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氧回旋离子束刻蚀化学气相沉积金刚石膜 被引量:2
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作者 吴俊 马志斌 沈武林 《强激光与粒子束》 EI CAS CSCD 北大核心 2012年第10期2459-2463,共5页
利用非对称磁镜场电子回旋共振等离子体产生的氧回旋离子束刻蚀了化学气相沉积金刚石膜,研究了工作气压和磁电加热电压对金刚石样品附近的离子温度和密度的影响,并分析了金刚石膜的刻蚀和机械抛光效果。结果表明:当工作气压为0.03Pa,磁... 利用非对称磁镜场电子回旋共振等离子体产生的氧回旋离子束刻蚀了化学气相沉积金刚石膜,研究了工作气压和磁电加热电压对金刚石样品附近的离子温度和密度的影响,并分析了金刚石膜的刻蚀和机械抛光效果。结果表明:当工作气压为0.03Pa,磁电加热电压为200 V时,离子温度和密度最大,分别为7.38eV和23.8×1010cm-3。在此优化条件下刻蚀金刚石膜4h后,其表面粗糙度由刻蚀前的3.525μm降为2.512μm,机械抛光15min后,表面粗糙度降低为0.517μm,即金刚石膜经离子束刻蚀后可显著提高机械抛光效率。 展开更多
关键词 离子灵敏探针 离子温度 金刚石膜 刻蚀 回旋离子束
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Milliampere He^2+ beam generator using a compact GHz ECRIS 被引量:2
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作者 REN HaiTao PENG ShiXiang +6 位作者 XU Yuan ZHAO Jie CHEN Jia ZHANG Tao ZHANG AiLin GUO ZhiYu CHEN JiaEr 《Science China(Physics,Mechanics & Astronomy)》 SCIE EI CAS 2013年第10期2016-2018,共3页
Multi-charged helium ion beam He2+ is useful for helium accelerator to obtain a higher energy with lower cost and for deuterium accelerator to avoid neutron activation during machine commissioning. An attempt to gene... Multi-charged helium ion beam He2+ is useful for helium accelerator to obtain a higher energy with lower cost and for deuterium accelerator to avoid neutron activation during machine commissioning. An attempt to generate milliampere multi-charged helium He2+ ion beam with a 2.45 GHz electron cyclotron resonance ion source (ECRIS) was tested recently. A design using a specfic permanent magnet 2.45 GHz ECRIS (PMECRIS) source (ERCIS) is reported and the He2~ beam production ability is described. With this source, we produced a total helium beam of 40 mA at 40 kV with 180 W of net microwave power and a gas flow of less than 0.5 seem. At steady state the He2+ beam intensity is 4.4 rnA, that being the fraction of multi-charged he- lium ion beam is at approximately 11%. 展开更多
关键词 multi-charged helium ion beam He2+ milliampere scale permanent magnet 2.45 GHz ECR ion source 4 mA
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Multiple charge ion beam generation with a 2.45 GHz electron cyclotron resonance ion source
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作者 Yuan Xu ShiXiang Peng +7 位作者 HaiTao Ren JiaMei Wen AiLin Zhang Tao Zhang JingFeng Zhang WenBin Wu ZhiYu Guo JiaEr Chen 《Science China(Physics,Mechanics & Astronomy)》 SCIE EI CAS CSCD 2017年第6期74-77,共4页
Multiple charge ions (MCIs) are necessary for increasing the output energy of particles in accelerators. In general, MCI beams are largely produced by electron beam ion source (EBIS) [1], laser ion source (LIS) [2], o... Multiple charge ions (MCIs) are necessary for increasing the output energy of particles in accelerators. In general, MCI beams are largely produced by electron beam ion source (EBIS) [1], laser ion source (LIS) [2], or high-frequency (mostly >5 GHz) electron cyclotron resonance (ECR) ion source [3]. Among these, only ECR ion source can operate in the continuous wave (CW) mode, while EBIS and LIS only support pulses. In addition, ECR ion source with lower frequency (mostly 2.45 GHz) are required primarily for generating single charge state ions, because the corresponding ECR field (875 Gs) is not sufficiently strong for MCI generation [4]. 展开更多
关键词 mostly operate generating sufficiently primarily largely
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