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KTN晶体在高压直流电场下的介电退化与着色现象
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作者 管庆才 王继场 +1 位作者 魏景谦 刘耀岗 《人工晶体学报》 EI CAS CSCD 北大核心 1997年第3期368-368,共1页
介电陶瓷或晶体在高压直流电场作用下电导率将会升高,长时间的高压直流电场作用将最终导致电击穿,这就是所谓的介电退化现象。而对于某些介电晶体,在直流电场作用下,可导致晶体变黑不透明。这些都严重影响了材料的应用。本文报道四... 介电陶瓷或晶体在高压直流电场作用下电导率将会升高,长时间的高压直流电场作用将最终导致电击穿,这就是所谓的介电退化现象。而对于某些介电晶体,在直流电场作用下,可导致晶体变黑不透明。这些都严重影响了材料的应用。本文报道四方相钽铌酸钾(KTN)晶体在直流高压电场作用下介电退化与着色的实验结果,并对其机理进行讨论。本文的实验装置是对浸泡在硅油中的四方相掺铁KTN晶体样品施加高压电场,在测试其电导率变化的同时观察颜色变化。主要实验结果如下:(1)尽管大多数样品,其电导率在极化过程中都会升高,但是初始电导率较低的样品变化幅度较小,经较长时间的高压极化也不会出现着色及击穿现象。这类晶体利于实用。(2)初始电导率较高的晶体适于本实验的观察和研究。晶体在施加高压电场后,其极化电流持续升高。一定时间以后,靠近正极一端的晶体变黑,黑色区域逐渐向负极推移。随极化电流的增大,晶体往往会在整个区域变黑以前被击穿。(3)在施加高压电场一定时间后将其撤掉,立即检测晶体的电导率变化,发现晶体电导率在停止施加电场后,迅速降低到一饱和值。但该值仍高于初始值。这表明,在极化过程中晶体电导率的升高,既包含电致升高的因素,又包含热致升高的因素。(4)? 展开更多
关键词 导率 介电退化 着色 晶体 氮酸钛钾
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Effect of annealing on microstructure and properties of Si_3N_4-AlN composite ceramics 被引量:2
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作者 徐鹏 杨建 +1 位作者 丘泰 陈兴 《Journal of Central South University》 SCIE EI CAS 2011年第4期960-965,共6页
Aiming at developing novel microwave-transparent ceramics with low dielectric loss, high thermal conductivity and high strength, Si3Na-AIN (30%, mass fraction) composite ceramics with La203 as sintering additive wer... Aiming at developing novel microwave-transparent ceramics with low dielectric loss, high thermal conductivity and high strength, Si3Na-AIN (30%, mass fraction) composite ceramics with La203 as sintering additive were prepared by hot-pressing at 1 800 ℃ and subsequently annealed at 1 450 ℃ and 1 850 ℃ for 2 h and 4 h, respectively. The materials were characterized by XRD and SEM. The effect of annealing process on the phase composition, sintering performance, microstructure, bending strength, dielectric loss and thermal conductivity of the materials was investigated. The results showed that both annealing at 1 850 ℃ and 1 450 ℃ promoted the phase transformation of α-Si3N4 to β-Si3N4. After annealing at 1 850 ℃, grain growth to a certain extent occurred in the materials. Especially, the elongated β-Si3N4 grains showed a slight increase in diameter from 0.2 μm to 0.6 μm approximately and a decrease in aspect ratio. As a result, as the annealing time increased to 4 h, the bending strength declined from 456 MPa to 390 MPa, whereas the dielectric loss decreased to 2.15× 10^-3 and the thermal conductivity increased to 16.3 W/(m.K) gradually. When annealed at 1 450 ℃, increasing the annealing time to 4 h significantly promoted the crystallization of glassy phase to La2Si6N803 phase in the materials, which led to the increase in bending strength to 619 MPa and thermal conductivity to 15.9 W/(m·K), respectively, and simultaneously the decrease in dielectric loss to 1.53× 10^-3. 展开更多
关键词 Si3N4-A1N composite ANNEALING La203 bending strength thermal conductivity dielectric loss
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