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铜互连布线及其镶嵌技术在深亚微米IC工艺中的应用 被引量:6
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作者 张兆强 郑国祥 +3 位作者 黄榕旭 杨兴 邵丙铣 宗祥福 《固体电子学研究与进展》 CAS CSCD 北大核心 2001年第4期407-414,共8页
近几年来 ,随着 VLSI器件密度的增加和特征尺寸的减小 ,铜互连布线技术作为减小互连延迟的有效技术 ,受到人们的广泛关注。文中介绍了基本的铜互连布线技术 ,包括单、双镶嵌工艺 ,CMP工艺 ,低介电常数材料和阻挡层材料 。
关键词 镶嵌技术 互连布线 深亚微米 集成电路工艺
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未来十年互连布线技术的新挑战
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作者 尹凡 《电子元器件应用》 2000年第8期37-38,共2页
1999年4月底,在美国举行了第三届国际布线设计学术讨论会,会议就未来10年布线设计的需求和发展趋势进行了深入讨论,会上,SRC提出'未来十年VLSI布线技术的十大问题',作为大学、研究机构和工业界的主要研究课题和产品开发方向。SR... 1999年4月底,在美国举行了第三届国际布线设计学术讨论会,会议就未来10年布线设计的需求和发展趋势进行了深入讨论,会上,SRC提出'未来十年VLSI布线技术的十大问题',作为大学、研究机构和工业界的主要研究课题和产品开发方向。SRC是包括一些美国主要半导体公司,如Intel、IBM、National Semiconductor和LSI Logic等联合组成的超大规模集成电路计算机辅助设计(VLSICAD)技术研究项目的管理机构。在未来10年中,布线技术要面对单个芯片高达数百兆个晶体管,多至7、8层金属的多层布线问题。 展开更多
关键词 互连布线 模块级线 线规则
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有机介质薄膜-陶瓷异构集成互连技术 被引量:1
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作者 杨鑫 刘英坤 +3 位作者 张鹤 张崤君 杨欢 高岭 《微纳电子技术》 CAS 北大核心 2022年第1期99-106,共8页
介绍了有机介质薄膜-陶瓷异构集成互连技术发展概况,基于陶瓷基板、有机介质薄膜和金属化布线及互连制备工艺,详细阐述了有机介质薄膜-陶瓷异构集成互连中的四种关键技术:陶瓷基板收缩率控制、陶瓷基板表面处理、有机介质薄膜制备和金... 介绍了有机介质薄膜-陶瓷异构集成互连技术发展概况,基于陶瓷基板、有机介质薄膜和金属化布线及互连制备工艺,详细阐述了有机介质薄膜-陶瓷异构集成互连中的四种关键技术:陶瓷基板收缩率控制、陶瓷基板表面处理、有机介质薄膜制备和金属化布线及互连。陶瓷基板收缩率控制是通过改善陶瓷基板制备工艺,实现了对陶瓷基板通孔位置的控制,进而使陶瓷基板更好地与薄膜工艺相匹配;陶瓷基板表面处理是利用化学机械抛光(CMP)处理陶瓷基板表面,使基板表面粗糙度和平整度满足有机介质薄膜工艺需求,实现了在陶瓷基板上兼容有机介质薄膜;有机介质薄膜由低介电常数的有机高分子聚合物通过旋涂和烘焙而成,再通过多次薄膜工艺实现了多层有机介质薄膜的制备;金属化布线及互连利用物理气相沉积(PVD)技术制备粘附层金属和导电层金属,实现了介质层金属化布线和层间金属化互连。最后展望了有机介质薄膜-陶瓷异构集成互连技术的发展趋势。 展开更多
关键词 异构集成 陶瓷基板 有机介质薄膜 异构互连 表面处理 金属化线互连
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MT/MPO光纤连接器的新发展 被引量:5
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作者 徐乃英 《现代有线传输》 2003年第3期1-6,共6页
本文介绍近年来为了适应高速和大容量光纤通信系统中高密度和高效率的互连布线的需要 ,日本住友和藤仓两家公司在 MT/MPO光纤连接器方面所进行的研究开发工作。研究重点在这些连接器中的关键部件MT套筒的改进。采用了注塑成形的 PPS新... 本文介绍近年来为了适应高速和大容量光纤通信系统中高密度和高效率的互连布线的需要 ,日本住友和藤仓两家公司在 MT/MPO光纤连接器方面所进行的研究开发工作。研究重点在这些连接器中的关键部件MT套筒的改进。采用了注塑成形的 PPS新材料来制造套筒 ,以取得超低而稳定的介入损耗 ;提出了在连接端面附近的导引孔周围打倒角 ,以改善反复接插的耐久性。引入了最大达 16芯的单维 MT连接器和最大达 60芯的 2 -维阵列 MT连接器 ,以代替用多个 12芯 MT套筒的大芯数连接器 ,显著增加了光纤密度。开发了 2 -维阵列 MT连接器用的 2 4芯扁光纤带光缆代替圆光缆。文章介绍了这些新开发的产品的光学。 展开更多
关键词 光纤通信 互连布线 MT/MPO光纤连接器 MT套筒 注塑成形 弯曲半径 叠堆光纤 护套收缩
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Influence of Interconnection Configuration on Thermal Dissipation of ULSI Interconnect Systems 被引量:2
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作者 肖夏 姚素英 阮刚 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2006年第3期516-523,共8页
The effects of adjacent metal layers and space between metal lines on the temperature rise of multilevel ULSI interconnect lines are investigated by modeling a three-layer interconnect. The heat dissipation of various... The effects of adjacent metal layers and space between metal lines on the temperature rise of multilevel ULSI interconnect lines are investigated by modeling a three-layer interconnect. The heat dissipation of various metallization technologies concerning the metal and low-k dielectric employment is simulated in detail. The Joule heat generated in the interconnect is transferred mainly through the metal lines in each metal layer and through the path with the smallest thermal resistance in each Ield layer. The temperature rises of Al metallization are approximately pAl/pCu times higher than those of Cu metallization under the same conditions. In addition, a thermal problem in 0.13μm globe interconnects is studied for the worst case, in which there are no metal lines in the lower interconnect layers. Several types of dummy metal heat sinks are investigated and compared with regard to thermal efficiency,influence on parasitic capacitance,and optimal application by combined thermal and electrical simula- tion. 展开更多
