)、0.0913%。 展开更多
关键词 微弧氧化 7050铝合金 陶瓷膜 Cr_(2)o_(3)
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Effects of preparation parameters on growth and properties of β-Ga_(2)O_(3) film 被引量:2
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作者 陈子豪 王永胜 +8 位作者 张宁 周兵 高洁 吴艳霞 马永 黑鸿君 申艳艳 贺志勇 于盛旺 《Chinese Physics B》 SCIE EI CAS CSCD 2023年第1期440-447,共8页
The Ga_(2)O_(3) films are deposited on the Si and quartz substrates by magnetron sputtering, and annealing. The effects of preparation parameters(such as argon–oxygen flow ratio, sputtering power, sputtering time and... The Ga_(2)O_(3) films are deposited on the Si and quartz substrates by magnetron sputtering, and annealing. The effects of preparation parameters(such as argon–oxygen flow ratio, sputtering power, sputtering time and annealing temperature)on the growth and properties(e.g., surface morphology, crystal structure, optical and electrical properties of the films) are studied by x-ray diffractometer(XRD), scanning electron microscope(SEM), and ultraviolet-visible spectrophotometer(UV-Vis). The results show that the thickness, crystallization quality and surface roughness of the β-Ga_(2)O_(3) film are influenced by those parameters. All β-Ga_(2)O_(3) films show good optical properties. Moreover, the value of bandgap increases with the enlarge of the percentage of oxygen increasing, and decreases with the increase of sputtering power and annealing temperature, indicating that the bandgap is related to the quality of the film and affected by the number of oxygen vacancy defects. The I–V curves show that the Ohmic behavior between metal and β-Ga_(2)O_(3) films is obtained at 900℃. Those results will be helpful for the further research of β-Ga_(2)O_(3) photoelectric semiconductor. 展开更多
关键词 β-ga_(2)o_(3) magnetron sputtering growth parameters optical and electrical properties
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Optical and electrical properties of BaSnO_(3) and In_2O_(3) mixed transparent conductive films deposited by filtered cathodic vacuum arc technique at room temperature
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作者 姚建可 钟文森 《Chinese Physics B》 SCIE EI CAS CSCD 2023年第1期559-562,共4页
For the crystalline temperature of BaSnO_(3)(BTO)was above 650℃,the transparent conductive BTO-based films were always deposited above this temperature on epitaxy substrates by pulsed laser deposition or molecular be... For the crystalline temperature of BaSnO_(3)(BTO)was above 650℃,the transparent conductive BTO-based films were always deposited above this temperature on epitaxy substrates by pulsed laser deposition or molecular beam epitaxy till now which limited there application in low temperature device process.In the article,the microstructure,optical and electrical of BTO and In_(2)O_(3) mixed transparent conductive BaInSnO_(x)(BITO)film deposited by filtered cathodic vacuum arc technique(FCVA)on glass substrate at room temperature were firstly reported.The BITO film with thickness of 300 nm had mainly In_(2)O_(3) polycrystalline phase,and minor polycrystalline BTO phase with(001),(011),(111),(002),(222)crystal faces which were first deposited at room temperature on amorphous glass.The transmittance was 70%–80%in the visible light region with linear refractive index of 1.94 and extinction coefficient of 0.004 at 550-nm wavelength.The basic optical properties included the real and imaginary parts,high frequency dielectric