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大口径双反射面天线反射体成型工艺研究 被引量:3
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作者 张晨晖 《玻璃钢/复合材料》 CAS CSCD 2004年第1期38-39,32,共3页
本文主要论述了大口径双反射面天线反射体的结构特点、研制过程及关键制造技术。解决了大口径曲面栅面的制作难题。
关键词 大口径反射天线反射体 结构 成型工艺 玻璃钢蜂窝夹层 树脂基体 增强材料 双栅面
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Bipolar Theory of MOS Field-Effect Transistors and Experiments
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作者 薩支唐 揭斌斌 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2007年第10期1497-1502,共6页
The bipolar theory of field-effect transistor is introduced to replace the 55-year-old classic unipolar theory invented by Shockley in 1952 in order to account for the characteristics observed in recent double-gate na... The bipolar theory of field-effect transistor is introduced to replace the 55-year-old classic unipolar theory invented by Shockley in 1952 in order to account for the characteristics observed in recent double-gate nanometer silicon MOS field-effect transistors. Two electron and two hole surface channels are simultaneously present in all channel current ranges. Output and transfer characteristics are computed over practical base and gate oxide thicknesses. The bipolar theory corroborates well with experimental data reported recently for FinFETs with metal/silicon and p/n junction source/drain contacts. Single-device realization of CMOS inverter and SRAM memory circuit functions are recognized. 展开更多
关键词 unipolar FET theory bipolar FET theory simultaneous hole and electron surface channels volume channel DOUBLE-GATE pure-base
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The Bipolar Field-Effect Transistor: III.Short Channel Electrochemical Current Theory (Two-MOS-Gates on Pure-Base)
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作者 揭斌斌 薩支唐 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2008年第1期1-11,共11页
This paper describes the short channel theory of the bipolar field-effect transistor (BiFET) by partitioning the transistor into two sections,the source and drain sections,each can operate as the electron or hole em... This paper describes the short channel theory of the bipolar field-effect transistor (BiFET) by partitioning the transistor into two sections,the source and drain sections,each can operate as the electron or hole emitter or collector under specific combinations of applied terminal voltages. Analytical solution is obtained in the source and drain sections by separating the two-dimensional trap-free Shockley Equations into two one-dimensional equations parametrically coupled via the surface-electric-potential and by using electron current continuity and hole current continuity at the boundary between the emitter and collector sections. Total and electron-hole-channel components of the output and transfer currents and conductances, and the electrical lengths of the two sections are computed and presented in graphs as a function of the D. C. terminal voltages for the model transistor with two identical and connected metal-oxide-silicon-gates (MOS-gates) on a thin pure-silicon base over practical ranges of thicknesses of the silicon base and gate oxide. Deviations of the long physical channel currents and conductances from those of the short electrical channels are reported. 展开更多
关键词 bipolar field-effect transistor theory MOS field-effect transistor simultaneous electron and hole surface andvolume channels surface potential short channel theory double-gate pure-base
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A Complete Surface Potential-Based Core Model for Undoped Symmetric Double-Gate MOSFETs
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作者 何进 张立宁 +3 位作者 张健 傅越 郑睿 张兴 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2008年第11期2092-2097,共6页
A surface potential-based model for undoped symmetric double-gate MOSFETs is derived by solving Poisson's equation to obtain the relationship between the surface potential and voltage in the channel region in a self-... A surface potential-based model for undoped symmetric double-gate MOSFETs is derived by solving Poisson's equation to obtain the relationship between the surface potential and voltage in the channel region in a self-consistent way. The drain current expression is then obtained from Pao-Sah's double integral. The model consists of one set of surface potential equations,and the analytic drain current can be evaluated from the surface potential at the source and drain ends. It is demonstrated that the model is valid for all operation regions of the double-gate MOSFETs and without any need for simplification (e. g., by using the charge sheet assumption) or auxiliary fitting functions. The model has been verified by extensive comparisons with 2D numerical simulation under different operation conditions with different geometries. The consistency between the model calculation and numerical simulation demonstrates the accuracy of the model. 展开更多
关键词 bulk MOSFET limit non-classical CMOS double-gate MOSFET device physics surface potential-based model
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