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一种用于偏扫电流校正的特征点参数采集装置 被引量:1
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作者 朱进鹏 韦寿祺 刘胜 《强激光与粒子束》 EI CAS CSCD 北大核心 2017年第7期60-66,共7页
电子束快速成型设备偏扫系统工作频率高,磁偏扫装置的铁损、涡流等损耗导致偏扫轨迹产生偏差。通过获取偏扫区域内特征点基准偏扫参数并由插补算法计算区域内任意一点偏扫参数,能够较好地抑制动态偏差;但由光学观察系统判断电子束斑点... 电子束快速成型设备偏扫系统工作频率高,磁偏扫装置的铁损、涡流等损耗导致偏扫轨迹产生偏差。通过获取偏扫区域内特征点基准偏扫参数并由插补算法计算区域内任意一点偏扫参数,能够较好地抑制动态偏差;但由光学观察系统判断电子束斑点位置所获得的基准偏扫参数精确性较低。为提高偏扫轨迹精度,在现有电子束快速成型机上加装一种特征点参数采集装置,收集产生的二次反射电子,通过二次反射电子信号判断特征点通孔中心与电子束斑点中心的对中性。实验表明:当电子束斑点位于特征点中心且聚焦于上表面时,二次反射电子信号最小,此时获得的基准偏扫参数精确性高,能够提高电子束偏扫加工的精度。 展开更多
关键词 偏扫电流 校正 特征点 参数采集 二次反射电子
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Emission property of Y_2O_3-doped Mo secondary emitter
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作者 王金淑 刘伟 +3 位作者 李洪义 高非 任志远 周美玲 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2010年第2期233-237,共5页
Y2O3-doped Mo secondary emitters were prepared by liquid-liquid doping and solid-solid doping,respectively.The back-scattered scanning observation result indicates that the emitter prepared by liquid-liquid doping has... Y2O3-doped Mo secondary emitters were prepared by liquid-liquid doping and solid-solid doping,respectively.The back-scattered scanning observation result indicates that the emitter prepared by liquid-liquid doping has fine microstructure whereas that prepared by solid-solid doping has large grain size.Y2O3-doped Mo emitter with small grain size prepared by liquid-liquid doping exhibits high emission property,i.e.,the secondary electron yield can get to 5.24,about 1.7 times that prepared by solid-solid doping.Moreover,Y2O3-doped Mo emitter exhibits the best emission performance among La2O3-doped Mo,Y2O3-doped Mo, Gd2O3-doped Mo and Ce2O3-doped Mo emitters due to the largest penetration depth of primary electrons and escape depth of secondary electrons in this emitter.The secondary emission of the emitter with small grain size can be explained by reflection emission model and transmission emission model,whereas only transmission emission exists in the emitter with large grain size. 展开更多
关键词 Y2O3-doped Mo powder metallurgy emission property microstructure
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