The deposition of silicon dioxide by plasma enhanced chemical vapor deposition from tetraethylorthosilicate (TEOS) and H_2O has been studied.Silicon oxide with refractive index of 1453 has been obtained.Tests on the 5...The deposition of silicon dioxide by plasma enhanced chemical vapor deposition from tetraethylorthosilicate (TEOS) and H_2O has been studied.Silicon oxide with refractive index of 1453 has been obtained.Tests on the 51mm wafers show that both thickness uniformity of ±15% and constant refractive index of 1453 can be achieved.By raising the deposition temperature,the qualities have been improved,while the deposition rate decreased.A SiO_2 thick film deposition technique has been developed combining TEOS-PECVD technique with high temperature annealing.展开更多
The low-temperature measurement of Hall effect of the two-dimensional electron system in a double-layered gated Si-δ-doped GaAs is presented.A complex peculiar nonlinear dependence of the depletion on gate voltage i...The low-temperature measurement of Hall effect of the two-dimensional electron system in a double-layered gated Si-δ-doped GaAs is presented.A complex peculiar nonlinear dependence of the depletion on gate voltage is observed.The nonlinearity is also explained on the basis of the assumption that the double-capacity model consists of two δ-doped two-dimensional electron layers and a metallic gate,and the experimental result that the electron mobility is linear with the electron density on a log-log scale.展开更多
CdS thin films were prepared by chemical-bath-deposited method and the effect of temperature and time on the properties of CdS thin films was studied. Independent of the deposited temperature, the growth was mainly co...CdS thin films were prepared by chemical-bath-deposited method and the effect of temperature and time on the properties of CdS thin films was studied. Independent of the deposited temperature, the growth was mainly controlled by the ion-by-ion growth mechanism at the beginning of the film deposition, then the cluster-by-cluster mechanism came to be dominant. The growth rate increased faster with the increasing of temperature until the thickness reached the limitation, then thickness instead become thinner. The scanning electron micro- scope results revealed that the morphology of the CdS film changed from pinholes to rough, inhomogeneous surface with increasing deposition time and deposition temperature. The X- ray diffraction results showed the film structure was a mixture of two phases: hexagonal and cubic, and it was very important to controll deposition time to the film's crystal phase. All films in depth of approxilnate 100 nm existed above 65% transmittance, the absorption edge became "red-shift" with temperature rising. At 60 and 70℃, with 20 min deposited-time, the energy band gap was more than 2.42 eV and decreased with time, while at 80 and 90℃ the energy band gap was less than 2.42 eV and increased little when the time changed from 10min to 15 nfin at 80℃.展开更多
Thermodynamic models for molecular-beam epitaxy(MBE) growth of ternary Ⅲ-Ⅴ semiconductor materials are proposed.These models are in agreement with our experimental materials InGaP/GaAs and InGaAs/InP,and reported ...Thermodynamic models for molecular-beam epitaxy(MBE) growth of ternary Ⅲ-Ⅴ semiconductor materials are proposed.These models are in agreement with our experimental materials InGaP/GaAs and InGaAs/InP,and reported GaAsP/GaAs and InAsP/InP in thermodynamic growth.The lattice strain energy △G and thermal decomposition sensitive to growth temperature are demonstrated in the models simultaneously.△G is the function of the alloy composition,which is affected by flux ratio and growth temperature directly.The calculation results reveal that flux ratio and growth temperature mainly influence the growth process.Thermodynamic model of quaternary InGaAsP/GaAs semiconductor material is discussed also.展开更多
The polaron effect in a quantum dot quantum well (QDQW)system is investigated by using the perturbation method. Both the bound electron states outside and inside the shell well are taken into account . Numerical calcu...The polaron effect in a quantum dot quantum well (QDQW)system is investigated by using the perturbation method. Both the bound electron states outside and inside the shell well are taken into account . Numerical calculation on the CdS/HgS QDQW shows that the phonon correction to the electron ground state energy is quite significant and cannot be neglected.展开更多
