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基于三元等离子体处理的PCB高厚径比孔清洗技术研究
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作者 贾维 唐瑞芳 +4 位作者 刘胜贤 周国云 洪延 陈磊 李志强 《印制电路信息》 2023年第10期31-35,共5页
三元等离子体在处理高厚径比通孔、活化高频印制电路板(PCB)方面存在突出的性能优势。以等离子体清洗量和清洗均匀性为评价指标,针对三元等离子体(O_(2)/N_(2)/CF_(4))在高厚径比通孔清洗中的关键性参数及其最优化应用范围进行研究。金... 三元等离子体在处理高厚径比通孔、活化高频印制电路板(PCB)方面存在突出的性能优势。以等离子体清洗量和清洗均匀性为评价指标,针对三元等离子体(O_(2)/N_(2)/CF_(4))在高厚径比通孔清洗中的关键性参数及其最优化应用范围进行研究。金相显微镜与扫描电子显微镜(SEM)观察显示,三元等离子体在清洗高厚径比通孔时设置在温度75~105℃、功率7.0~8.5 kW、CF_(4)含量8%~10%时,能够得到良好的清洗效果。 展开更多
关键词 高厚径比 通孔 三元等离子体 印制电路板
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Ar/N2/CH4 Glow Discharge at Low Pressures
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作者 Leomar Salazar-Flores Horacio Martinez-Valencia +1 位作者 Alfonso Guerrero-Tapia Pedro Guillermo Reyes-Romero 《Journal of Physical Science and Application》 2012年第8期283-288,共6页
Ar/N2/CH4 glow discharge at low-pressure are studied in a closed system. The plasma was produced in 79.6% N2-15.4% Ar- 5.0% CH4 ternary mixture at pressures between 0.5 and 10.0 Torr. The diagnostic has been made by o... Ar/N2/CH4 glow discharge at low-pressure are studied in a closed system. The plasma was produced in 79.6% N2-15.4% Ar- 5.0% CH4 ternary mixture at pressures between 0.5 and 10.0 Torr. The diagnostic has been made by optical emission spectroscopy (OES). The principal species observed were: N2, N2+, CH+, CN, C2, C3, HI3, Ha, C+ and At. It presents the behaviour of the bands and lines intensities as a function of the pressure. Also, it displays the ratios of intensities of N+2 (391.44 nm), CN (392.08 nm), and H (486.13 nm) to that of the N2 (337.13 rim) as function of pressure. The ratios show a slow decreasing behavior as a function of the pressure. Being the CH/N2 ratio more highest and H/N2 ratio the lowest one. The variations of excited species at different pressures may change the subsequent chemical reactions in the gas phase significantly. The present results suggest that the ion-molecule and molecule-molecule reactions in the gas phase are likely to play a dominant role in the present pressures. 展开更多
关键词 Glow discharge optical emission spectroscopy low pressure discharge titan's atmosphere.
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