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一种应用于高速锁相环的宽锁定范围注入锁定分频器
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作者 邢子哲 《重庆大学学报》 CSCD 北大核心 2021年第11期1-8,共8页
针对传统的注入锁定分频器锁定范围较窄的问题,提出了一种用于毫米波锁相环的注入锁定分频器。基于55 nm CMOS工艺,设计了一种宽锁定范围的二分频注入锁定分频器。提出分布式差分注入的方式,增强注入电流与注入效率,采用高阶变压器作为... 针对传统的注入锁定分频器锁定范围较窄的问题,提出了一种用于毫米波锁相环的注入锁定分频器。基于55 nm CMOS工艺,设计了一种宽锁定范围的二分频注入锁定分频器。提出分布式差分注入的方式,增强注入电流与注入效率,采用高阶变压器作为谐振腔,在不使用调谐机制的条件下,有效增大了分频器的锁定范围。此外,还对传统buffer的结构进行改进,增强谐波抑制能力,保持了较宽的锁定范围。电路仿真结果表明,提出的分频器电路在0 dBm注入功率下可在22.8~36.3 GHz频段内完成二分频功能,达到45.7%的锁定范围,电路的功耗为3.54 mW(不含buffer)。 展开更多
关键词 分频器 CMOS 锁相环 宽锁定范围 分布式注入 高阶谐振腔
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Threshold control in VCSELs by proton implanted depth 被引量:1
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作者 赵红东 孙梅 +4 位作者 王伟 马连喜 刘会丽 李文超 刘琦 《Optoelectronics Letters》 EI 2011年第4期263-265,共3页
The proton implantation is one of key procedures to confine the current diffusion in vertical cavity surface emitting lasers(VCSELs),in which the proton implanted depth and profile are main parameters.Threshold charac... The proton implantation is one of key procedures to confine the current diffusion in vertical cavity surface emitting lasers(VCSELs),in which the proton implanted depth and profile are main parameters.Threshold characteristics of VCSELs with various proton implanted depths are studied after optical,electrical and thermal fields have been simulated self-consistently in three dimensions.It is found that for VCSELs with confinement radius of 2 mm,increasing proton implanted depth can reduce the injected current threshold power and enhance the laser temperature in active region.Numerical results also indicate that there are optimal values for current aperture in proton implanted VCSELs.The minimum injected current threshold can be achieved in VCSELs with proton implantation near the active region and confinement radius of 1.5 mm,while the VCSELs with proton implantation in the middle of p-type distributed Bragg reflectors(DBRs) and confinement radius of 2.5 mm can realize the minimum temperature. 展开更多
关键词 PROTONS
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