With the increasing concerns to energy shortage and environmental problems in modern society,the development of cheap,clean,and sustainable energy alternatives has been attracting tremendous attention globally.Among v...With the increasing concerns to energy shortage and environmental problems in modern society,the development of cheap,clean,and sustainable energy alternatives has been attracting tremendous attention globally.Among various strategies of renewable energy exploration,solar-driven water splitting into its compositional elements H2 and O2 is an ideal approach to convert and store renewable solar energy into chemical bonds.In recent few decades,as an emerging new type of catalysts,polyoxometalates(POMs)have been widely utilized for water splitting due to their versatile synthetic methodology and highly tunable physicochemical and photochemical properties.This critical review addresses the research advances of light-driven hydrogen evolution using polyoxometalate-based catalysts,including plenary POMs,transition-metal-substituted POMs,POM@MOF composites,and POM-semiconductor hybrids,under UV,near UV and visible light irradiation.In addition,the catalytic mechanism for each reaction system has been thoroughly discussed and summarized.Finally,a comprehensive outlook of this research area is also prospected.展开更多
Amorphous silicon films prepared by PECVD on glass substrate have been crystallized by conventional furnace annealing and rapid thermal annealing(RTA), respectively. From the Raman spectra, X-ray diffraction and scann...Amorphous silicon films prepared by PECVD on glass substrate have been crystallized by conventional furnace annealing and rapid thermal annealing(RTA), respectively. From the Raman spectra, X-ray diffraction and scanning electron microscope, it is found that the grain size is crystallized at 850℃ in both techniques. The thin film made by RTA is smooth and of perfect structure, the thin film annealed by FA has a highly structural disorder. An average grain size of about 30nm is obtained by both techniques.展开更多
Temperature-dependence and excitation-intensity-dependence of photoluminescence spectra for both disordered and ordered Ga 0.52 In 0.48 P are measured. The disordered sample is characterized by its single peak photolu...Temperature-dependence and excitation-intensity-dependence of photoluminescence spectra for both disordered and ordered Ga 0.52 In 0.48 P are measured. The disordered sample is characterized by its single peak photoluminescence spectrum which is excitation-intensity independent and has different activation energy at different temperature region. The ordered sample shows double peaks, the intensity of the high-energy peak has an anomalous increase firstly and quenches afterwards. The relative phenomena are reasonably explained in terms of lattice ordering and orientation superlattice model.展开更多
Using double crystal X-rays diffraction (DCXRD) and atomic force microscopy (AFM), the results of Ge x Si 1- x grown by UHV/CVD from Si 2H 6 and SiH 4 are analyzed and compared. Adsorbates can migrate to the energy-fa...Using double crystal X-rays diffraction (DCXRD) and atomic force microscopy (AFM), the results of Ge x Si 1- x grown by UHV/CVD from Si 2H 6 and SiH 4 are analyzed and compared. Adsorbates can migrate to the energy-favoring position due to the slow growth rate from SiH 4. In this case, a Si buffer that isolates the effect of substrate on epilayer could not be grown, which results in a pit penetrating into epilayer and buffer. The FWHM is 0.055° in DCXRD from SiH 4. The presence of diffraction fringes is an indication of an excellent crystalline quality. The roughness of the surface is improved if grown by Si 2H 6; however, the crystal quality of the Ge x Si 1- x material became worse than that from SiH 4 due to much larger growth rate from Si 2H 6. The content of Ge is obtained from DCXRD, which indicates the growth rate from Si 2H 6 is largest, then GeH 4, and that from SiH 4 is least.展开更多
Large quantities of gallium nitride(GaN) nanowires have been prepared via ammoniating the Ga2O3 films deposited on the oxidized aluminum layer at 950 ℃ in a quartz tube. The nanowires have been confirmed as crystalli...Large quantities of gallium nitride(GaN) nanowires have been prepared via ammoniating the Ga2O3 films deposited on the oxidized aluminum layer at 950 ℃ in a quartz tube. The nanowires have been confirmed as crystalline wurtzite GaN by X-ray diffraction, X-ray photoelectron spectrometry scanning electron microscope and selected-area electron diffraction. Transmission electron microscope(TEM) and scanning electron microscopy(SEM) reveal that the nanowires are amorphous and irregular, with diameters ranging from 30 nm to 80 nm and lengths up to tens of microns. Selected-area electron diffraction indicates that the nanowire with the hexagonal wurtzite structure is the single crystalline. The growth mechanism is discussed briefly.展开更多
