期刊文献+
共找到10篇文章
< 1 >
每页显示 20 50 100
基于微机电系统光交叉连接的光学仿射变换 被引量:1
1
作者 田逢春 李显利 +1 位作者 陈建军 李鹏 《光电子技术》 CAS 北大核心 2010年第2期88-93,共6页
针对实现二维仿射变换的光学方法进行了研究。鉴于采用道威棱镜、反射镜和缩放透镜实现光学仿射变换具有调节困难、精度低、灵活性差和稳定性差等缺点,提出了基于光纤传像束和MEMS(微机电系统)光交叉连接的方法。通过利用MEMS光交叉连... 针对实现二维仿射变换的光学方法进行了研究。鉴于采用道威棱镜、反射镜和缩放透镜实现光学仿射变换具有调节困难、精度低、灵活性差和稳定性差等缺点,提出了基于光纤传像束和MEMS(微机电系统)光交叉连接的方法。通过利用MEMS光交叉连接可以实现任意端口间的交换特性,与光纤传像束结合能够用光学方法实现任意仿射变换。克服了上述问题。光学实验与数字仿真实验的对比有力地证实了该方法的优越性。 展开更多
关键词 微机系统交叉连接 仿射变换 纤传像束
下载PDF
电力系统中MEMS光开关切换路径优化控制的方法 被引量:1
2
作者 阮峻 杜浩滔 +1 位作者 朱志俊 孙豪 《光通信研究》 2021年第2期66-69,共4页
针对电力系统中微机电系统(MEMS)光开关在切换备纤时可能受到光控信号的影响而造成光时域反射仪(OTDR)发生损坏的问题,文章提出了一种电力系统中MEMS光开关切换路径优化控制的方法,在对MEMS光开关进行完整的扫描后得到其精确的光信号通... 针对电力系统中微机电系统(MEMS)光开关在切换备纤时可能受到光控信号的影响而造成光时域反射仪(OTDR)发生损坏的问题,文章提出了一种电力系统中MEMS光开关切换路径优化控制的方法,在对MEMS光开关进行完整的扫描后得到其精确的光信号通道功率等高图,然后再对其切换路径进行优化控制,使得MEMS光开关可以在平衡控制通道切换时间的前提下使入射光沿相对通道隔离度最高的最佳路径进行切换控制,同时也可以在保证切换时间的前提下将MEMS光开关在切换时对其他通道的影响降到最低,并且即使在通道环境非常复杂的情况下也不受影响。 展开更多
关键词 微机系统开关 切换路径 优化
下载PDF
硅基氮化镓波长可调DFB激光器的模拟分析 被引量:4
3
作者 王永强 诸波 +3 位作者 胡芳仁 茅帅帅 夏丽 仉乐 《激光与红外》 CAS CSCD 北大核心 2014年第8期874-878,共5页
基于严格耦合波以及介质平板波导理论,构建了硅基氮化镓分布反馈激光器的二维稳态物理模型。且利用多物理场直接耦合分析软件Comsol Multiphysics求解波动方程,得到了分布反馈激光器在可见光各波段形成单模输出的电场模一维、二维图谱,... 基于严格耦合波以及介质平板波导理论,构建了硅基氮化镓分布反馈激光器的二维稳态物理模型。且利用多物理场直接耦合分析软件Comsol Multiphysics求解波动方程,得到了分布反馈激光器在可见光各波段形成单模输出的电场模一维、二维图谱,以及相对应的入射波长与电场模关系曲线。结合硅基光微机电系统技术和微加工技术,本文提出利用悬空的自支撑氮化镓周期可调光子光栅实现分布反馈激光器波长可调。数值模拟表明,在光栅的格子数目、光栅厚度、光栅宽度以及有源层厚度一定的情况下,改变光栅周期可以实现分布反馈激光器输出不同波长激光。理论分析与仿真结果基本一致,证明所建立激光器模型具有一定的合理性,得出的仿真数据为实现分布反馈激光器波长可调提供了有意义的参考。 展开更多
关键词 分布式反馈激 波长可调 Comsol Multiphysic 硅基光微机电系统
下载PDF
全光网络中的MEMS光开关研究新进展 被引量:4
4
作者 刘梅刚 万江文 《微纳电子技术》 CAS 2004年第5期19-23,共5页
光开关是未来全光网络中关键的光交换器件。MEMS技术由于其自身的诸多优点而被认为是目前最有前景的光器件制作技术之一。本文简要论述了MEMS光开关与其他类型光开关的区别,介绍了MEMS光开关的特性,并分别就二维、三维及最近提出的一维M... 光开关是未来全光网络中关键的光交换器件。MEMS技术由于其自身的诸多优点而被认为是目前最有前景的光器件制作技术之一。本文简要论述了MEMS光开关与其他类型光开关的区别,介绍了MEMS光开关的特性,并分别就二维、三维及最近提出的一维MEMS光开关进行了介绍和比较。最后,综合探讨了MEMS光开关目前所面临的各种挑战。 展开更多
关键词 网络 MEMS 开关 光微机电系统
下载PDF
MEMS-VOA自动化测试系统设计
5
作者 宋家军 张颖 +1 位作者 范杰乔 刘军 《光通信研究》 北大核心 2014年第3期64-66,共3页
设计了一套自动化测试系统,该系统能方便地测试MEMS-VOA(基于微机电系统的可变光衰减器)的所有指标,还可以实现光谱仪与偏振控制器的测试共享。通过编程,能实时显示数据与绘制曲线,并将数据自动存储到数据库。与标准的测试仪表相比,该... 设计了一套自动化测试系统,该系统能方便地测试MEMS-VOA(基于微机电系统的可变光衰减器)的所有指标,还可以实现光谱仪与偏振控制器的测试共享。通过编程,能实时显示数据与绘制曲线,并将数据自动存储到数据库。与标准的测试仪表相比,该测试系统造价低廉,准确度较高,具有很高的应用价值。 展开更多
关键词 基于微机系统的可变衰减器 自动化测试系统 数据库
下载PDF
Fabrication and Electromechanical Characteristics of 2×2 Torsion-Mirror Optical Switch Arrays with Monolithically Integrated Fiber Self-Holding Structures
6
作者 吴文刚 郝一龙 +2 位作者 栗大超 张培玉 武国英 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2002年第10期1024-1030,共7页
Novel 2×2 torsion-mirror optical switch arrays are fabricated by using the mixed micromachining based on the surface and bulk silicon microelectronics,then are investigated electromechanically in applied direct a... Novel 2×2 torsion-mirror optical switch arrays are fabricated by using the mixed micromachining based on the surface and bulk silicon microelectronics,then are investigated electromechanically in applied direct and alternating electric fields.When the thickness of