In order to improve the bias stability of the micro-electro mechanical system（MEMS） gyroscope and reduce the impact on the bias from environmental temperature,a digital signal processing method is described for impr...In order to improve the bias stability of the micro-electro mechanical system（MEMS） gyroscope and reduce the impact on the bias from environmental temperature,a digital signal processing method is described for improving the accuracy of the drive phase in the gyroscope drive mode.Through the principle of bias signal generation,it can be concluded that the deviation of the drive phase is the main factor affecting the bias stability.To fulfill the purpose of precise drive phase control,a digital signal processing circuit based on the field-programmable gate array（FPGA） with the phase-lock closed-loop control method is described and a demodulation method for phase error suppression is given.Compared with the analog circuit,the bias drift is largely reduced in the new digital circuit and the bias stability is improved from 60 to 19 °/h.The new digital control method can greatly increase the drive phase accuracy,and thus improve the bias stability.展开更多
Development in industry is asking for improved resolution and higher accuracy in dimensional metrology. In this paper,we proposed a control displacement method based on a polarization ellipsometirc interferometer and ...Development in industry is asking for improved resolution and higher accuracy in dimensional metrology. In this paper,we proposed a control displacement method based on a polarization ellipsometirc interferometer and phase-locked loop technique. The proposed principle was set up. The experimental results of step and step displacements with a step value of 5 nm were presented. We also analyzed the resolution,the potential minimal displacement of the established system. The results show that the position error induced by the ellipticty deviation of the light beam becomes negligible thanks to our signal processing circuit with high-order filter. This method could be useful for many applications in nano dimensional metrology and semiconductor industry.展开更多
基金The National Natural Science Foundation of China (No.60974116)the Research Fund of Aeronautics Science (No. 20090869007)Specialized Research Fund for the Doctoral Program of Higher Education(No. 200802861063)
文摘In order to improve the bias stability of the micro-electro mechanical system（MEMS） gyroscope and reduce the impact on the bias from environmental temperature,a digital signal processing method is described for improving the accuracy of the drive phase in the gyroscope drive mode.Through the principle of bias signal generation,it can be concluded that the deviation of the drive phase is the main factor affecting the bias stability.To fulfill the purpose of precise drive phase control,a digital signal processing circuit based on the field-programmable gate array（FPGA） with the phase-lock closed-loop control method is described and a demodulation method for phase error suppression is given.Compared with the analog circuit,the bias drift is largely reduced in the new digital circuit and the bias stability is improved from 60 to 19 °/h.The new digital control method can greatly increase the drive phase accuracy,and thus improve the bias stability.
基金supported by the National Natural Science Foundation of China (Grant No.50905170)
文摘Development in industry is asking for improved resolution and higher accuracy in dimensional metrology. In this paper,we proposed a control displacement method based on a polarization ellipsometirc interferometer and phase-locked loop technique. The proposed principle was set up. The experimental results of step and step displacements with a step value of 5 nm were presented. We also analyzed the resolution,the potential minimal displacement of the established system. The results show that the position error induced by the ellipticty deviation of the light beam becomes negligible thanks to our signal processing circuit with high-order filter. This method could be useful for many applications in nano dimensional metrology and semiconductor industry.
