Due to different cultural and historical background, the technology in Western and Eastern pattern design is inherently different. Along with the development of technology, garment pattern design technique is making p...Due to different cultural and historical background, the technology in Western and Eastern pattern design is inherently different. Along with the development of technology, garment pattern design technique is making progress towards high effectiveness and accuracy. Many researchers proposed different alternative methodologies to improve the current pattern making processes. This article examines the development of Western and Eastern garment pattern design technique. The main objective of this article is to provide a thorough review and hence a better understanding to those researchers who made contribution on developing pattern design technique and continue their work in the future.展开更多
Digraph-based causal models have been widely used to model the cause and effect behavior of process systems. Signed digraphs （SDG） capture the direction of the effect. It should be mentioned that there are loops in ...Digraph-based causal models have been widely used to model the cause and effect behavior of process systems. Signed digraphs （SDG） capture the direction of the effect. It should be mentioned that there are loops in SDG generated from chemical process. From the point of the inherent operability, the worst unsafe factor is the SDG having positive loops that means any disturbance occurring within the loop will propagate through the nodes one by one and are amplified gradually, so the system may lose control, which may lead to an accident. So finding the positive loops in a SDG and treating these unsafe factors in a proper manner can improve the inherent safety of a chemical process. This article proposed a method that can detect the above-mentioned unsafe factors in the proc- ess conceptual design stage automatically through the analysis of the SDG generated from the chemical process. A case study is illustrated to show the working of the algorithm, and then a complicated case from industry is studied to depict the effectiveness of the proposed algorithm.展开更多
The two-dimensional series patterns have been greatly applied to the changes of clothing details and edges, and the clothes with series edges is able to fully embody the clothing structure, highlight clothing modeling...The two-dimensional series patterns have been greatly applied to the changes of clothing details and edges, and the clothes with series edges is able to fully embody the clothing structure, highlight clothing modeling features, and modify the beauty of bodily form, so that clothes looks simple, decent, and cool, and its structure is clear to all; a form of rotation is formed on the human body, making the beauty-appreciation perspective of the viewers greatly changed. However, there are unending changes in the modern clothes, and therefore it is particularly important to explore a new design way of thinking in the field of design. The two-dimensional series patterns are reflected in the clothing details by relying on different composition forms, and can show the essence of traditional Chinese culture and promote design to win in details.展开更多
ZnO is a typical direct wide-bandgap semiconductor material, which has various morphologies and unique physical and chemical properties, and is widely used in the fields of energy, information technology, biomedicine,...ZnO is a typical direct wide-bandgap semiconductor material, which has various morphologies and unique physical and chemical properties, and is widely used in the fields of energy, information technology, biomedicine, and others. The precise design and controllable fabrication of nanostructures have gradually become important avenues to further enhancing the performance of Zn O-based functional nanodevices. This paper introduces the continuous development of patterning technologies, provides a comprehensive review of the optical lithography and laser interference lithography techniques for the controllable fabrication of Zn O nanostructures, and elaborates on the potential applications of such patterned Zn O nanostructures in solar energy, water splitting, light emission devices, and nanogenerators. Patterned Zn O nanostructures with highly controllable morphology and structure possess discrete three-dimensional space structure, enlarged surface area, and improved light capture ability, which realize the efficient carrier regulation,achieve highly efficient energy conversion, and meet the diverse requirements of functional nanodevices. The patterning techniques proposed for the precise design of Zn O nanostructures not only have important guiding significance for the controllable fabrication of complex nanostructures of other materials, but also open up a new route for the further development of functional nanostructures.展开更多
基金This Research is Supported by the Tuition Scholarship from The Hong Kong Polytechnic University
文摘Due to different cultural and historical background, the technology in Western and Eastern pattern design is inherently different. Along with the development of technology, garment pattern design technique is making progress towards high effectiveness and accuracy. Many researchers proposed different alternative methodologies to improve the current pattern making processes. This article examines the development of Western and Eastern garment pattern design technique. The main objective of this article is to provide a thorough review and hence a better understanding to those researchers who made contribution on developing pattern design technique and continue their work in the future.
文摘Digraph-based causal models have been widely used to model the cause and effect behavior of process systems. Signed digraphs （SDG） capture the direction of the effect. It should be mentioned that there are loops in SDG generated from chemical process. From the point of the inherent operability, the worst unsafe factor is the SDG having positive loops that means any disturbance occurring within the loop will propagate through the nodes one by one and are amplified gradually, so the system may lose control, which may lead to an accident. So finding the positive loops in a SDG and treating these unsafe factors in a proper manner can improve the inherent safety of a chemical process. This article proposed a method that can detect the above-mentioned unsafe factors in the proc- ess conceptual design stage automatically through the analysis of the SDG generated from the chemical process. A case study is illustrated to show the working of the algorithm, and then a complicated case from industry is studied to depict the effectiveness of the proposed algorithm.
文摘The two-dimensional series patterns have been greatly applied to the changes of clothing details and edges, and the clothes with series edges is able to fully embody the clothing structure, highlight clothing modeling features, and modify the beauty of bodily form, so that clothes looks simple, decent, and cool, and its structure is clear to all; a form of rotation is formed on the human body, making the beauty-appreciation perspective of the viewers greatly changed. However, there are unending changes in the modern clothes, and therefore it is particularly important to explore a new design way of thinking in the field of design. The two-dimensional series patterns are reflected in the clothing details by relying on different composition forms, and can show the essence of traditional Chinese culture and promote design to win in details.
基金supported by the National Key Research and Development Program of China(2013CB932602 and 2016YFA0202701)the Program of Introducing Talents of Discipline to Universities(B14003)+2 种基金the National Natural Science Foundation of China(51527802,51232001,51372020 and 51602020)Beijing Municipal Science&Technology Commission(Z151100003315021)China Postdoctoral Science Foundation(2016M600039)
文摘ZnO is a typical direct wide-bandgap semiconductor material, which has various morphologies and unique physical and chemical properties, and is widely used in the fields of energy, information technology, biomedicine, and others. The precise design and controllable fabrication of nanostructures have gradually become important avenues to further enhancing the performance of Zn O-based functional nanodevices. This paper introduces the continuous development of patterning technologies, provides a comprehensive review of the optical lithography and laser interference lithography techniques for the controllable fabrication of Zn O nanostructures, and elaborates on the potential applications of such patterned Zn O nanostructures in solar energy, water splitting, light emission devices, and nanogenerators. Patterned Zn O nanostructures with highly controllable morphology and structure possess discrete three-dimensional space structure, enlarged surface area, and improved light capture ability, which realize the efficient carrier regulation,achieve highly efficient energy conversion, and meet the diverse requirements of functional nanodevices. The patterning techniques proposed for the precise design of Zn O nanostructures not only have important guiding significance for the controllable fabrication of complex nanostructures of other materials, but also open up a new route for the further development of functional nanostructures.