the elastic torsion beams suspending the aluminum coated polysilicon micro-mirrors of the switches in the arrays is about 1μm,the electrostatic yielding voltages for driving the mirrors to achieve their ON-state are in the range of 270~290V,and the minimum holding voltages for mirrors ON-state are found as 55V or so.Theoretical analysis manifests that the yielding voltage is more sensitive to beam thickness than other design parameters do about the torsion-mirror switch structures.The lifetime can reach 10 8 times.The estimated shortest switching time of the switches at least lasts for less than 2ms.The force analysis on the two kinds of new fiber self-holding structures integrated monolithically in the chip of the optical switch arrays indicates that the structures can feature self-fixing and self-aligning of optical fibers. 展开更多
关键词 MEMS optical switch torsion-mirror fiber self-holding structures mixed micromachining
下载PDF
Development of Miniature Spectrometers
7
作者 ZHANG Zhi-guo 《Semiconductor Photonics and Technology》 CAS 2007年第2期132-135,共4页
Spectrometer is an essential and necessary optical element used for measuring the chemical components and content of the matter. The development of miniature spectrometers can be traced back to 1980s. The development ... Spectrometer is an essential and necessary optical element used for measuring the chemical components and content of the matter. The development of miniature spectrometers can be traced back to 1980s. The development state and different manufacturing methods of micro-spectrometers are presented. Finally, we analyze the miniaturization trend of spectrometers. Some groundwork for the scientific research is offered by introducing micro-spectrometers development. 展开更多
关键词 MICRO-SPECTROMETER micro-opto-electro-mechanical system (MOEMS) Fourier transform interferometer(FTS) spectroscopy
下载PDF
MEMS Test System Based on Virtual Instrument Technology
8
作者 胡晓东 栗大超 +2 位作者 郭彤 胡春光 胡小唐 《Transactions of Tianjin University》 EI CAS 2007年第2期88-92,共5页
On account of the multiformity of MEMS devices, it is necessary to integrate with some optical measurement techniques for meeting static and dynamic unit test requirements. In this paper, an automated MEMS test system... On account of the multiformity of MEMS devices, it is necessary to integrate with some optical measurement techniques for meeting static and dynamic unit test requirements. In this paper, an automated MEMS test system is built of some commercially available components and instruments based on virtual instrument technology. The system is integrated with stroboscopic imaging, computer micro-vision, microscopic Mirau phase shifting interferometry, and laser Doppler vibrometer, and is used for the measurement of full-view in-plane and out-of-plane geometric parameters and periodical motions and single spot out-of-plane transient motion. The system configuration and measurement methods are analyzed, and some applications of the measurement of in-plane and out-of-plane dimensions and motions were described. The measurement accuracy of in-plane dimensions and out-of-plane dimensional is better than 0.2 um and 5 nm respectively. The resolution of measuring in-plane and out-of-plane motions is better than 15 nm and 2 nm respectively. 展开更多
