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Some issues on atomic force microscopy based surface characterization
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作者 CHEN Yu-hang HUANG Wen-hao 《Optoelectronics Letters》 EI 2007年第2期129-132,共4页
Influences of tip radius and sampling interval on applying atomic force microscopy (AFM) in quantitative surface evaluations are investigated by numerical simulations and experiments. Several evaluation parameters o... Influences of tip radius and sampling interval on applying atomic force microscopy (AFM) in quantitative surface evaluations are investigated by numerical simulations and experiments. Several evaluation parameters of surfaces ranging from amplitude to functional parameters are studied. Numerical and experimental results are in good agreements. The accuracy of estimating tip radius on random rough surface with Ganssian distribution of heights using a blind reconstruction method is also discussed theoretically. It is found that the accuracy is greatly depending on the ratio of actual tip radius to root-mean-square (rms) radius of curvature. To obtain an accurate estimation of tip radius under Gaussian rough surface, the ratio has to be larger than 3/2. 展开更多
关键词 原子力显微镜 表面特征 数值模拟 采样间隔
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脉冲溅射V_2O_5薄膜结构和性能研究 被引量:4
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作者 许旻 贺德衍 《光学学报》 EI CAS CSCD 北大核心 2004年第6期743-746,共4页
V2 O5薄膜具有很好的离子注入 /退出可逆性 ,是最有潜力的锂离子储存层的候选材料之一。它的电学特性与制备方法、化学计量比、结构和取向等有直接关系 ,仔细控制工艺参量是制备出在锂电池上应用的V2 O5薄膜关键。研究中采用脉冲磁控反... V2 O5薄膜具有很好的离子注入 /退出可逆性 ,是最有潜力的锂离子储存层的候选材料之一。它的电学特性与制备方法、化学计量比、结构和取向等有直接关系 ,仔细控制工艺参量是制备出在锂电池上应用的V2 O5薄膜关键。研究中采用脉冲磁控反应溅射方法 ,通过精确地控制氧分压、基底温度等关键工艺参量 ,在石英玻璃和硅片上制备V2 O5薄膜。利用X射线衍射和X射线光电子谱 ,分析了薄膜的成分、相结构、结晶和价态情况 ,用原子力显微镜表征了薄膜的微观结构 ,用分光光度计测量从 2 0 0~ 2 5 0 0nm波段V2 O5薄膜的透射和反射光谱 ,对薄膜的电学性能也进行了测量和分析。结果表明 ,V2 O5薄膜纯度高、相结构单一、结晶度好。高低温电阻变化 2个量级 ,薄膜的光学能隙为 2 .4 6eV。 展开更多
关键词 氧化钒薄膜 薄膜结构 脉冲磁控反应溅射法 原子力显微镜表征 结晶度 光学能隙 电学性质
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Plasma-assisted fabrication of monolayer phosphorene and its Raman characterization 被引量:40
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作者 Wanglin Lu Haiyan Nan +7 位作者 Jinhua Hong Yuming Chen Chen Zhu Zheng Liang Xiangyang Ma Zhenhua Ni Chuanhong Jin Ze Zhang 《Nano Research》 SCIE EI CAS CSCD 2014年第6期853-859,共7页
There have been continuous efforts to seek novel functional two-dimensional semiconductors with high performance for future applications in nanoelectronics and optoelectronics. In this work, we introduce a successful ... There have been continuous efforts to seek novel functional two-dimensional semiconductors with high performance for future applications in nanoelectronics and optoelectronics. In this work, we introduce a successful experimental approach to fabricate monolayer phosphorene by mechanical cleavage and a subsequent Ar* plasma thinning process. The thickness of phosphorene is unambiguously determined by optical contrast spectra combined with atomic force microscopy (AFM). Raman spectroscopy is used to characterize the pristine and plasma-treated samples. The Raman frequency of the A2g mode stiffens, and the intensity ratio of A2g to Alg modes shows a monotonic discrete increase with the decrease of phosphorene thickness down to a monolayer. All those phenomena can be used to identify the thickness of this novel two-dimensional semiconductor. This work on monolayer phosphorene fabrication and thickness determination will facilitate future research on phosphorene. 展开更多
关键词 Mechanical cleavage monolayer phosphorene two-dimensionalsemiconductor plasma thinning optical contrast Raman spectroscopy
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