constants,the absorption coefficient,the Urbach energy,the indirect and direct band gaps,the oscillator and dispersion energies,the static refractive index and dielectric constant,the average oscillator wavelength,oscillator length strength,the linear and the third-order nonlinear optical susceptibilities,and the nonlinear refractive index were all calculated.The film was the n-type conductor with sheet resistance of 704.7Ω/□,resistivity of 0.02Ω⋅cm,mobility of 18.9 cm2/V⋅s,and carrier electron concentration of 1.6×10^(19) cm^(−3) at room temperature.The results suggested that the BITO film deposited by FCVA had potential application in transparent conductive films-based low temperature device process. 展开更多
关键词 BaSno_(3)and In_2o_(3)mixed film filtered cathodic vacuum arc deposition transparent conductive films microstructure optical properties electrical properties
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Li_(7)La_(3)Zr_(2)O_(12)基氧化铝薄膜的制备及对固态电解质应用性能的影响
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作者 杨彦飞 陈志萍 +2 位作者 张立新 杨晓峰 刘烨昕 《化学研究与应用》 CAS 北大核心 2024年第5期1040-1047,共8页
Li_(7)La_(3)Zr_(2)O_(12)(LLZO)具有离子电导率高、电化学窗口宽、与锂负极相容性好的特点,在锂离子电池领域成为了传统有机液态电解质的潜在替代品。然而,LLZO极易与空气中的CO_(2)、H_(2)O反应生成副产物Li_(2)CO_(3),致使LLZO离子... Li_(7)La_(3)Zr_(2)O_(12)(LLZO)具有离子电导率高、电化学窗口宽、与锂负极相容性好的特点,在锂离子电池领域成为了传统有机液态电解质的潜在替代品。然而,LLZO极易与空气中的CO_(2)、H_(2)O反应生成副产物Li_(2)CO_(3),致使LLZO离子电导率降低,甚至丧失。针对这一问题,本研究采用先旋涂后烧结的方法在LLZO表面构筑氧化铝薄膜,借助致密氧化铝薄膜阻隔LLZO与空气的直接接触的特性,改善和提高LLZO的空气-水稳定性。结果表明,采用该方法可在LLZO表面构筑厚度约为13.34μm的无定形氧化铝薄膜层。该薄膜层有效提高了LLZO对气体的阻隔性,增大了LLZO表面疏水特性,在一定程度上抑制了Li_(2)CO_(3)的生成。同时,由于渗入LLZO中氧化铝对空隙的填充作用,强化了离子传输特性,使负载薄膜后LLZO的离子传导的活化能从0.40 eV降低至0.28eV,离子电导率从4.48×10^(5)S·cm^(-1)提高到5.06×10^(-5)S·cm^(-1),提高了13%。 展开更多
关键词 Li_(7)La_(3)Zr_(2)o_(12) 固态电解质 氧化铝薄膜 透气性 离子电导率 活化能
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Pd/Ga_(2)O_(3)/AlGaN/GaN HEMT基氢气传感器研究
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作者 钟远婷 孙爱发 +1 位作者 刘阳泉 钟爱华 《传感器与微系统》 CSCD 北大核心 2024年第3期18-21,共4页
氢气易燃易爆,因此需要海量快速响应的氢气传感器对加氢站、运输车及氢能源汽车等氢能源各个环节进行预警预报。本文研究了基于贵金属钯(Pd)为栅极的高速二维电子气晶体管(HEMT)型氢气传感器,金属Pd栅极为敏感电极,Ti/Al/Ti/Au为源漏极... 氢气易燃易爆,因此需要海量快速响应的氢气传感器对加氢站、运输车及氢能源汽车等氢能源各个环节进行预警预报。本文研究了基于贵金属钯(Pd)为栅极的高速二维电子气晶体管(HEMT)型氢气传感器,金属Pd栅极为敏感电极,Ti/Al/Ti/Au为源漏极。结果表明:该晶体管开关比为3.58×10^(7)。实验研究了不同厚度Ga_(2)O_(3)插入层对氢气响应特性的影响规律。随着Ga_(2)O_(3)插入层的厚度增大,传感器的饱和体积分数明显增大,从1×10^(-3)提高到7×10^(-3)。对于Ga_(2)O_(3)插入层厚度为10 nm的器件,其综合性能最好,饱和浓度为5×10^(-3),且具有很高的响应度,1×10^(-3)时的响应度为4300%。特别地,其响应速度非常快,最快可以2 s内完成氢气检测。 展开更多
关键词 氧化镓薄膜 氢气传感器 HEMT 选择性
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Eu^(3+)掺杂β-Ga_(2)O_(3)的水热法制备及其光学性能
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作者 张法碧 何婷波 +1 位作者 周娟 周飞 《桂林电子科技大学学报》 2023年第6期446-452,共7页
采用高温水热法合成稀土Eu3+掺杂β-Ga_(2)O_(3)荧光粉,研究不同热退火温度对其发光性能的影响。利用X射线衍射仪对样品的物质结构信息进行表征,样品衍射峰发生小角度偏移,表明Eu^(3+)进入β-Ga_(2)O_(3)晶格中。通过拉曼光谱仪对样品... 采用高温水热法合成稀土Eu3+掺杂β-Ga_(2)O_(3)荧光粉,研究不同热退火温度对其发光性能的影响。利用X射线衍射仪对样品的物质结构信息进行表征,样品衍射峰发生小角度偏移,表明Eu^(3+)进入β-Ga_(2)O_(3)晶格中。通过拉曼光谱仪对样品的物质结构和组态进行检测,样品的拉曼峰与β-Ga_(2)O_(3)结构的拉曼峰位置一致,并在800℃达到最大峰值,说明此温度下样品的结晶度最好。使用扫描电子显微镜对样品的表面形貌进行观测,不同热退火温度下荧光粉颗粒分布均匀,表明热退火处理后样品的结晶质量良好。在395 nm波长激发光谱作用下,可以看到2种不同的发射光谱,591 nm处为Eu^(3+)(^(5)D_(0)→^(7)F_(1))跃迁产生的橙光发射,612 nm处为Eu^(3+)(^(5)D_(0)→^(7)F_(2))跃迁产生的红光发射,并以发射红光为主。随着退火温度的不断升高,样品的发射光谱强度先增大后减小,并在800℃下达到最大值,表明热退火温度为800℃时荧光粉样品的发光效果最好。水热法合成工艺简单且成本低廉,合成的样品纯度高。高温热退火处理可通过应力作用减少材料中的缺陷,提高结晶度,从而提升荧光粉的发光性能。 展开更多
关键词 水热法 退火温度 Eu^(3+)掺杂β-ga_(2)o_(3)荧光粉 稀土发光 色坐标
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