Y2002-63479-63 0319832ULSI 应用中金属间电介质化学机械抛光微缺陷减少=Reduction of micro-defects in the inter-metal dielectrics(IMD)chemical mechanical polishing(CMP)for ULSIapplications[会,英]/Park,S.-W.& Kim,S.-Y.//
文摘Y2002-63479-63 0319832ULSI 应用中金属间电介质化学机械抛光微缺陷减少=Reduction of micro-defects in the inter-metal dielectrics(IMD)chemical mechanical polishing(CMP)for ULSIapplications[会,英]/Park,S.-W.& Kim,S.-Y.//