Solar‑Driven Sustainability:Ⅲ–ⅤSemiconductor for Green Energy Production Technologies

Long-term societal prosperity depends on addressing the world’s energy and environmental problems,and photocatalysis has emerged as a viable remedy.Improving the efficiency of photocatalytic processes is fundamentally achieved by optimizing the effective utilization of solar energy and enhancing the efficient separation of photogenerated charges.It has been demonstrated that the fabrication ofⅢ–Ⅴsemiconductor-based photocatalysts is effective in increasing solar light absorption,long-term stability,large-scale production and promoting charge transfer.This focused review explores on the current developments inⅢ–Ⅴsemiconductor materials for solar-powered photocatalytic systems.The review explores on various subjects,including the advancement ofⅢ–Ⅴsemiconductors,photocatalytic mechanisms,and their uses in H2 conversion,CO_(2)reduction,environmental remediation,and photocatalytic oxidation and reduction reactions.In order to design heterostructures,the review delves into basic concepts including solar light absorption and effective charge separation.It also highlights significant advancements in green energy systems for water splitting,emphasizing the significance of establishing eco-friendly systems for CO_(2)reduction and hydrogen production.The main purpose is to produce hydrogen through sustainable and ecologically friendly energy conversion.The review intends to foster the development of greener and more sustainable energy source by encouraging researchers and developers to focus on practical applications and advancements in solar-powered photocatalysis.

Luminescence Characteristics of Yb^(3+) and Er^(3+) in Ⅲ-Ⅴ Semiconductors

The sharp luminescent peaks in Yb and Er-implanted InP,SI-InP,GaAs,and n-GaAs were observed at 77K.The peaks at 1.0 and 1.5μm come from(4f)~2F_(5/2)→~2F_(7/2)of Yb^(3+)and ~4I_(13/2)→~4I_(15/2)of Er^(3+), respectively.The optimum luminescent intensities can be obtained from Yb-implanted and Er-implanted sam- ples which were annealed at 800 and 750℃,respectively.A ccording to the analyses of PL and the rocking curve of X-ray double crystal diffraction,the best crystal structure of implanted InP layer has been obtained by an- nealing at 850℃.The interaction between Yb^(3+)and Er^(3+)in the SI-InP has been investigated for the first time. The quenching effect of Yb^(3+)and Er^(3+)with each other has been observed when the doses of Yb and Er-im- planted SI-InP are equal.

Thermodynamic analysis of growth of ternary Ⅲ-Ⅴ semiconductor materials by molecular-beam epitaxy

Thermodynamic models for molecular-beam epitaxy（MBE） growth of ternary Ⅲ-Ⅴ semiconductor materials are proposed.These models are in agreement with our experimental materials InGaP/GaAs and InGaAs/InP,and reported GaAsP/GaAs and InAsP/InP in thermodynamic growth.The lattice strain energy △G and thermal decomposition sensitive to growth temperature are demonstrated in the models simultaneously.△G is the function of the alloy composition,which is affected by flux ratio and growth temperature directly.The calculation results reveal that flux ratio and growth temperature mainly influence the growth process.Thermodynamic model of quaternary InGaAsP/GaAs semiconductor material is discussed also.

基于Ⅲ-Ⅴ族材料制备的高效多结太阳电池最新技术进展

基于Ⅲ-Ⅴ族材料制备的多结太阳电池由于优越的性能,在空间电源领域和地面聚光方面的应用越来越受到重视。介绍了多结太阳电池的高光电转换效率机理,并从材料选择、结构设计、优化生长工艺等方面讨论了研发Ⅲ-Ⅴ族高效多结太阳电池的实现方案和最新技术进展。重点探讨了采用GaInNAs(Sb)新材料、倒置生长、半导体键合等技术方法。其中,采用半导体键合技术制备的GaInP/GaAs//GaInAsP/GaInAs四结太阳电池光电转换效率为46%,也是目前实验室最高效率。此外,分析了Ⅲ-Ⅴ族高效多结太阳电池的发展方向,并对其前景进行了展望。

Ⅲ-Ⅴ族化合物超薄层外延生长新技术——原子层外延

本文概述了Ⅲ-Ⅴ族化合物原子层外延(ALE),重点介绍了脉冲喷射(PJ)-ALF、氯化物-ALE和增强迁移外延(MEE)。ALE生长层厚度对生长参数,如源气体分压、生长温度和生长时间都不敏感,主要取决于ALE周期数目,因此ALE又称“数字外延”。与传统的MBE和MOCVD相比,ALE具有生长层厚度更均匀、缺陷密度更低、选择外廷中无边缘生长以及侧壁外延可控制到单原子层等优点。文中还讨论了ALEⅢ-Ⅴ族化合物电学性能和应用。

几种Ⅲ─Ⅴ族化合物半导体材料的研究热点

本文分别介绍了Ⅲ－Ⅴ族化合物砷化镓（ＧａＡｓ），氮化镓（ＧａＮ），锑化镓（ＧａＳｂ）的特性、生长方 法，国内外研究水平及应用。

Epitaxial Techniques for Compound Semiconductor Growth:from LPE to MOVPE

The epitaxial techniques are the most important processes in the production of semiconductor materials and optoelectronic devices. Liquid phase epitaxy (LPE) and metal organic vapor phase epitaxy (MOVPE) particularly have many applications.The process characteristics and crystalline properties of both LPE and MOVPE techniques were introduced briefly, the compositional space suitable for LPE and MOVPE growth was discussed from the view point of thermodynamic equilibrium. The analysis and comparison show that on the one hand LPE and MOVPE have some advantages and characteristics in common; on the other hand, they may overcome each other′s weaknesses and deficiencies by offering their own special features.

