An optimal concentration of the etching solution for deep etching of silicon, including 3% tetramethyl ammonium hydroxide and 0.3% (NH4)2S2O8, was achieved in this paper. For this etching solution, the etching rates o...An optimal concentration of the etching solution for deep etching of silicon, including 3% tetramethyl ammonium hydroxide and 0.3% (NH4)2S2O8, was achieved in this paper. For this etching solution, the etching rates of silicon and silicon dioxide were about 1.1μm·min-1 and 0.5nm·min-1, respectively. The etching ratio between (100) and (111) planes was about 34:1, and the etched surface was very smooth.展开更多
In order to improve the scheduling efficiency of photolithography,bottleneck process of wafer fabrications in the semiconductor industry,an effective estimation of distribution algorithm is proposed for scheduling pro...In order to improve the scheduling efficiency of photolithography,bottleneck process of wafer fabrications in the semiconductor industry,an effective estimation of distribution algorithm is proposed for scheduling problems of parallel litho machines with reticle constraints,where multiple reticles are available for each reticle type.First,the scheduling problem domain of parallel litho machines is described with reticle constraints and mathematical programming formulations are put forward with the objective of minimizing total weighted completion time.Second,estimation of distribution algorithm is developed with a decoding scheme specially designed to deal with the reticle constraints.Third,an insert-based local search with the first move strategy is introduced to enhance the local exploitation ability of the algorithm.Finally,simulation experiments and analysis demonstrate the effectiveness of the proposed algorithm.展开更多
文摘An optimal concentration of the etching solution for deep etching of silicon, including 3% tetramethyl ammonium hydroxide and 0.3% (NH4)2S2O8, was achieved in this paper. For this etching solution, the etching rates of silicon and silicon dioxide were about 1.1μm·min-1 and 0.5nm·min-1, respectively. The etching ratio between (100) and (111) planes was about 34:1, and the etched surface was very smooth.
基金Supported by the National High Technology Research and Development Programme of China(No.2009AA043000)the National Natural Science Foundation of China(No.61273035,71471135)
文摘In order to improve the scheduling efficiency of photolithography,bottleneck process of wafer fabrications in the semiconductor industry,an effective estimation of distribution algorithm is proposed for scheduling problems of parallel litho machines with reticle constraints,where multiple reticles are available for each reticle type.First,the scheduling problem domain of parallel litho machines is described with reticle constraints and mathematical programming formulations are put forward with the objective of minimizing total weighted completion time.Second,estimation of distribution algorithm is developed with a decoding scheme specially designed to deal with the reticle constraints.Third,an insert-based local search with the first move strategy is introduced to enhance the local exploitation ability of the algorithm.Finally,simulation experiments and analysis demonstrate the effectiveness of the proposed algorithm.
