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1GPa压力脉冲发生器的研究及锰铜压阻技术在低压宽脉冲测量中的应用 被引量:1
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作者 刘仓理 谢庆海 《爆炸与冲击》 EI CAS CSCD 北大核心 1989年第4期348-353,共6页
本文阐述了新研究的一种在甘油介质中可产生0~1 GPa 压力宽脉冲的加载装置,以及用于该装置测量的相应锰铜计测试系统。同时对锰铜计在1 GPa以下的压阻系数进行了动态标定。实验结果表明,所研制的装置可产生脉宽10微秒以内,压力脉值为0... 本文阐述了新研究的一种在甘油介质中可产生0~1 GPa 压力宽脉冲的加载装置,以及用于该装置测量的相应锰铜计测试系统。同时对锰铜计在1 GPa以下的压阻系数进行了动态标定。实验结果表明,所研制的装置可产生脉宽10微秒以内,压力脉值为0~1 GPa的脉冲,与理论设计基本相符。 展开更多
关键词 脉冲 发生器 测量 压阻技术
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低阻值锰铜压阻计量程扩展新技术──双恒流压阻法 被引量:1
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作者 彭昆雅 段卓平 +2 位作者 黄正平 杨宇彬 林大泽 《兵工学报》 EI CAS CSCD 北大核心 1998年第1期80-82,共3页
介绍一种适用于中等压力测量的双恒流压阻技术。该技术把原用于高压测量的H型或双π型等低阻值锰铜压阻计的量程向中压段扩展到0.2GPa左右,压力的最高分辨率达10MPa。应用该技术对某低密度炸药的爆压进行测量,得到了不同密度的爆压值。
关键词 压阻技术 锰铜传感器 炸药 恒流
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扩散硅压阻传感技术的研究现状与发展趋势 被引量:3
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作者 梁秀红 鞠玉林 任丙彦 《河北工业大学成人教育学院学报》 2000年第2期37-38,51,共3页
扩散硅固态压阻传感器广泛应用于航空航天等军事和民用工业中 ,而它的压阻应变传感元件主要是用压阻效应制成的 ,并具有优于其他传感元件的特点。本文详细论述了扩散硅压阻传感器的发展过程及我国的研究现状 ,并展望了其未来向即小型化... 扩散硅固态压阻传感器广泛应用于航空航天等军事和民用工业中 ,而它的压阻应变传感元件主要是用压阻效应制成的 ,并具有优于其他传感元件的特点。本文详细论述了扩散硅压阻传感器的发展过程及我国的研究现状 ,并展望了其未来向即小型化、数字化、智能化。 展开更多
关键词 扩散硅 传感技术 发展趋势 效应原理 特点 智能代传感器 传感器
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基于MEMS技术的微操作三维力传感器研究 被引量:10
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作者 荣伟彬 王家畴 +2 位作者 赵玉龙 陈立国 孙立宁 《仪器仪表学报》 EI CAS CSCD 北大核心 2007年第4期692-698,共7页
针对微操作过程中对微力觉信号的需求,以压阻检测技术为基础结合MEMS加工工艺,设计了一种用于微操作的三维力传感器,建立传感器的数学模型并用有限元分析软件对敏感弹性元件进行分析。利用悬臂梁受力弯曲变形的原理结合显微视觉技术,实... 针对微操作过程中对微力觉信号的需求,以压阻检测技术为基础结合MEMS加工工艺,设计了一种用于微操作的三维力传感器,建立传感器的数学模型并用有限元分析软件对敏感弹性元件进行分析。利用悬臂梁受力弯曲变形的原理结合显微视觉技术,实现对传感器的标定,并给出了传感器的信号处理方法。实验证明,该传感器具有耦合小、测量分辨率高、线性度好、标定简单的优点,满足了预计的设计要求。传感器最大量程为10mN,X向与Y向的分辨率均为2.4μN,Z向的分辨率为4.2μN。 展开更多
关键词 三维微力传感器 检测技术 有限元分析 标定实验
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精密智能压力传感器及其应用
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作者 董立君 《仪器仪表用户》 2004年第1期42-43,共2页
精密智能压力传感器(Precision Pressure Transducer)是基于霍尼韦尔先进的硅压阻技术,内含微处理器进行数字补偿、组态、控制和通讯的智能传感器。其测量综合精度为满量程的0.05%,在军用、航天及工业等领域的压力测量中有广泛的应用。
关键词 精密智能力传感器 压阻技术 智能传感器 力测量 精度
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Reduce the noise of punch press with the equivalent damping 被引量:3
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作者 陈威 刘钢 +1 位作者 蔡伟 刘礼华 《Journal of Harbin Institute of Technology(New Series)》 EI CAS 2006年第1期59-61,共3页
To reduce the noise of the punch press during the punching process, the polyurethane elastomer is used as the damping material. The experiments of reducing noise were made by means of adding the polyurethane elastomer... To reduce the noise of the punch press during the punching process, the polyurethane elastomer is used as the damping material. The experiments of reducing noise were made by means of adding the polyurethane elastomer at different positions on the 100 kN and 1 000 kN punch presses. The better effect of reducing noise was obtained. After researching and analyzing a large number of test data, the ″equivalent damping hypothesis″ is put forward. The hypothesis makes the experiment of reducing noise simpler and also more economical. It is estimated that there is a vast application in the research area of vibration control and noise reduction. 展开更多
关键词 punch press noise POLYURETHANE equivalent damping
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1.0 V low voltage CMOS mixer based on voltage control load technique 被引量:1