A quantum well intermixing(QW1) investigation on double quantum well(DQW) structure with two different emitting wavelength caused by phosphorus ion implantation and following rapid thermal annealing (RTA) was ca...A quantum well intermixing(QW1) investigation on double quantum well(DQW) structure with two different emitting wavelength caused by phosphorus ion implantation and following rapid thermal annealing (RTA) was carried out by means of photoluminescence(PL). The ion implantation was performed at the energy of 120 keV with the dose ranging from 1 × 10^11cm^-2 to 1× 10^14cm^-2. The RTA was performed at the temperature of 700 ℃ for 30 s under pure nitrogen protection. The PL measurement implied that the band gap blue-shift from the upper well increases with the ion dose faster than that from lower well and the PL peaks from both QWs remained well separated under the lower dose implantation(-1 × 10^11cm^-2) indicating that the implant vacancy distribution affects the QWl. When the ion dose is over - 1 × 10^12cm^-2, the band gap blue-shift from both wells increases with the ion dose and finally the two peaks merge together as one peak indicating the ion implantation caused a total intermixing of both quantum wells.展开更多
Zn0.95-zAlxMn0.050 (x=0, 0.03, 0.05, and 0.07) dilute magnetic semiconductor materials have been synthesized by sol-gel auto-combustion technique. The effect of A1 doping on the structural, electrical, and magnetic ...Zn0.95-zAlxMn0.050 (x=0, 0.03, 0.05, and 0.07) dilute magnetic semiconductor materials have been synthesized by sol-gel auto-combustion technique. The effect of A1 doping on the structural, electrical, and magnetic properties has been investigated. X-ray diffraction studies demonstrate the existence of single phase characteristic hexagonal wurtzite type crystal structure, similar to the host ZnO, in all the synthesized compositions. Although, the microscopic images revealed that the grains were clustered, yet some individual grains could be seen to have hexagonal texture. Electrical resistivity was observed to decrease with the rise of temperature up to 450 ℃, depicting the characteristic semiconductor behavior. Room temperature ferromagnetic behavior was observed in all the compositions. The value of saturation magnetization increased with the increase of A1 concentration in ZnMnO system referred to the gradual enhancement of free carriers.展开更多
The new reactor concepts are characterized by higher efficiency, better utilization of nuclear fuel and nuclear waste minimization. This approach means that it is necessary to continue a continued research and test of...The new reactor concepts are characterized by higher efficiency, better utilization of nuclear fuel and nuclear waste minimization. This approach means that it is necessary to continue a continued research and test of new materials in order to apply them in new reactors. In this study, the authors fbcused on the analysis of SiC alloys because, due to their particular properties, this alloy can be used in high temperature conditions where the pure silicon, semiconductor material par excellence, is inadequate to support them.展开更多
Metal‐organic framework(MOF)‐derived nanomaterials have attracted widespread attention,because the excellent features,such as high surface area,porosity and tunable properties are inherited from MOFs.Moreover,the de...Metal‐organic framework(MOF)‐derived nanomaterials have attracted widespread attention,because the excellent features,such as high surface area,porosity and tunable properties are inherited from MOFs.Moreover,the derivatives avoid the poor conductivity and stability of MOFs.MOF‐derived nanomaterials can easily be regulated by a specific selection of metal nodes and organic linkers,resulting in multifunctionality in photocatalysis.MOF derivatives can be used not only as semiconductor photocatalysts,but also as co‐catalysts for photocatalytic hydrogen evolution,CO_(2) reduction,pollutants degradation,etc.This review focuses on the multifunctional applications of MOF derivatives in the field of photocatalysis.The researches in recent years are analyzed and summarized from the aspects of preparation,modification and application of MOF derivatives.At the end of the review,the development and challenges of MOF derivatives applied in photocatalysis in the future are put forward,in order to provide more references for further research in this field and bring new inspiration.展开更多
文摘The deposition of silicon dioxide by plasma enhanced chemical vapor deposition from tetraethylorthosilicate (TEOS) and H_2O has been studied.Silicon oxide with refractive index of 1453 has been obtained.Tests on the 51mm wafers show that both thickness uniformity of ±15% and constant refractive index of 1453 can be achieved.By raising the deposition temperature,the qualities have been improved,while the deposition rate decreased.A SiO_2 thick film deposition technique has been developed combining TEOS-PECVD technique with high temperature annealing.
文摘The low-temperature measurement of Hall effect of the two-dimensional electron system in a double-layered gated Si-δ-doped GaAs is presented.A complex peculiar nonlinear dependence of the depletion on gate voltage is observed.The nonlinearity is also explained on the basis of the assumption that the double-capacity model consists of two δ-doped two-dimensional electron layers and a metallic gate,and the experimental result that the electron mobility is linear with the electron density on a log-log scale.