Latest advances in high-performance light sources and optical amplifiers on silicon

Efficient light generation and amplification has long been missing on the silicon platform due to its well-known indirect bandgap nature.Driven by the size,weight,power and cost(SWaP-C)requirements,the desire to fully realize integrated silicon electronic and photonic integrated circuits has greatly pushed the effort of realizing high performance on-chip lasers and amplifiers moving forward.Several approaches have been proposed and demonstrated to address this issue.In this paper,a brief overview of recent progress of the high-performance lasers and amplifiers on Si based on different technology is presented.Representative device demonstrations,including ultra-narrow linewidthⅢ-Ⅴ/Si lasers,fully integratedⅢ-Ⅴ/Si/Si3N4 lasers,high-channel count mode locked quantum dot(QD)lasers,and high gain QD amplifiers will be covered.

Growth of Ⅲ-Ⅴ semiconductor nanowires and their heterostructures

In this paper, we present a review about recent progress on the growth of III-V semiconductor homo- and heterostructured nanowires. We will first deliver a general discussion on the crystal structure and the conventional growth mechanism of one dimensional nanowires. Then we provide a review about most widely used growth techniques, sample preparation and the cutting edge characterization techniques including advanced electron microscopy, in situ electron diffraction, micro-Raman spectroscopy, and atom probe tomography. In the end, the growth of different heteostructured III-V semiconductor nanowires will be reviewed. We will focus on the morphology dependence, temperature influence, and III/V flux ratio dependent growth. The perspective and an outlook of this field is discussed in order to foresee the future of the fundamental research and application of these one dimensional nanostructures.

What has been measured by reflection magnetic circular dichroism in Ga_(1-x)Mn_xAs/GaAs structures?

An explicit expression of reflection magnetic circular dichroism （RMCD） has been derived, taking into account the interference effect that arises from multiple internal reflections in an air/Ga1-xMnxAs/GaAs dielectric layered system. It unambiguously shows that the RMCD signal is composed by three terms. In addition to the conventional term, which is sufficient in the absence of interference, an oscillatory term is required. Both of them are related to the imaginary part εxy of the off-diagonal element of the dielectric tensor. One also becomes aware that in this case RMCD is not actually determined only by the imaginary part εxy of the off-diagonal element of the dielectric tensor, as has been widely accepted. In fact, the real part εxy of the off-diagonal element will substantially mix into the measured RMCD results by another oscillatory cos θ form. It can even reverse the sign of RMCD, when the Gal_xMnxAs layer becomes thicker. The main aspects of these predictions were used to reasonably explain the RMCD results measured in three different types of samples. Our work will bring about a reconsideration of how to correctly explain RMCD results.

>35%5-junction space solar cells based on the direct bonding technique

Multijunction solar cells are the highest efficiency photovoltaic devices yet demonstrated for both space and terrestrial applications.In recent years five-junction cells based on the direct semiconductor bonding technique(SBT),demonstrates space efficiencies>35%and presents application potentials.In this paper,the major challenges for fabricating SBT 5J cells and their appropriate strategies involving structure tunning,band engineering and material tailoring are stated,and 4-cm235.4%(AM0,one sun)5J SBT cells are presented.Further efforts on detailed optical managements are required to improve the current generating and matching in subcells,to achieve efficiencies 36%-37%,or above.

Study of depth-dependent tetragonal distortion of quaternary AlInGaN epilayer by Rutherford backscattering/channeling

A 240-nm thick Al0.4In0.02Ga0.58N layer is grown by metal organic chemical vapour deposition, with an over 1-μm thick GaN layer used as a buffer layer on a substrate of sapphire （0001）. Rutherford backscattering and channeling are used to characterize the microstructure of AlInGaN. The results show a good crystalline quality of AIInGaN （χmin = 1.5%） with GaN buffer layer. The channeling angular scan around an off-normal {1213} axis in the {1010} plane of the AlInGaN layer is used to determine tetragonal distortion eT, which is caused by the elastic strain in the AIInGaN. The resulting AlInGaN is subjected to an elastic strain at interracial layer, and the strain decreases gradually towards the near-surface layer. It is expected that an epitaxial AlInGaN thin film with a thickness of 850 nm will be fully relaxed （^eT = 0）.

