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突飞猛进的光化蚀刻工艺
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作者 李春甫 《丝网印刷》 2002年第6期10-14,共5页
介绍了光化蚀刻的由来和传统工艺流程中五种掩膜的制作方法及四种现代的光化蚀刻法流程及其应用范围。指出随着电子技术的不断发展,光化蚀刻这门技术已经拓展到了许多新的领域,形成了一定的生产规模,并且带动了相关企业的发展。
关键词 光化蚀刻 网版印刷 制版 掩膜
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精密微型铝度盘的光化蚀刻
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作者 郑大林 《仪表技术》 1991年第3期44-47,共4页
关键词 仪器仪表 铝度盘 光化蚀刻 度盘
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Selective removal technology using chemical etching and excimer assistance in precision recycle of color filter 被引量:1
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作者 Pai-shan PA 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2011年第A01期210-214,共5页
Color filters are produced using semiconductor production techniques although problems with low yield remain to be addressed. This study presents a new means of selective removal using excimer irradiation, chemical et... Color filters are produced using semiconductor production techniques although problems with low yield remain to be addressed. This study presents a new means of selective removal using excimer irradiation, chemical etching, or electrochemical machining on the fifth generation TFT LCDs. The selective removal of microstructure layers from the color filter surface of an optoelectronic flat panel display, as well as complete removal of the ITO thin-films, RGB layer, or resin black matrix (BM) layer from the substrate is possible. Individual defective film layers can be removed, or all films down to the Cr layer or bare glass can be completely eliminated. Experimental results demonstrate that defective ITO thin-films, RGB layers, or the resin BM layer can now be recycled with a great precision. When the ITO or RGB layer proves difficult to remove, excimer light can be used to help with removal. During this recycling process, the use of 225 nm excimer irradiation before chemical etching, or electrochemical machining, makes removal of stubborn film residues easy, effectively improving the quality of recycled color filters and reducing fabrication cost. 展开更多
关键词 chemical etching excimer light selective removal technology display color filter
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An Improvement on Si-etching Tetramethyl Ammonium Hydroxide Solution
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作者 杨笛 余金中 +2 位作者 陈少武 樊中朝 李运涛 《Chinese Journal of Chemical Engineering》 SCIE EI CAS CSCD 2005年第1期48-50,共3页
An optimal concentration of the etching solution for deep etching of silicon, including 3% tetramethyl ammonium hydroxide and 0.3% (NH4)2S2O8, was achieved in this paper. For this etching solution, the etching rates o... An optimal concentration of the etching solution for deep etching of silicon, including 3% tetramethyl ammonium hydroxide and 0.3% (NH4)2S2O8, was achieved in this paper. For this etching solution, the etching rates of silicon and silicon dioxide were about 1.1μm·min-1 and 0.5nm·min-1, respectively. The etching ratio between (100) and (111) planes was about 34:1, and the etched surface was very smooth. 展开更多
关键词 SILICON silicon dioxide tetramethyl ammonium hydroxide etching rate
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Surface Na2CO3 etching induced activity enhancement of 2D BiOI photocatalyst working under visible light 被引量:4
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作者 Lei Liang Jing Cao +1 位作者 Haili Lin Shifu Chen 《Science Bulletin》 SCIE EI CAS CSCD 2017年第8期546-553,共8页
The visible light photocatalytic activity of two-dimensional (2D) BiOl microplates was intensively enhanced through simply dipping in Na2CO3 solutions at room temperature. The X-ray powder diffrac- tion (XRD) and ... The visible light photocatalytic activity of two-dimensional (2D) BiOl microplates was intensively enhanced through simply dipping in Na2CO3 solutions at room temperature. The X-ray powder diffrac- tion (XRD) and scanning electron microscopy (SEM) investigations suggest that little amount of (BiO)2CO3 phase was formed on the surface of 2D BiOI via the in situ chemical conversion. The concen- tration of Na2CO3 solutions affected the structure, morphology, light absorption and surface element component of 2D BiOl. The surface loaded (BiO)2CO3 mainly trapped the photoinduced electrons of BiOI, improved the separation efficiency of photocharges and finally raised the photocatalytic activity of BiOl under visible light (λ 〉 420 nm). Furthermore, the product of the as-prepared (BiO)2CO3/BiOI displayed excellent stability in the repeated experiment. This study provides a facile way to improve the photocatalytic activity of BiOX (X = CI, Br, I) by means of surface treatment with Na2CO3 solutions. 展开更多
关键词 2D BiOI In situ conversion PHOTOCATALYSIS Surface charge separation
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Research on ultra-small textured surface of multicrystalline silicon solar cell 被引量:2
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作者 LI HaoFeng JIA Rui +8 位作者 DOU BingFei CHEN Chen XING Zhao YANG YongZhou DING WuChang MENG YanLong LIU XinYu YE TianChun LI ShangQing 《Science China(Technological Sciences)》 SCIE EI CAS 2013年第4期952-956,共5页
The ultra-small textured surface of multicrystalline silicon solar cell,prepared by electroless chemical-etching method,shows an excellent anti-reflection property over a wide spectral bandwidth.A novel back surface p... The ultra-small textured surface of multicrystalline silicon solar cell,prepared by electroless chemical-etching method,shows an excellent anti-reflection property over a wide spectral bandwidth.A novel back surface protection method and front surface passivation method have been used in the multicrystalline solar cells with ultra-small textured surfaces.With these improvements,the back surface remains intact after the etch process and the efficient minority lifetime is apparently increased.The test result shows that the solar cell with ultra-small textured surface can obtain better electrical performances by these improvements. 展开更多
关键词 mc-Si solar cell ultra-small texture ANTI-REFLECTION surface passivation
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