BiVO_(4)(BVO)is a promising material as the photoanode for use in photoelectrochemical applications.However,the high charge recombination and slow charge transfer of the BVO have been obstacles to achieving satisfacto...BiVO_(4)(BVO)is a promising material as the photoanode for use in photoelectrochemical applications.However,the high charge recombination and slow charge transfer of the BVO have been obstacles to achieving satisfactory photoelectrochemical performance.To address this,various modifications have been attempted,including the use of ferroelectric materials.Ferroelectric materials can form a permanent polarization within the layer,enhancing the separation and transport of photo-excited electron-hole pairs.In this study,we propose a novel approach by depositing an epitaxial BiFeO_(3)(BFO)thin film underneath the BVO thin film(BVO/BFO)to harness the ferroelectric property of BFO.The self-polarization of the inserted BFO thin film simultaneously functions as a buffer layer to enhance charge transport and a hole-blocking layer to reduce charge recombination.As a result,the BVO/BFO photoanodes showed more than 3.5 times higher photocurrent density(0.65 mA cm^(-2))at 1.23 V_(RHE)under the illumination compared to the bare BVO photoanodes(0.18 m A cm^(-2)),which is consistent with the increase of the applied bias photon-to-current conversion efficiencies(ABPE)and the result of electrochemical impedance spectroscopy(EIS)analysis.These results can be attributed to the self-polarization exhibited by the inserted BFO thin film,which promoted the charge separation and transfer efficiency of the BVO photoanodes.展开更多
We synthesized BiVO_(4)mesocrystals with ordered assembly structure,and studied the structural order and the relationship between the photodegradation of Rhodamine B.Au nanoparticles(NPs)were successfully loaded onto ...We synthesized BiVO_(4)mesocrystals with ordered assembly structure,and studied the structural order and the relationship between the photodegradation of Rhodamine B.Au nanoparticles(NPs)were successfully loaded onto Meso-BiVO_(4)by light-assisted induction,and Cd nanoparticles were further selected to be deposited on Au nanoparticles to form Z-scheme photocatalyst Meso-BiVO_(4)-Au-CdS heterostructures.We try and propose to analyze its ordered assembly structure by XRD for the first time.The results show that Meso-BiVO_(4)is a mesocrystal with highly exposed(001)plane and directional assembly structure.The charge separation efficiency of all samples was studied by PL spectroscopy.The results show that the Z-scheme Meso-BiVO_(4)-Au-CdS can promote the charge separation and obtain the best carrier separation efficiency.Thus,it has the best photocatalytic activity in the experiment of photocatalytic degradation of rhodamine B.The main active species in the degradation process were confirmed by free radical trapping experiment,and the degradation mechanism was put forward.展开更多
高阻断电压、大功率密度、高转化效率是电力电子器件技术持续追求的目标,基于4H-SiC优异的材料特性,在电力电子器件应用方面具有广阔的发展前景。围绕SiC MOSFET器件对外延材料的需求,介绍了国内外主流的SiC外延设备及国产SiC衬底的发展...高阻断电压、大功率密度、高转化效率是电力电子器件技术持续追求的目标,基于4H-SiC优异的材料特性,在电力电子器件应用方面具有广阔的发展前景。围绕SiC MOSFET器件对外延材料的需求,介绍了国内外主流的SiC外延设备及国产SiC衬底的发展,并重点介绍了宽禁带半导体电力电子器件国家重点实验室在国产150 mm(6英寸)SiC衬底上的高速外延技术进展。通过关键技术攻关,实现了150 mm SiC外延材料表面缺陷密度≤0.5 cm-2,BPD缺陷密度≤0.1 cm-2,片内掺杂浓度不均匀性≤5%,片内厚度不均匀性≤1%。基于自主外延材料,实现了650~1200 V SiC MOSFET产品商业化以及6.5~15 kV高压SiC MOSFET器件的产品定型。展开更多
基金supported by the program of Future Hydrogen Original Technology Development(2021M3I3A1084747),through the National Research Foundation of Korea(NRF)funded by the Korean government(Ministry of Science and ICT(MSIT))by the NRF grant funded by the Korea government(MSIT)(No.2020R1A2C1005590)。
文摘BiVO_(4)(BVO)is a promising material as the photoanode for use in photoelectrochemical applications.However,the high charge recombination and slow charge transfer of the BVO have been obstacles to achieving satisfactory photoelectrochemical performance.To address this,various modifications have been attempted,including the use of ferroelectric materials.Ferroelectric materials can form a permanent polarization within the layer,enhancing the separation and transport of photo-excited electron-hole pairs.In this study,we propose a novel approach by depositing an epitaxial BiFeO_(3)(BFO)thin film underneath the BVO thin film(BVO/BFO)to harness the ferroelectric property of BFO.The self-polarization of the inserted BFO thin film simultaneously functions as a buffer layer to enhance charge transport and a hole-blocking layer to reduce charge recombination.As a result,the BVO/BFO photoanodes showed more than 3.5 times higher photocurrent density(0.65 mA cm^(-2))at 1.23 V_(RHE)under the illumination compared to the bare BVO photoanodes(0.18 m A cm^(-2)),which is consistent with the increase of the applied bias photon-to-current conversion efficiencies(ABPE)and the result of electrochemical impedance spectroscopy(EIS)analysis.These results can be attributed to the self-polarization exhibited by the inserted BFO thin film,which promoted the charge separation and transfer efficiency of the BVO photoanodes.
文摘We synthesized BiVO_(4)mesocrystals with ordered assembly structure,and studied the structural order and the relationship between the photodegradation of Rhodamine B.Au nanoparticles(NPs)were successfully loaded onto Meso-BiVO_(4)by light-assisted induction,and Cd nanoparticles were further selected to be deposited on Au nanoparticles to form Z-scheme photocatalyst Meso-BiVO_(4)-Au-CdS heterostructures.We try and propose to analyze its ordered assembly structure by XRD for the first time.The results show that Meso-BiVO_(4)is a mesocrystal with highly exposed(001)plane and directional assembly structure.The charge separation efficiency of all samples was studied by PL spectroscopy.The results show that the Z-scheme Meso-BiVO_(4)-Au-CdS can promote the charge separation and obtain the best carrier separation efficiency.Thus,it has the best photocatalytic activity in the experiment of photocatalytic degradation of rhodamine B.The main active species in the degradation process were confirmed by free radical trapping experiment,and the degradation mechanism was put forward.
文摘高阻断电压、大功率密度、高转化效率是电力电子器件技术持续追求的目标,基于4H-SiC优异的材料特性,在电力电子器件应用方面具有广阔的发展前景。围绕SiC MOSFET器件对外延材料的需求,介绍了国内外主流的SiC外延设备及国产SiC衬底的发展,并重点介绍了宽禁带半导体电力电子器件国家重点实验室在国产150 mm(6英寸)SiC衬底上的高速外延技术进展。通过关键技术攻关,实现了150 mm SiC外延材料表面缺陷密度≤0.5 cm-2,BPD缺陷密度≤0.1 cm-2,片内掺杂浓度不均匀性≤5%,片内厚度不均匀性≤1%。基于自主外延材料,实现了650~1200 V SiC MOSFET产品商业化以及6.5~15 kV高压SiC MOSFET器件的产品定型。
