High resistance thin film chip resistors(0603 type) were studied,and the specifications are as follows:1 k? with tolerance about ±0.1% after laser trimming and temperature coefficient of resistance(TCR) less than...High resistance thin film chip resistors(0603 type) were studied,and the specifications are as follows:1 k? with tolerance about ±0.1% after laser trimming and temperature coefficient of resistance(TCR) less than ±15×10-6/℃.Cr-Si-Ta-Al films were prepared with Ar flow rate and sputtering power fixed at 20 standard-state cubic centimeter per minute(sccm) and 100 W,respectively.The experiment shows that the electrical properties of Cr-SiTa-Al deposition films can meet the specification requirements of 0603 ty...展开更多
A novel Pt@ZnO nanorod/carbon fiber （NR/CF） with hierarchical structure was prepared by atomic layer deposition combined with hydrothermal synthesis and magnetron sputtering （MS）. The morphology of Pt changes from...A novel Pt@ZnO nanorod/carbon fiber （NR/CF） with hierarchical structure was prepared by atomic layer deposition combined with hydrothermal synthesis and magnetron sputtering （MS）. The morphology of Pt changes from nanoparticle to nanorod bundle with controlled thickness of Pt between 10 and 50 nm. Significantly, with the increase of voltage from 0 to 0.6 V （vs. standard calomel electrode）, the prompt photocurrent generated on ZnO NR/CF increases from 0235 to 0.725 mA. Besides, the Pt@ZnO NR/CF exhibited higher electrochemical active surface area （ECSA） value, better methanol oxidation ability and CO tolerance than Pt@CF, which demonstrated the importance of the multifunctional ZnO support. As the thickness of Pt increasing from 10 to 50 rim, the ECSA values were improved proportionally, leading to the improvement of methanol oxidation ability. More importantly, UV radiation increased the density of peak current of Pt@ZnO NR/CF towards methanol oxidation by additional 42.4%, which may be due to the synergy catalysis of UV light and electricity.展开更多
基金Supported by Science and Technology Committee of Tianjin (No.06YFGPGX08400)Ministry of Science and Technology of China (No.2009GJF20022)Innovation Fund of Tianjin University
文摘High resistance thin film chip resistors(0603 type) were studied,and the specifications are as follows:1 k? with tolerance about ±0.1% after laser trimming and temperature coefficient of resistance(TCR) less than ±15×10-6/℃.Cr-Si-Ta-Al films were prepared with Ar flow rate and sputtering power fixed at 20 standard-state cubic centimeter per minute(sccm) and 100 W,respectively.The experiment shows that the electrical properties of Cr-SiTa-Al deposition films can meet the specification requirements of 0603 ty...
基金Supported by the National Key R&D Program(2016YFC0204000)the National Natural Science Foundation of China(U1510202)+1 种基金the Jiangsu Province Scientific Supporting Project(BK20170046and BE2015023)
文摘A novel Pt@ZnO nanorod/carbon fiber （NR/CF） with hierarchical structure was prepared by atomic layer deposition combined with hydrothermal synthesis and magnetron sputtering （MS）. The morphology of Pt changes from nanoparticle to nanorod bundle with controlled thickness of Pt between 10 and 50 nm. Significantly, with the increase of voltage from 0 to 0.6 V （vs. standard calomel electrode）, the prompt photocurrent generated on ZnO NR/CF increases from 0235 to 0.725 mA. Besides, the Pt@ZnO NR/CF exhibited higher electrochemical active surface area （ECSA） value, better methanol oxidation ability and CO tolerance than Pt@CF, which demonstrated the importance of the multifunctional ZnO support. As the thickness of Pt increasing from 10 to 50 rim, the ECSA values were improved proportionally, leading to the improvement of methanol oxidation ability. More importantly, UV radiation increased the density of peak current of Pt@ZnO NR/CF towards methanol oxidation by additional 42.4%, which may be due to the synergy catalysis of UV light and electricity.
