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FameG应用日本技术提供半导体开发支援服务
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《中国集成电路》 2004年第4期66-66,共1页
关键词 FameG公司 数字媒体 半导体开发 支援服务
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EIAJ半导体开发计划闪亮而台
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作者 郝福中 《世界产品与技术》 2001年第3期18-19,共2页
关键词 半导体开发计划 EIAI 日本半导体产业
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半导体设备开发应用与该项目管理研究
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作者 韦日文 《信息产业报道》 2024年第4期222-224,共3页
本论文旨在探讨半导体设备开发中项目管理的应用情况,以及项目成功的关键因素。通过案例分析和理论分析,总结了项目管理在半导体领域的重要性和实践经验,为未来半导体设备开发项目提供借鉴和指导。
关键词 半导体设备开发 项目管理 应用
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Thin Emitter Structure Improved Turn-on Characteristics in RSD
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作者 梁琳 余岳辉 +1 位作者 周郁明 王璐 《Transactions of Tianjin University》 EI CAS 2008年第3期182-185,共4页
The thin emitter structure was introduced into reversely switched dynistor(RSD) to improve its turn-on characteristics. According to the analysis of turn-on condition, thin emitter structure is capable of reducing t... The thin emitter structure was introduced into reversely switched dynistor(RSD) to improve its turn-on characteristics. According to the analysis of turn-on condition, thin emitter structure is capable of reducing the extraction action for the triggering plasma layer P1 during turn-on process, and satisfying the requirement that triggering electric charge cannot be exhausted and therefore enables RSD to turn on uniformly. The on-state thin emitter RSD was equivalent to an asymmetric pin diode model. The simulation result shows that the forward voltage drop of RSD falls with the decrease of doping dose in p^+-emitter in a certain range, and when the doping concentration is extremely tow, the decrease of the width of p^+-emitter can obtain a tow forward voltage drop. Thin emitter RSD chips were made by sintering AI on n-Si. The test result shows that their turn-on process is uniform and the voltage drop is 7.5 V when the peak conversion current is 5 500 A. 展开更多
关键词 reversely switched dynistor(RSD) thin emitter turn-on characteristics SWITCH forward voltage drop
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