We present an improved angle polishing method in which the end of the cover slice near the glue layer is beveled into a thin,defect-free wedge,the straight edge of which is used as the datum for measuring the depth of...We present an improved angle polishing method in which the end of the cover slice near the glue layer is beveled into a thin,defect-free wedge,the straight edge of which is used as the datum for measuring the depth of subsurface damage. The bevel angle can be calculated from the interference fringes formed in the wedge. The minimum depth of the subsurface damage that can be measured by this method is a few hundred nanometers. Our results show that the method is straightforward, accurate, and convenient.展开更多
Subsurface defects were fluorescently tagged with nanoscale quantum dots and scanned layer by layer using confocal fluorescence microscopy to obtain images at various depths. Subsurface damage depths of fused silica o...Subsurface defects were fluorescently tagged with nanoscale quantum dots and scanned layer by layer using confocal fluorescence microscopy to obtain images at various depths. Subsurface damage depths of fused silica optics were characterized quantitatively by changes in the fluorescence intensity of feature points. The fluorescence intensity vs scan depth revealed that the maximum fluorescence intensity decreases sharply when the scan depth exceeds a critical value. The subsurface damage depth could be determined by the actual embedded depth of the quantum dots. Taper polishing and magnetorheological finishing were performed under the same conditions to verify the effectiveness of the nondestructive fluorescence method. The results indicated that the quantum dots effectively tagged subsurface defects of fused-silica optics, and that the nondestructive detection method could effectively evaluate subsurface damage depths.展开更多
Cu2O is a promising photocatalyst,but it suffers from poor photocatalytic activity and stability,especially for Cu2O cubes.Herein,we report the deposition of CuO and Au nanodomains on Cu2O cubes to form dual surface h...Cu2O is a promising photocatalyst,but it suffers from poor photocatalytic activity and stability,especially for Cu2O cubes.Herein,we report the deposition of CuO and Au nanodomains on Cu2O cubes to form dual surface heterostructures(HCs)to improve photocatalytic activity and stability.The apparent quantum efficiency of Au/CuO/Cu2O HCs was ca.123 times that of pristine Cu2O.In addition,the Au/CuO/Cu2O HCs maintained nearly 80%of its original activity after eight cycles in contrast to five cycles for the Au/Cu2O material.Therefore,CuO and Au domains greatly improved the photocatalytic activity and stability of the Cu2O cubes due to the synergistic effect of the HCs.展开更多
A new sub-micron photolithography tool has been realized by utilizing the interference of surface plasmon waves(SPWs) on the near surface of a silver(Ag)-clad ultraviolet(UV) planar waveguide.A laser beam with a wavel...A new sub-micron photolithography tool has been realized by utilizing the interference of surface plasmon waves(SPWs) on the near surface of a silver(Ag)-clad ultraviolet(UV) planar waveguide.A laser beam with a wavelength of 325 nm was incident into the waveguide core,and suffered a series of total internal reflections on the interfaces between the waveguide core and the cladding layers.The incident light and the reflected light induced two beams of SPWs traveling in contrary directions,which interfered with each other and formed a standing wave as a sub-micron photolithography tool.A near-field scanning optical microscope(NSOM) was employed to measure the intensity distribution of the stationary wave field of the near surface of the Ag layer of the waveguide,anastomosed with theoretical values acquired by use of finite difference time domain(FDTD) simulations.And with this sub-micron photolithography tool a SMG with a period of 79.3 nm,in good agreement with the theoretical value of 80.1 nm,was inscribed on the surface of a self-processing hybrid SiO2/ZrO2 solgel film for the first time.展开更多
文摘We present an improved angle polishing method in which the end of the cover slice near the glue layer is beveled into a thin,defect-free wedge,the straight edge of which is used as the datum for measuring the depth of subsurface damage. The bevel angle can be calculated from the interference fringes formed in the wedge. The minimum depth of the subsurface damage that can be measured by this method is a few hundred nanometers. Our results show that the method is straightforward, accurate, and convenient.
基金Project(JCKY2016212A506-0503) supported by the Science Challenge Project of ChinaProject(51475106) supported by the National Natural Science Foundation of China
文摘Subsurface defects were fluorescently tagged with nanoscale quantum dots and scanned layer by layer using confocal fluorescence microscopy to obtain images at various depths. Subsurface damage depths of fused silica optics were characterized quantitatively by changes in the fluorescence intensity of feature points. The fluorescence intensity vs scan depth revealed that the maximum fluorescence intensity decreases sharply when the scan depth exceeds a critical value. The subsurface damage depth could be determined by the actual embedded depth of the quantum dots. Taper polishing and magnetorheological finishing were performed under the same conditions to verify the effectiveness of the nondestructive fluorescence method. The results indicated that the quantum dots effectively tagged subsurface defects of fused-silica optics, and that the nondestructive detection method could effectively evaluate subsurface damage depths.
基金supported by National Natural Science Foundation of China(21573263,21872157,51402346)National Key Research and Development Program of China from Ministry of Science and Technology of China(2016YFE0105700)+2 种基金Jiangsu Provincial Fundamental Research Foundation of China(BK20151236)Henan provincial co-operation and open foundation(60)China Postdoctoral Science Foundation(2018M632984)~~
文摘Cu2O is a promising photocatalyst,but it suffers from poor photocatalytic activity and stability,especially for Cu2O cubes.Herein,we report the deposition of CuO and Au nanodomains on Cu2O cubes to form dual surface heterostructures(HCs)to improve photocatalytic activity and stability.The apparent quantum efficiency of Au/CuO/Cu2O HCs was ca.123 times that of pristine Cu2O.In addition,the Au/CuO/Cu2O HCs maintained nearly 80%of its original activity after eight cycles in contrast to five cycles for the Au/Cu2O material.Therefore,CuO and Au domains greatly improved the photocatalytic activity and stability of the Cu2O cubes due to the synergistic effect of the HCs.
基金supported by the Natural Science Foundation of Guangdong Province, China (Grant Nos.8251063101000007, 10151063101000009,and 9451063101002082)the Scientific and Technological Plan of Guangdong Province (Grant Nos.2008B010200004, 2010B010600030, and 2009B011100003)the National Natural Science Foundation of China (Grant Nos.61078046 and 60977048)
文摘A new sub-micron photolithography tool has been realized by utilizing the interference of surface plasmon waves(SPWs) on the near surface of a silver(Ag)-clad ultraviolet(UV) planar waveguide.A laser beam with a wavelength of 325 nm was incident into the waveguide core,and suffered a series of total internal reflections on the interfaces between the waveguide core and the cladding layers.The incident light and the reflected light induced two beams of SPWs traveling in contrary directions,which interfered with each other and formed a standing wave as a sub-micron photolithography tool.A near-field scanning optical microscope(NSOM) was employed to measure the intensity distribution of the stationary wave field of the near surface of the Ag layer of the waveguide,anastomosed with theoretical values acquired by use of finite difference time domain(FDTD) simulations.And with this sub-micron photolithography tool a SMG with a period of 79.3 nm,in good agreement with the theoretical value of 80.1 nm,was inscribed on the surface of a self-processing hybrid SiO2/ZrO2 solgel film for the first time.