关键词 ULSI interconnect heat dissipation geometrical configuration
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Path-Based Timing Optimization by Buffer Insertion with Accurate Delay Model
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作者 张轶谦 周强 +1 位作者 洪先龙 蔡懿慈 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2004年第5期520-525,共6页
An algorithm of path based timing optimization by buffer insertion is presented.The algorithm adopts a high order model to estimate interconnect delay and a nonlinear delay model based on look up table for gate dela... An algorithm of path based timing optimization by buffer insertion is presented.The algorithm adopts a high order model to estimate interconnect delay and a nonlinear delay model based on look up table for gate delay estimation.And heuristic method of buffer insertion is presented to reduce delay.The algorithm is tested by industral circuit case.Experimental results show that the algorithm can optimize the timing of circuit efficiently and the timing constraint is satisfied. 展开更多
关键词 buffer insertion timing optimization interconnect planning routing algorithm
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Recursive bisection placement algorithm with the predicted wirelength
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作者 蒿杰 马鸿 彭思龙 《Journal of Southeast University(English Edition)》 EI CAS 2008年第4期462-467,共6页
To obtain a better placement result, a partitioning-based placement algorithm with wirelength prediction called HJ-Pl is presented. A new method is proposed to estimate proximity of interconnects in a netlist, which i... To obtain a better placement result, a partitioning-based placement algorithm with wirelength prediction called HJ-Pl is presented. A new method is proposed to estimate proximity of interconnects in a netlist, which is capable of predicting not only short interconnects but long interconnects accurately. The predicted wirelength is embedded into the partitioning tool of bisection-based global placement, which can guide our placement towards a solution with shorter interconnects. In addition, the timing objective can be handled within the algorithm by minimizing the critical path delay. Experimental results show that, compared to Capol0. 5, mPL6, and NTUplace, HJ-P1 outperforms these placers in terms of wirelength and run time. The improvements in terms of average wirelength over Capo10. 5, mPL6 and NPUplace are 13%, 3%, and 9% with only 19%, 91%, and 99% of their runtime, respectively. By integrating the predicted wirelength-driven clustering into Capo10. 5, the placer is able to reduce average wirelength by 3%. The timing-driven HJ-P1 can reduce the critical path delay by 23%. 展开更多
关键词 HIERARCHY INTERCONNECT PLACEMENT VLSI circuit wirelength prediction
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A Novel Statistical Delay Model Based on the Birnbaum-Saunders Distribution for RLC Interconnects in 90nm Technologies
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作者 周磊 孙玲玲 蒋立飞 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2008年第7期1313-1317,共5页