First-principles study of the co-effect of carbon doping and oxygen vacancies in ZnO photocatalyst

Although tuning band structure of optoelectronic semiconductor-based materials by means of doping single defect is an important approach for potential photocatalysis application,C-doping or oxygen vacancy(Vo)as a single defect in ZnO still has limitations for photocatalytic activity.Meanwhile,the influence of co-existence of various defects in ZnO still lacks sufficient studies.Therefore,we investigate the photocatalytic properties of ZnOx C0.0625(x=0.9375,0.875,0.8125),confirming that the co-effect of various defects has a greater enhancement for photocatalytic activity driven by visible-light than the single defect in ZnO.To clarify the underlying mechanism of co-existence of various defects in ZnO,we perform systematically the electronic properties calculations using density functional theory.It is found that the coeffect of C-doping and Vo in ZnO can achieve a more controllable band gap than doping solely in ZnO.Moreover,the impact of the effective masses of ZnO_(x)C_(0.0625)(x=0.9375,0.875,0.8125)is also taken into account.In comparison with heavy Vo concentrations,the light Vo concentration(x=0.875)as the optimal component together with C-doping in ZnO,can significantly improve the visible-light absorption and benefit photocatalytic activity.

CALCULATION OF PHASE DIAGRAM FOR PSEUDOBINARY GaAs-InAs

ＣＡＬＣＵＬＡＴＩＯＮＯＦＰＨＡＳＥＤＩＡＧＲＡＭＦＯＲＰＳＥＵＤＯＢＩＮＡＲＹＧａＡｓ－ＩｎＡｓ￥Ｑｉａｏ，Ｈｕａｎ；Ｓｈｅｎ，Ｊｉａｎｙｕｎ；Ｌｉ，Ｇｕｏｘｕｎ（ＧｅｎｅｒａｌＲｅｓｅａｒｃｈＩｎｓｔｉｔｕｔｅｆｏｒＮｏｎｆｅｒｒｏｕｓＭｅｔａｌ...

Au／AuGeNi／n－GaAs欧姆接触失效机理的研究

对Ａｕ／ＡｕＧｅＮｉ／ｎ－ＧａＡｓ欧姆接触进行了三种不同的应力试验：（１）高温存储（ＨＴＳ），（２）常温大电流（ＨＣ），（３）高温适当电流。试验结果表明，三种试验均造成了试验后期欧姆接触电阻增大，最后导致欧姆接触失效。ＡＥＳ分析表明，试验后的样品发生了Ｎｉ、Ａｎ和ＧａＡｓ的互扩散。

MOCVD外延生长AlGaAs组份的在线监测

利用反射各向异性谱(RAS)和反射谱在线监测了AlxGa1-xAs样品的金属有机化合物汽相淀积(MOCVD)外延生长过程。通过在线监测得到的RAS和反射谱可以敏感地反映出AlxGa1-xAs外延层组份发生的变化,从而优化外延生长工艺。实验表明,反射谱中的振荡周期可以在线计算组份和生长速率,利用反射谱中的振荡的第一个最小值与Al组份的线性关系,可以确定渐变组份初始值。通过在线计算得到的生长速率和组份与扫描电镜(SEM)和高分辨X射线衍射(HRXRD)测试得到的结果基本吻合。

键合技术的研究进展及应用

晶片直接键合技术是材料集成的一项新工艺,是近年来集成光电子领域的研究热点之一。利用键合技术可以集成晶格或晶向失配的材料,制造传统外延生长技术不能制造的结构和器件。概括介绍了近年来Ⅲ-Ⅴ族化合物半导体材料键合技术的最新研究进展及其在光电子器件和集成领域的应用。

Reactive Ion Etching of GaAs,GaSb,InP and InAs in Cl_2/Ar Plasma

Reactive ion etching characteristics of GaAs,GaSb,InP and InAs using Cl2/Ar plasma have been investigated,it is that,etching rates and etching profiles as functions of etching time,gas flow ratio and RF power.Etch rates of above 0.45 μm/min and 1.2 μm/min have been obtained in etching of GaAs and GaSb respectively, while very slow etch rates （<40 nm/min） were observed in etching of In-containing materials,which were linearly increased with the applied RF power.Etched surfaces have remained smooth over a wide range of plasma conditions in the etching of GaAs,InP and InAs,however,were partly blackened in etching of GaSb due to a rough appearance.

Growth and properties of wide spectral white light emitting diodes

Wide spectral white light emitting diodes have been designed and grown on a sapphire substrate by using a metal-organic chemical vapor deposition system. Three quantum wells with blue-light-emitting, green-light-emitting and red-light-emitting structures were grown according to the design. The surface morphology of the film was observed by using atomic force microscopy. The films were characterized by their photoluminescence measurements. X-ray diffraction t9/2/9 scan spectroscopy was carried out on the multi-quantum wells. The secondary fringes of the symmetric ω/2θ X-ray diffraction scan peaks indicate that the thicknesses and the alloy compositions of the individual quantum wells are repeatable throughout the active region. The room temperature photoluminescence spectra of the structures indicate that the white light emission of the multi-quantum wells is obtained. The light spectrum covers 400 700 nm, which is almost the whole visible light spectrum.