In rapid thermal processing of a semiconductor wafer, it is important to keep a given temperature rising speed of the wafer during the temperature rising process. We made an experimental apparatus to measure the tempe...In rapid thermal processing of a semiconductor wafer, it is important to keep a given temperature rising speed of the wafer during the temperature rising process. We made an experimental apparatus to measure the temperature rising speed of a ceramic ball of 2 mm in diameter heated with four halogen lamp heaters. The heating rate of the halogen lamp heaters was controlled by computer to keep a given temperature rising speed of 50 ℃/s with a controlling time interval of 0.1 s. We examined the effect of various heating control methods on the error of the temperature rising speed of the ceramic ball. We found that a combined method of control with prepared correlation and PID （proportional integral derivative） control is a good method to decrease the error of the temperature rising speed. The average error of the temperature rising speed is 0.5 ℃/s, and the repetition error is almost zero for the temperature rising speed of 50 ℃/s from 330 ℃ to 370 ℃. We also measured the effects of artificial control delay time and measuring error of the monitoring temperature on the error of the temperature rising speed.展开更多
文摘In rapid thermal processing of a semiconductor wafer, it is important to keep a given temperature rising speed of the wafer during the temperature rising process. We made an experimental apparatus to measure the temperature rising speed of a ceramic ball of 2 mm in diameter heated with four halogen lamp heaters. The heating rate of the halogen lamp heaters was controlled by computer to keep a given temperature rising speed of 50 ℃/s with a controlling time interval of 0.1 s. We examined the effect of various heating control methods on the error of the temperature rising speed of the ceramic ball. We found that a combined method of control with prepared correlation and PID （proportional integral derivative） control is a good method to decrease the error of the temperature rising speed. The average error of the temperature rising speed is 0.5 ℃/s, and the repetition error is almost zero for the temperature rising speed of 50 ℃/s from 330 ℃ to 370 ℃. We also measured the effects of artificial control delay time and measuring error of the monitoring temperature on the error of the temperature rising speed.