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作者 韦保林 戴宇杰 +1 位作者 张小兴 吕英杰 《Journal of Central South University》 SCIE EI CAS 2011年第5期1572-1578,共7页
A CMOS active mixer based on voltage control load technique which can operate at 1.0 V supply voltage was proposed, and its operation principle, noise and linearity analysis were also presented. Contrary to the conven... A CMOS active mixer based on voltage control load technique which can operate at 1.0 V supply voltage was proposed, and its operation principle, noise and linearity analysis were also presented. Contrary to the conventional Gilbert-type mixer which is based on RF current-commutating, the load impedance in this proposed mixer is controlled by the LO signal, and it has only two stacked transistors at each branch which is suitable for low voltage applications. The mixer was designed and fabricated in 0.18 tam CMOS process for 2.4 GHz ISM band applications. With an input of 2.44 GHz RF signal and 2.442 GHz LO signal, the measurement specifications of the proposed mixer are: the conversion gain (Gc) is 5.3 dB, the input-referred third-order intercept point (PIIP3) is 4.6 dBm, the input-referred 1 dB compression point (P1dB) is --7.4 dBm, and the single-sideband noise figure (NFSSB) is 21.7 dB. 展开更多
关键词 CMOS active mixer voltage control load technique low voltage
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On the profile of frequency dependent interface states and series resistance in Au/p-InP SBDs prepared with photolithography technique
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作者 KORUCU D. TURUT A. +1 位作者 TURAN R. ALTINDALS. 《Science China(Physics,Mechanics & Astronomy)》 SCIE EI CAS 2012年第9期1604-1612,共9页
The frequency dependent of the forward and reverse bias capacitance-voltage (C-V) and conductance-voltage (G/w-V) charac- teristics of Au/p-InP SBDs have been investigated in the frequency range of 20 kHz-10 MHz a... The frequency dependent of the forward and reverse bias capacitance-voltage (C-V) and conductance-voltage (G/w-V) charac- teristics of Au/p-InP SBDs have been investigated in the frequency range of 20 kHz-10 MHz and voltage range of-5 - 5 V at room temperature. The effects of surface states (Nss) and series resistance (R0 on C-V and G/w-V characteristics have been in- vestigated in detail. The frequency dependent Nss and Rs profiles were obtained for various applied bias voltages. The experi- mental results show that the main electrical parameters of Au/p-InP SBD such as barrier height (gOB), the density of acceptor concentration (NA), Nss and Rs were found strongly frequency and voltage dependent. The values of C and G/w decrease with increasing frequency due to a continuous distribution of Nss localized at the metal/semiconductor (M/S) interface. The effect of Rs on C and G is found considerably high especially at high frequencies. Therefore, the high frequencies of the values of C and G were corrected for the effect of Rs in the whole measured bias range to obtain the real diode capacitance Cc and conductance Gc using the Nicollian and Goetzberger technique. The distribution profile of Rs-V gives a peak depending on the frequency especially at low frequencies and disappears with increasing frequencies due to the existence of Nss at the M/S interface. 展开更多
关键词 Au/p-lnP SBD electrical properties frequency dependence PHOTOLITHOGRAPHY surface states series resistance
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