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低能X线剂量测定规程
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作者 谭力 《医疗装备》 2004年第7期16-17,共2页
关键词 测定规程 反向散射系数 低能x线剂量 剂量测定
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低能X线术中放疗在颅内室管膜瘤中的应用(附5例报告)
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作者 吴明星 傅兵 +4 位作者 张洪俊 马国佛 闵思明 秦舒森 韩小弟 《中华神经外科疾病研究杂志》 CAS 2017年第3期264-265,共2页
室管膜瘤起源于脑室和脊髓中央管的室管膜细胞,仅约占颅内胶质瘤的5%-6%。室管膜瘤对放疗敏感。目前有效的治疗策略为手术切除及术后放疗口。术中放疗技术(intra—operative radiotherapy,IORT)可以给予瘤床直接照射而周围正常组... 室管膜瘤起源于脑室和脊髓中央管的室管膜细胞,仅约占颅内胶质瘤的5%-6%。室管膜瘤对放疗敏感。目前有效的治疗策略为手术切除及术后放疗口。术中放疗技术(intra—operative radiotherapy,IORT)可以给予瘤床直接照射而周围正常组织接受剂量小,抑制肿瘤在等待外放疗期间生长,是外放疗的很好补充治疗方案。新型可移动术中放疗设备术中光子治疗仪(INTRABEAM)使用的射线为低能x线,可应用于普通手术室。目前INTRABEAM在神经外科室管膜瘤领域应用的安全性及疗效的研究很少,国内无相关报道。 展开更多
关键词 室管膜瘤 手术切除 术中放疗 低能x线
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测定计算机显示器的X线辐射剂量 被引量:2
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作者 苑淑渝 孙福印 《环境与健康杂志》 CAS CSCD 北大核心 2000年第5期261-263,共3页
[目的 ]测定计算机显示器的 X线剂量水平。 [方法 ]采用高灵敏 L i F ( Mg,Cu,P)热释光剂量计对计算机显示器表面及附加防护屏 (网 )后的 X线辐射剂量进行累积剂量监测。 [结果 ]计算机显示器表面的平均照射量为 0 .93 m R/ d。在防护... [目的 ]测定计算机显示器的 X线剂量水平。 [方法 ]采用高灵敏 L i F ( Mg,Cu,P)热释光剂量计对计算机显示器表面及附加防护屏 (网 )后的 X线辐射剂量进行累积剂量监测。 [结果 ]计算机显示器表面的平均照射量为 0 .93 m R/ d。在防护屏 (网 )外的平均照射量是 0 .2 4 m R/ d。 [结论 ]计算机产生的低能和低水平 展开更多
关键词 计算机显示器 低能x线 照射量 电离辐射剂量
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The effect of the support on the surface composition of PtCu alloy nanocatalysts: In situ XPS and HS-LEIS studies 被引量:6
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作者 黄俊杰 宋艳英 +3 位作者 马冬冬 郑燕萍 陈明树 万惠霖 《Chinese Journal of Catalysis》 CSCD 北大核心 2017年第7期1229-1236,共8页
Supported PtCu alloys have been broadly applied in heterogeneous catalysis and electrocatalysis owing to their excellent catalytic performance and high CO tolerance. It is important to analyze the outermost surface c... Supported PtCu alloys have been broadly applied in heterogeneous catalysis and electrocatalysis owing to their excellent catalytic performance and high CO tolerance. It is important to analyze the outermost surface composition of the supported alloy nanoparticles to understand the nature of the catalytically active sites. In this paper, homogeneous face-centered cubic PtCu nanoparticles with a narrow particle size distribution were successfully fabricated and dispersed on a high-surface-area Ti〇2 powder support. The samples were oxidized and reduced in situ and then introduced into the ultrahigh vacuum chamber to measure the topmost surface composition by high-sensitivity low-energy ion scattering spectroscopy, and to determine the oxidation states of the elements by X-ray photoelectron spectroscopy. The surface composition and morphology, elemental distribu-tion, and oxidation states of the components were found to be significantly affected by the support and treatment conditions. The PtCu is de-alloyed upon oxidation with CuO wetting on the TiO2 sur-face and re-alloyed upon reduction. Phase diagrams of the surface composition and the bulk com-position were plotted and compared for the supported and unsupported materials. 展开更多
关键词 PtCu alloy Bimetal catalyst Surface composition Phase diagram In situ xPS-LEIS
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LARGE VOLUME IONIZATION CHAMBER USED AS LABORATORY REFERENCE FOR LOW ENERGY X-RAY MEASUREMENT
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作者 杨国山 薛永库 蔡反攻 《Nuclear Science and Techniques》 SCIE CAS CSCD 1994年第3期166-169,共4页
A large volume spherical ionization chamber of 195 mm diameter and 0.36 mg/cm2wall thickness made from conducting carbon-fibre epoxy composite material has been developed. The mechanical intensity of the chamber is sa... A large volume spherical ionization chamber of 195 mm diameter and 0.36 mg/cm2wall thickness made from conducting carbon-fibre epoxy composite material has been developed. The mechanical intensity of the chamber is satisfactory for a good longterm volume stability. Owing to its large volume and thin wall, the chamber is sensitive to low energy photon beams and has excellent energy-response characteristics. This ionization chamber is suitable not only for a laboratory reference but also for measurement of low energy photon beam exposure rates at protection-level. 展开更多
关键词 Low energy x-rays Ionization chamber Carbon-fibre
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Characteristics of Amorphous Silicon Nitride Films Deposited by LF-PECVD from SiH_4/N_2
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作者 ZHONG Zhi-qin ZHANG Yi YU Zhi-wei DAI Li-ping ZHANG Guo-jun WANG Yu-mei WANG Gang WANG Shu-ya 《Semiconductor Photonics and Technology》 CAS 2009年第3期145-148,共4页
Amorphous silicon nitride films were deposited by low-frequency plasma-enhanced chemical vapor deposition(LF-PECVD) using silane and nitrogen as precursors. Characteristics such as deposition rate, surface morpholog... Amorphous silicon nitride films were deposited by low-frequency plasma-enhanced chemical vapor deposition(LF-PECVD) using silane and nitrogen as precursors. Characteristics such as deposition rate, surface morphology, and chemical composition were measured by spectroscopic ellipsometry(SE), atomic force mieroscope(AFM) and x-ray photoelectron spectroscopy(XPS). It was shown that amorphous silicon nitride film could be prepared by LF-PECVD with good uniformity and even surface. The XPS result indicated that a small quantity of oxygen was involved in the sample, which was discussed in this paper. 展开更多
关键词 SiNx SE AFM xPS PECVD
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