Hydrogel micropatterns of poly(ethylene glycol) and polyacrylamide were prepared with a facile photolithographic method. Monomer solutions containing photoinitiator were directly polymerized by UV illumination through...Hydrogel micropatterns of poly(ethylene glycol) and polyacrylamide were prepared with a facile photolithographic method. Monomer solutions containing photoinitiator were directly polymerized by UV illumination through a transparency photomask, forming 2-dimensional gel patterns on silanized glass surfaces. The chemically patterned surfaces thus prepared could be used as the template for patterning mammalian cells and formation of structured droplets.展开更多
ZnO nanorod arrays （NRs） were synthesized on the fluorine-doped SnO2 transparent conductive glass （FTO） by a simple chemical bath deposition （CBD） method combined with alkali-etched method in potassium hydroxide...ZnO nanorod arrays （NRs） were synthesized on the fluorine-doped SnO2 transparent conductive glass （FTO） by a simple chemical bath deposition （CBD） method combined with alkali-etched method in potassium hydroxide （KOH） solution. X-ray diffraction （XRD）, scanning electron microscopy （SEM） and current-voltage （I-V） curve were used to characterize the structure, morphologies and optoelectronic properties. The results demonstrated that ZnO NRs had wurtzite structures, the morphologies and photovoltaic properties of ZnO NRs were closely related to the concentration of KOH and etching time, well-aligned and uniformly distributed ZnO NRs were obtained after etching with 0.1 mol/L KOH for 1 h. ZnO NRs treated by KOH had been proved to have superior photovoltaic properties compared with high density ZnO NRs. When using ZnO NRs etched with 0.1 mol/L KOH for 1 h as the anode of solar cell, the conversion efficiency, short circuit current and open circuit voltage, compared with the unetched ZnO NRs, increased by 0.71%, 2.79 mA and 0.03 V, respectively.展开更多
TB877 97042448全息光学元件中编码与象质和衍射效率的关系=Relationsof coding with image quality and diffractionefficiency in holographic optical elements[刊,中]/石建川,李慎,刘盛纲(电子科技大学高能电子学研究所.四川,成都(6...TB877 97042448全息光学元件中编码与象质和衍射效率的关系=Relationsof coding with image quality and diffractionefficiency in holographic optical elements[刊,中]/石建川,李慎,刘盛纲(电子科技大学高能电子学研究所.四川,成都(610051))//光电工程.—1996,23(5).—24-28,72以平面波束变换为十字光束的全息光学元件为例,展开更多
Optical waveguides in silica-on-silicon are one of the key elements in optical communications.The processes of deep etching silica waveguides using resist and metal masks in RIE plasma are investigated.The etching res...Optical waveguides in silica-on-silicon are one of the key elements in optical communications.The processes of deep etching silica waveguides using resist and metal masks in RIE plasma are investigated.The etching responses,including etching rate and selectivity as functions of variation of parameters,are modeled with a 3D neural network.A novel resist/metal combined mask that can overcome the single-layer masks’ limitations is developed for enhancing the waveguides deep etching and low-loss optical waveguides are fabricated at last.展开更多
Silicon crystal-facet-dependent nanostructures have been successfully fabricated on a （100）-oriented silicon-oninsulator wafer using electron-beam lithography and the silicon anisotropic wet etching technique. This ...Silicon crystal-facet-dependent nanostructures have been successfully fabricated on a （100）-oriented silicon-oninsulator wafer using electron-beam lithography and the silicon anisotropic wet etching technique. This technique takes advantage of the large difference in etching properties for different crystallographic planes in alkaline solution. The minimum size of the trapezoidal top for those Si nanostructures can be reduced to less than 10nm. Scanning electron microscopy （SEM） and atomic force microscopy （AFM） observations indicate that the etched nanostructures have controllable shapes and smooth surfaces.展开更多
文摘Hydrogel micropatterns of poly(ethylene glycol) and polyacrylamide were prepared with a facile photolithographic method. Monomer solutions containing photoinitiator were directly polymerized by UV illumination through a transparency photomask, forming 2-dimensional gel patterns on silanized glass surfaces. The chemically patterned surfaces thus prepared could be used as the template for patterning mammalian cells and formation of structured droplets.
基金Project (21171027) supported by the National Natural Science Foundation of ChinaProject (K1001020-11) supported by the Science and Technology Key Project of Changsha City, ChinaProject ([2010]70) supported by Science and Technology Innovative Research Team in Higher Educational Institutions of Hunan Province, China
文摘ZnO nanorod arrays （NRs） were synthesized on the fluorine-doped SnO2 transparent conductive glass （FTO） by a simple chemical bath deposition （CBD） method combined with alkali-etched method in potassium hydroxide （KOH） solution. X-ray diffraction （XRD）, scanning electron microscopy （SEM） and current-voltage （I-V） curve were used to characterize the structure, morphologies and optoelectronic properties. The results demonstrated that ZnO NRs had wurtzite structures, the morphologies and photovoltaic properties of ZnO NRs were closely related to the concentration of KOH and etching time, well-aligned and uniformly distributed ZnO NRs were obtained after etching with 0.1 mol/L KOH for 1 h. ZnO NRs treated by KOH had been proved to have superior photovoltaic properties compared with high density ZnO NRs. When using ZnO NRs etched with 0.1 mol/L KOH for 1 h as the anode of solar cell, the conversion efficiency, short circuit current and open circuit voltage, compared with the unetched ZnO NRs, increased by 0.71%, 2.79 mA and 0.03 V, respectively.
文摘TB877 97042448全息光学元件中编码与象质和衍射效率的关系=Relationsof coding with image quality and diffractionefficiency in holographic optical elements[刊,中]/石建川,李慎,刘盛纲(电子科技大学高能电子学研究所.四川,成都(610051))//光电工程.—1996,23(5).—24-28,72以平面波束变换为十字光束的全息光学元件为例,
文摘Optical waveguides in silica-on-silicon are one of the key elements in optical communications.The processes of deep etching silica waveguides using resist and metal masks in RIE plasma are investigated.The etching responses,including etching rate and selectivity as functions of variation of parameters,are modeled with a 3D neural network.A novel resist/metal combined mask that can overcome the single-layer masks’ limitations is developed for enhancing the waveguides deep etching and low-loss optical waveguides are fabricated at last.
文摘Silicon crystal-facet-dependent nanostructures have been successfully fabricated on a （100）-oriented silicon-oninsulator wafer using electron-beam lithography and the silicon anisotropic wet etching technique. This technique takes advantage of the large difference in etching properties for different crystallographic planes in alkaline solution. The minimum size of the trapezoidal top for those Si nanostructures can be reduced to less than 10nm. Scanning electron microscopy （SEM） and atomic force microscopy （AFM） observations indicate that the etched nanostructures have controllable shapes and smooth surfaces.