关键词 MEMS optical measurement technique stroboscopic imaging virtual instrument dynamic test
下载PDF
Feasible Development of a Carbon-Based MEMS Using a MEMS Fabrication Process
9
作者 Junji Sone 《Journal of Chemistry and Chemical Engineering》 2014年第11期1082-1088,共7页
We aimed to develop a process technology for constructing a carbon-based micro-electromechanical system that does not require a high-temperature and high-energy process. A HOPG (highly oriented pyrolytic graphite) c... We aimed to develop a process technology for constructing a carbon-based micro-electromechanical system that does not require a high-temperature and high-energy process. A HOPG (highly oriented pyrolytic graphite) crystal microsheet was prepared by exfoliation. Cantilevers and doubly clamped beams were patterned using a photoresist. The HOPG microsheet was attached by using a tantalum layer. We fabricated cantilevers and a doubly clamped beam by controlling the thickness of the HOPG microsheet and then measured the first resonance frequency. The measurements suggest a need to improve the stiffness of the beam. 展开更多
关键词 Carbou-MEMS (micro-electromechanical systems) CANTILEVER trial fabrication resonance frequency Raman spectra HOPG.
下载PDF
Thick SU8 microstructures prepared by broadband UV lithography and the applications in MEMS devices
10
作者 李东玲 温志渝 +1 位作者 尚正国 佘引 《Optoelectronics Letters》 EI 2016年第3期182-187,共6页
Thick SU8 microstructures with high aspect ratio and good side wall quality were fabricated by ultraviolet (UV) lithography, and the processing parameters were comprehensively studied. It proves that the adhesion of... Thick SU8 microstructures with high aspect ratio and good side wall quality were fabricated by ultraviolet (UV) lithography, and the processing parameters were comprehensively studied. It proves that the adhesion of SU8 on silicon (Si) substrates is influenced by Si-OH on the surface, and can be improved by the HF treatment. Cracks and de- lamination are caused by large internal stress during fabrication process, and are significantly influenced by soft bake and post-exposure bake processes. The internal stress is reduced by a low post-exposure bake exposure tem- perature of 85 ℃ for 40 rain. A three-step soft bake enhances the reflowing ofSU8 photoresist, and results in uni- form surface and less air bubbles. The vertical side wall is obtained with the optimized exposure dose of 800 mJ/cm2 for the thickness of 160 μm. Using the optimized fabrication process combined with a proper structure design, dense SU8 micro pillars are achieved with the aspect ratio of 10 and the taper angle of 89.86°. Finally, some possible ap- plications of SU8 in micro-electromechanical system (MEMS) device are developed and demonstrated. 展开更多
关键词 MEMS器件 紫外 微结构 应用 微机系统 烘烤过程 编写 宽带
原文传递
上一页 1 下一页 到第
使用帮助 返回顶部