文摘CdS thin films were prepared by chemical-bath-deposited method and the effect of temperature and time on the properties of CdS thin films was studied. Independent of the deposited temperature, the growth was mainly controlled by the ion-by-ion growth mechanism at the beginning of the film deposition, then the cluster-by-cluster mechanism came to be dominant. The growth rate increased faster with the increasing of temperature until the thickness reached the limitation, then thickness instead become thinner. The scanning electron micro- scope results revealed that the morphology of the CdS film changed from pinholes to rough, inhomogeneous surface with increasing deposition time and deposition temperature. The X- ray diffraction results showed the film structure was a mixture of two phases: hexagonal and cubic, and it was very important to controll deposition time to the film's crystal phase. All films in depth of approxilnate 100 nm existed above 65% transmittance, the absorption edge became "red-shift" with temperature rising. At 60 and 70℃, with 20 min deposited-time, the energy band gap was more than 2.42 eV and decreased with time, while at 80 and 90℃ the energy band gap was less than 2.42 eV and increased little when the time changed from 10min to 15 nfin at 80℃.
基金Projects(06YFJZJC01100,08JCYBJC14800)supported by Applied Basic Study Foundation of Tianjin,ChinaProject(2006AA03Z413)supported by the Hi-tech Research and Development Program of China
文摘Thermodynamic models for molecular-beam epitaxy(MBE) growth of ternary Ⅲ-Ⅴ semiconductor materials are proposed.These models are in agreement with our experimental materials InGaP/GaAs and InGaAs/InP,and reported GaAsP/GaAs and InAsP/InP in thermodynamic growth.The lattice strain energy △G and thermal decomposition sensitive to growth temperature are demonstrated in the models simultaneously.△G is the function of the alloy composition,which is affected by flux ratio and growth temperature directly.The calculation results reveal that flux ratio and growth temperature mainly influence the growth process.Thermodynamic model of quaternary InGaAsP/GaAs semiconductor material is discussed also.
文摘The polaron effect in a quantum dot quantum well (QDQW)system is investigated by using the perturbation method. Both the bound electron states outside and inside the shell well are taken into account . Numerical calculation on the CdS/HgS QDQW shows that the phonon correction to the electron ground state energy is quite significant and cannot be neglected.
文摘With the increasing concerns to energy shortage and environmental problems in modern society,the development of cheap,clean,and sustainable energy alternatives has been attracting tremendous attention globally.Among various strategies of renewable energy exploration,solar-driven water splitting into its compositional elements H2 and O2 is an ideal approach to convert and store renewable solar energy into chemical bonds.In recent few decades,as an emerging new type of catalysts,polyoxometalates(POMs)have been widely utilized for water splitting due to their versatile synthetic methodology and highly tunable physicochemical and photochemical properties.This critical review addresses the research advances of light-driven hydrogen evolution using polyoxometalate-based catalysts,including plenary POMs,transition-metal-substituted POMs,POM@MOF composites,and POM-semiconductor hybrids,under UV,near UV and visible light irradiation.In addition,the catalytic mechanism for each reaction system has been thoroughly discussed and summarized.Finally,a comprehensive outlook of this research area is also prospected.
文摘Amorphous silicon films prepared by PECVD on glass substrate have been crystallized by conventional furnace annealing and rapid thermal annealing(RTA), respectively. From the Raman spectra, X-ray diffraction and scanning electron microscope, it is found that the grain size is crystallized at 850℃ in both techniques. The thin film made by RTA is smooth and of perfect structure, the thin film annealed by FA has a highly structural disorder. An average grain size of about 30nm is obtained by both techniques.
文摘Temperature-dependence and excitation-intensity-dependence of photoluminescence spectra for both disordered and ordered Ga 0.52 In 0.48 P are measured. The disordered sample is characterized by its single peak photoluminescence spectrum which is excitation-intensity independent and has different activation energy at different temperature region. The ordered sample shows double peaks, the intensity of the high-energy peak has an anomalous increase firstly and quenches afterwards. The relative phenomena are reasonably explained in terms of lattice ordering and orientation superlattice model.
