Color filters are produced using semiconductor production techniques although problems with low yield remain to be addressed. This study presents a new means of selective removal using excimer irradiation, chemical et...Color filters are produced using semiconductor production techniques although problems with low yield remain to be addressed. This study presents a new means of selective removal using excimer irradiation, chemical etching, or electrochemical machining on the fifth generation TFT LCDs. The selective removal of microstructure layers from the color filter surface of an optoelectronic flat panel display, as well as complete removal of the ITO thin-films, RGB layer, or resin black matrix (BM) layer from the substrate is possible. Individual defective film layers can be removed, or all films down to the Cr layer or bare glass can be completely eliminated. Experimental results demonstrate that defective ITO thin-films, RGB layers, or the resin BM layer can now be recycled with a great precision. When the ITO or RGB layer proves difficult to remove, excimer light can be used to help with removal. During this recycling process, the use of 225 nm excimer irradiation before chemical etching, or electrochemical machining, makes removal of stubborn film residues easy, effectively improving the quality of recycled color filters and reducing fabrication cost.展开更多
An optimal concentration of the etching solution for deep etching of silicon, including 3% tetramethyl ammonium hydroxide and 0.3% (NH4)2S2O8, was achieved in this paper. For this etching solution, the etching rates o...An optimal concentration of the etching solution for deep etching of silicon, including 3% tetramethyl ammonium hydroxide and 0.3% (NH4)2S2O8, was achieved in this paper. For this etching solution, the etching rates of silicon and silicon dioxide were about 1.1μm·min-1 and 0.5nm·min-1, respectively. The etching ratio between (100) and (111) planes was about 34:1, and the etched surface was very smooth.展开更多
The ultra-small textured surface of multicrystalline silicon solar cell,prepared by electroless chemical-etching method,shows an excellent anti-reflection property over a wide spectral bandwidth.A novel back surface p...The ultra-small textured surface of multicrystalline silicon solar cell,prepared by electroless chemical-etching method,shows an excellent anti-reflection property over a wide spectral bandwidth.A novel back surface protection method and front surface passivation method have been used in the multicrystalline solar cells with ultra-small textured surfaces.With these improvements,the back surface remains intact after the etch process and the efficient minority lifetime is apparently increased.The test result shows that the solar cell with ultra-small textured surface can obtain better electrical performances by these improvements.展开更多
基金supported by the BEN TEN CO., and National Science Council contracts 98-2221-E-152-001 and 99-2221-E-152-001
文摘Color filters are produced using semiconductor production techniques although problems with low yield remain to be addressed. This study presents a new means of selective removal using excimer irradiation, chemical etching, or electrochemical machining on the fifth generation TFT LCDs. The selective removal of microstructure layers from the color filter surface of an optoelectronic flat panel display, as well as complete removal of the ITO thin-films, RGB layer, or resin black matrix (BM) layer from the substrate is possible. Individual defective film layers can be removed, or all films down to the Cr layer or bare glass can be completely eliminated. Experimental results demonstrate that defective ITO thin-films, RGB layers, or the resin BM layer can now be recycled with a great precision. When the ITO or RGB layer proves difficult to remove, excimer light can be used to help with removal. During this recycling process, the use of 225 nm excimer irradiation before chemical etching, or electrochemical machining, makes removal of stubborn film residues easy, effectively improving the quality of recycled color filters and reducing fabrication cost.
文摘An optimal concentration of the etching solution for deep etching of silicon, including 3% tetramethyl ammonium hydroxide and 0.3% (NH4)2S2O8, was achieved in this paper. For this etching solution, the etching rates of silicon and silicon dioxide were about 1.1μm·min-1 and 0.5nm·min-1, respectively. The etching ratio between (100) and (111) planes was about 34:1, and the etched surface was very smooth.
基金supported by the National Basic Research Program of China("973" Project) (Grant No. 2009CB939703)the National Natural Science Foundation of China (Grant Nos. 11104319,51172268)the Chinese Academy of Solar Energy Action Plan and by Beijing Science and Technology Project (Grant No. Y2BK024001)
文摘The ultra-small textured surface of multicrystalline silicon solar cell,prepared by electroless chemical-etching method,shows an excellent anti-reflection property over a wide spectral bandwidth.A novel back surface protection method and front surface passivation method have been used in the multicrystalline solar cells with ultra-small textured surfaces.With these improvements,the back surface remains intact after the etch process and the efficient minority lifetime is apparently increased.The test result shows that the solar cell with ultra-small textured surface can obtain better electrical performances by these improvements.
