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AES(RFA)谱形分析及其在Mo-Si多层膜界面研究中的应用
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作者 薛钰芝 H.Zeijlemaker +2 位作者 A.Keppel R.Schlatman J.Verhoeven 《真空科学与技术》 CSCD 1994年第6期431-434,共4页
应用减速场分析器(RFA)俄歇能谱仪得到直接谱N(E)-E,经计算机程序处理保存谱形方面的信息,并应用于软X射线光学Mo-Si多层膜介面的研究中。并说明经H+离子轰击的界面谱形。
关键词 俄歇谱形 多层膜 Mo-Si膜界面 AES RFA
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In situ Heating and Thermal Effects in Auger Electron Spectroscopy for GaN
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作者 Fu-chun Xu Qi-he Zhang Dan-xia Cen 《Chinese Journal of Chemical Physics》 SCIE CAS CSCD 北大核心 2006年第3期200-202,共3页
An in situ heating system was built for the Auger electron spectroscopy to investigate the thermal effect of Auger lines. A GaN sample was studied in this system. The kinetic energy of Ga LMM and MVV Auger lines were ... An in situ heating system was built for the Auger electron spectroscopy to investigate the thermal effect of Auger lines. A GaN sample was studied in this system. The kinetic energy of Ga LMM and MVV Auger lines were observed to shift negatively with temperature increasing. By using ab initio calculation, the theoretical Ga MVV Auger line shape was fit, which well reflects the inner property of the line. The Auger shift with heating is related with the valence electron rearrangement in the thermal expansion of the local bonds. 展开更多
关键词 Ultra-high-vacuum Auger electron spectroscopy Heating system In situ Auger line shape
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