基金The National Natural Science Foundation of China
文摘Using double crystal X-rays diffraction (DCXRD) and atomic force microscopy (AFM), the results of Ge x Si 1- x grown by UHV/CVD from Si 2H 6 and SiH 4 are analyzed and compared. Adsorbates can migrate to the energy-favoring position due to the slow growth rate from SiH 4. In this case, a Si buffer that isolates the effect of substrate on epilayer could not be grown, which results in a pit penetrating into epilayer and buffer. The FWHM is 0.055° in DCXRD from SiH 4. The presence of diffraction fringes is an indication of an excellent crystalline quality. The roughness of the surface is improved if grown by Si 2H 6; however, the crystal quality of the Ge x Si 1- x material became worse than that from SiH 4 due to much larger growth rate from Si 2H 6. The content of Ge is obtained from DCXRD, which indicates the growth rate from Si 2H 6 is largest, then GeH 4, and that from SiH 4 is least.
基金National Natural Science Foundation of China(90301002and90201025)
文摘Large quantities of gallium nitride(GaN) nanowires have been prepared via ammoniating the Ga2O3 films deposited on the oxidized aluminum layer at 950 ℃ in a quartz tube. The nanowires have been confirmed as crystalline wurtzite GaN by X-ray diffraction, X-ray photoelectron spectrometry scanning electron microscope and selected-area electron diffraction. Transmission electron microscope(TEM) and scanning electron microscopy(SEM) reveal that the nanowires are amorphous and irregular, with diameters ranging from 30 nm to 80 nm and lengths up to tens of microns. Selected-area electron diffraction indicates that the nanowire with the hexagonal wurtzite structure is the single crystalline. The growth mechanism is discussed briefly.
文摘A quantum well intermixing(QW1) investigation on double quantum well(DQW) structure with two different emitting wavelength caused by phosphorus ion implantation and following rapid thermal annealing (RTA) was carried out by means of photoluminescence(PL). The ion implantation was performed at the energy of 120 keV with the dose ranging from 1 × 10^11cm^-2 to 1× 10^14cm^-2. The RTA was performed at the temperature of 700 ℃ for 30 s under pure nitrogen protection. The PL measurement implied that the band gap blue-shift from the upper well increases with the ion dose faster than that from lower well and the PL peaks from both QWs remained well separated under the lower dose implantation(-1 × 10^11cm^-2) indicating that the implant vacancy distribution affects the QWl. When the ion dose is over - 1 × 10^12cm^-2, the band gap blue-shift from both wells increases with the ion dose and finally the two peaks merge together as one peak indicating the ion implantation caused a total intermixing of both quantum wells.
文摘Zn0.95-zAlxMn0.050 (x=0, 0.03, 0.05, and 0.07) dilute magnetic semiconductor materials have been synthesized by sol-gel auto-combustion technique. The effect of A1 doping on the structural, electrical, and magnetic properties has been investigated. X-ray diffraction studies demonstrate the existence of single phase characteristic hexagonal wurtzite type crystal structure, similar to the host ZnO, in all the synthesized compositions. Although, the microscopic images revealed that the grains were clustered, yet some individual grains could be seen to have hexagonal texture. Electrical resistivity was observed to decrease with the rise of temperature up to 450 ℃, depicting the characteristic semiconductor behavior. Room temperature ferromagnetic behavior was observed in all the compositions. The value of saturation magnetization increased with the increase of A1 concentration in ZnMnO system referred to the gradual enhancement of free carriers.
文摘The new reactor concepts are characterized by higher efficiency, better utilization of nuclear fuel and nuclear waste minimization. This approach means that it is necessary to continue a continued research and test of new materials in order to apply them in new reactors. In this study, the authors fbcused on the analysis of SiC alloys because, due to their particular properties, this alloy can be used in high temperature conditions where the pure silicon, semiconductor material par excellence, is inadequate to support them.
文摘Metal‐organic framework(MOF)‐derived nanomaterials have attracted widespread attention,because the excellent features,such as high surface area,porosity and tunable properties are inherited from MOFs.Moreover,the derivatives avoid the poor conductivity and stability of MOFs.MOF‐derived nanomaterials can easily be regulated by a specific selection of metal nodes and organic linkers,resulting in multifunctionality in photocatalysis.MOF derivatives can be used not only as semiconductor photocatalysts,but also as co‐catalysts for photocatalytic hydrogen evolution,CO_(2) reduction,pollutants degradation,etc.This review focuses on the multifunctional applications of MOF derivatives in the field of photocatalysis.The researches in recent years are analyzed and summarized from the aspects of preparation,modification and application of MOF derivatives.At the end of the review,the development and challenges of MOF derivatives applied in photocatalysis in the future are put forward,in order to provide more references for further research in this field and bring new inspiration.