The through-thickness corrosion inhomogeneity of 7050-T7451 Al alloy thick plate was studied using immersion tests, potentiodynamic polarization, electrochemical impedance spectroscopy(EIS), slow strain rate testing(S...The through-thickness corrosion inhomogeneity of 7050-T7451 Al alloy thick plate was studied using immersion tests, potentiodynamic polarization, electrochemical impedance spectroscopy(EIS), slow strain rate testing(SSRT) technique combined with optical microscopy(OM), scanning electron microscopy(SEM) and transmission electron microscopy(TEM). The results show that the through-thickness corrosion resistance is ranked in the order of T/2>surface>T/4. And the 75 mm-thick 7050 alloy plate presents better corrosion resistance than the 35 mm-thick plate. The results are discussed in terms of the combined effect of recrystallization and cooling rate in quenching. Alloy with lower volume fraction of recrystallization and smaller grain aspect ratio displays better corrosion resistance. The lower corrosion resistance caused by the slower cooling rate results from the higher coverage rate of grain boundary precipitates and larger width of precipitate free zone.展开更多
The surface quality of the substrate is a crucial factor in building ＂clean＂ quantum-dimensional systems. There are a number of micro-nano metric methods for the analysis state of surface： the atomic force microsco...The surface quality of the substrate is a crucial factor in building ＂clean＂ quantum-dimensional systems. There are a number of micro-nano metric methods for the analysis state of surface： the atomic force microscopy, the scanning tunneling microscopy and others. The SE （surface electron） over substrate has a ＂soft＂ hydrogen-like spectrum in the normal direction and the SEs mobility along is sensitive to the inhomogeneities of the substrate and this is analyzed in work. The values of electron mobility and energy of thermal activation are basic parameters of transport process which essentially depend on the helium film thickness. For analysis of nano-size inhomogeneities of substrate here we apply a new method providing a uniformity of the film thickness on substrate and fixing of measuring cell with supply wires. The plunger with electro-mechanic driver into a hermetic chamber is used for variation the helium level and consequently the film thickness. Considering values the conductivity and the variation of potential along surface is estimated the effective size of roughness from several nanometers （for non-saturated helium film） to 10^2 nm （for saturated film）.展开更多
基金Project(2012CB619503)supported by the National Basic Research Program of ChinaProject(2013AH100055)supported by the Foshan Civic Technological Innovation Foundation,China
文摘The through-thickness corrosion inhomogeneity of 7050-T7451 Al alloy thick plate was studied using immersion tests, potentiodynamic polarization, electrochemical impedance spectroscopy(EIS), slow strain rate testing(SSRT) technique combined with optical microscopy(OM), scanning electron microscopy(SEM) and transmission electron microscopy(TEM). The results show that the through-thickness corrosion resistance is ranked in the order of T/2>surface>T/4. And the 75 mm-thick 7050 alloy plate presents better corrosion resistance than the 35 mm-thick plate. The results are discussed in terms of the combined effect of recrystallization and cooling rate in quenching. Alloy with lower volume fraction of recrystallization and smaller grain aspect ratio displays better corrosion resistance. The lower corrosion resistance caused by the slower cooling rate results from the higher coverage rate of grain boundary precipitates and larger width of precipitate free zone.
文摘The surface quality of the substrate is a crucial factor in building ＂clean＂ quantum-dimensional systems. There are a number of micro-nano metric methods for the analysis state of surface： the atomic force microscopy, the scanning tunneling microscopy and others. The SE （surface electron） over substrate has a ＂soft＂ hydrogen-like spectrum in the normal direction and the SEs mobility along is sensitive to the inhomogeneities of the substrate and this is analyzed in work. The values of electron mobility and energy of thermal activation are basic parameters of transport process which essentially depend on the helium film thickness. For analysis of nano-size inhomogeneities of substrate here we apply a new method providing a uniformity of the film thickness on substrate and fixing of measuring cell with supply wires. The plunger with electro-mechanic driver into a hermetic chamber is used for variation the helium level and consequently the film thickness. Considering values the conductivity and the variation of potential along surface is estimated the effective size of roughness from several nanometers （for non-saturated helium film） to 10^2 nm （for saturated film）.