For performance optimization such as placement,interconnect synthesis,and routing, an efficient and accurate interconnect delay metric is critical,even in design tools development like design for yield (DFY) and des... For performance optimization such as placement,interconnect synthesis,and routing, an efficient and accurate interconnect delay metric is critical,even in design tools development like design for yield (DFY) and design for manufacture (DFM). In the nanometer regime, the recently proposed delay models for RLC interconnects based on statistical probability density function (PDF)interpretation such as PRIMO,H-gamma,WED and RLD bridge the gap between accuracy and efficiency. However, these models always require table look-up when operating. In this paper, a novel delay model based on the Birnbaum-Saunders distribution (BSD) is presented. BSD can accomplish interconnect delay estimation fast and accurately without table look-up operations. Furthermore, it only needs the first two moments to match. Experimental results in 90nm technology show that BSD is robust, easy to implement,efficient,and accurate. 展开更多
关键词 delay model INTERCONNECT MOMENT probability distribution function
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用硅作系统级封装的衬底基片的进展
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作者 符正威 《集成电路通讯》 2005年第3期11-11,共1页
芯片倒装技术应用以来,人们就在研究用硅作为封装的衬底基片,其部分原因在于这样基片的热胀系数就与相匹配的硅管芯热胀系数完全一样了。硅材料目前已被、使用作系统级封装(SIP)的衬底基片材料,在其上面很容易材作精细线条的互连... 芯片倒装技术应用以来,人们就在研究用硅作为封装的衬底基片,其部分原因在于这样基片的热胀系数就与相匹配的硅管芯热胀系数完全一样了。硅材料目前已被、使用作系统级封装(SIP)的衬底基片材料,在其上面很容易材作精细线条的互连布线。最近的一个进展则是日本公司发表了材成带有通孔的硅衬底基板的结果。 展开更多
关键词 系统级封装 基片材料 硅材料 硅衬底 热胀系数 技术应用 互连布线 日本公司 相匹配
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半导体封装工艺面临的挑战
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作者 王志杰 《集成电路应用》 2008年第6期47-48,共2页
集成电路元器件密度与性能的不断提高是以集成电路关键尺寸的不断缩小和芯片内信号互连布线不断复杂化,布线层数不断增加为代价的。
关键词 半导体封装 工艺面 互连布线 集成电路 电路元器件 关键尺寸 信号
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“微细镀覆加工技术”项目通过专家组验收指标达国际先进水平
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《新材料产业》 2003年第4期57-57,共1页
关键词 微细镀覆加工技术 激光表面处理 化学液相微细镀覆 混合集成电路 互连布线制作技术 陶瓷基底 互连线
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Cross Point Assignment Algorithm with Crosstalk Constraint
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作者 姚海龙 周强 +1 位作者 洪先龙 蔡懿慈 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2004年第4期388-393,共6页
An algorithm to resolve the coupling effect problem is proposed during the cross point assignment (CPA) stage.In the algorithm,the priority queue concept and the rip-up and reroute strategy are combined to control cro... An algorithm to resolve the coupling effect problem is proposed during the cross point assignment (CPA) stage.In the algorithm,the priority queue concept and the rip-up and reroute strategy are combined to control crosstalk noise caused by interconnect coupling capacitance.First,the nets are arranged into different priority queues according to their weighted sum of their length and criticality.Then,the CPA problem for one queue of nets is translated into a linear assignment problem.After the assignment of one queue of nets,a post-CPA checking routine is performed to check and rip up the net pairs which violate the crosstalk noise constraint and then push them into the next queue to be reassigned.The algorithm is tested by a set of bench mark examples,and the experimental results are promising... 展开更多
关键词 routing cross point assignment CROSSTALK INTERCONNECT
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